Abstract A process for production of a hydrogenated amorphous silicon film of a silicon compound containing at least one element selected from the group consisting of hydrogen and halogens and having a photosensitivity of not less than 0.1 erg/cm2 at 780 nm, which comprises supplying a gas selected from the group consisting of SiH4, SiF4 and Si2H6 into a discharge space, and subjecting the gas to glow discharge within the discharge space having a gradient discharge intensity. The present invention provides an a-SiH film which has a remarkable high sensitivity in a long wavelength region with maintaining a high photosensitivity in a visible light region, and has a remarkable less defect density, and the process for production of such film in a high deposition rate.
A hydrogenated amorphous silicon film having high photosensitivity at a long wavelength range of greater than 700 nm which consists essentially of a compound of silicon and hydrogen, said amorphous film having a photosensitivity of not less than 0.1 cm 2 /erg at 780 nm.
Claim 2
Dependent Claim
45 words
A hydrogenated amorphous silicon film having high photosensitivity at a long wavelength range of greater than 700 nm which consists essentially of a compound of silicon and hydrogen, said amorphous film having a photosensitivity of not less than 0.1 cm 2 /erg at 780 nm.
Claim 3
Dependent Claim
25 words
A hydrogenated amorphous silicon film according to claim 1, which has a localized density of state of not more than 3×10 15 cm 3 .eV.