US4837443A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Guard ring for a differentially pumped seal apparatus
Assignee: Applied Materials Inc
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Filing: 1987-10-15
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Granted: 1989-06-06
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Expires: 2007-10-15
Abstract
Abstract Disclosed is a guard ring (20) in a particle beam lithography system (10) of a pressurized gas surrounding a seal apparatus (14) and concentric therewith so that the guard ring (20) of gas is located between the seal apparatus (14) and ambient pressure in which the remainder of the workpiece (12) is located and forms a curtain of gas surrounding the seal apparatus (14) to reduce contamination of the seal apparatus (14) and beam column (16). In one embodiment, the guard ring (20) is formed by a ring of small ports (60) connected to a source of pressurized gas so that gas at a pressure higher than the ambient pressure is directed toward the workpiece (12). In a second embodiment, the guard ring (20) is formed by a small width groove (72) connected by gas ports (60) to a source of pressurized gas (64) by which gas is introduced into the groove (72). In a third embodiment, the guard ring (20) is formed by a plurality of gas ports (60) and counterbores (74) connected to a source of pressurized gas (64) by which gas is introduced into said counterbores (74). Both the groove (72) and the counterbores (74) serve to distribute the emitted pressurized gas. The emitted pressurized gas may be filtered dry air or gas, or an inert or an ionized gas, all of which may be preheated.
Inventors
- 👤 Lydia J. Young
- 👤 Glen E. Howard
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 07:03
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/708; G03F7/70908; G03F7/70858; G03F7/70866; G03F7/70933; H; H01; H01J; H01J37/00; H01J37/02; H01J37/18; H01J37/30; H01J37/301
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
183 words
A particle beam lithography system for treating a semiconductor wafer or mask workpiece surface comprising a beam column having means for generating and directing a particle beam toward the workpiece surface, a seal apparatus for maintaining only a portion of said workpiece surface in a vacuum so that the beam can be directed to that portion in vacuum while the rest of the workpiece surface is at ambient pressure, means for positioning said workpiece with respect to said seal apparatus so that a gap is formed between the seal apparatus and the workpiece during workpiece processing and so that the workpiece can move generally transversely of the beam to enable different portions to be treated by the beam at different times yet maintain the vacuum beneath the seal apparatus, and means surrounding said seal apparatus and cooperating with said workpiece surface for reducing the possibility of contaminants entering said seal apparatus and to moderate the localized temperature differential in the area of the workpiece in vacuum which comprises a ring of heated gas under pressure directed toward and impinging on said workpiece surface.
Claim 2
Dependent Claim
183 words
A particle beam lithography system for treating a semiconductor wafer or mask workpiece surface comprising a beam column having means for generating and directing a particle beam toward the workpiece surface, a seal apparatus for maintaining only a portion of said workpiece surface in a vacuum so that the beam can be directed to that portion in vacuum while the rest of the workpiece surface is at ambient pressure, means for positioning said workpiece with respect to said seal apparatus so that a gap is formed between the seal apparatus and the workpiece during workpiece processing and so that the workpiece can move generally transversely of the beam to enable different portions to be treated by the beam at different times yet maintain the vacuum beneath the seal apparatus, and means surrounding said seal apparatus and cooperating with said workpiece surface for reducing the possibility of contaminants entering said seal apparatus and to moderate the localized temperature differential in the area of the workpiece in vacuum which comprises a ring of heated gas under pressure directed toward and impinging on said workpiece surface.
Claim 3
Dependent Claim
43 words
The system as claimed in claim 1 wherein said ring of heated gas is formed by a plurality of ports spaced from the workpiece surface and the distance from said ports to said workpiece surface is greater than the size of said gap.
Claim 4
Dependent Claim
43 words
The system as claimed in claim 1 wherein said ring of heated gas is formed by a groove connected to a source of pressurized gas and the distance from said groove to said workpiece surface is greater than the size of said gap.
Claim 5
Dependent Claim
45 words
The system as claimed in claim 1 wherein said ring of heated gas is formed by a plurality of counterbores connected to a source of pressurized gas and the distance from said counterbores to said workpiece surface is greater than the size of said gap.
Claim 6
Dependent Claim
178 words
A particle beam lithography system for treating a semiconductor wafer or mask workpiece surface comprising a beam column having means for generating and directing a particle beam toward the workpiece surface, a seal apparatus for maintaining only a portion of said workpiece surface in a vacuum so that the beam can be directed to that portion in vacuum while the rest of the workpiece surface is at ambient pressure, means for positioning said workpiece with respect to said seal apparatus so that a gap is formed between the seal apparatus and the workpiece during workpiece processing and so that the workpiece can move generally transversely of the beam to enable different portions to be treated by the beam at different times yet maintain the vacuum beneath the seal apparatus, and means surrounding said seal apparatus and cooperating with said workpiece surface for reducing the possibility of contaminants entering said seal apparatus and to electrostatically dislodge any contaminants from said workpiece surface which comprises a ring of ionized gas under pressure directed toward and impinging on said workpiece surface.
Claim 7
Dependent Claim
178 words
A particle beam lithography system for treating a semiconductor wafer or mask workpiece surface comprising a beam column having means for generating and directing a particle beam toward the workpiece surface, a seal apparatus for maintaining only a portion of said workpiece surface in a vacuum so that the beam can be directed to that portion in vacuum while the rest of the workpiece surface is at ambient pressure, means for positioning said workpiece with respect to said seal apparatus so that a gap is formed between the seal apparatus and the workpiece during workpiece processing and so that the workpiece can move generally transversely of the beam to enable different portions to be treated by the beam at different times yet maintain the vacuum beneath the seal apparatus, and means surrounding said seal apparatus and cooperating with said workpiece surface for reducing the possibility of contaminants entering said seal apparatus and to electrostatically dislodge any contaminants from said workpiece surface which comprises a ring of ionized gas under pressure directed toward and impinging on said workpiece surface.
Claim 8
Dependent Claim
43 words
The system as claimed in claim 5 wherein said ring of ionized gas is formed by a plurality of ports spaced from said workpiece surface and the distance from said ports to said workpiece surface is greater than the size of said gap.
Claim 9
Dependent Claim
43 words
The system as claimed in claim 5 wherein said ring of ionized gas is formed by a groove connected to a source of pressurized gas and the distance from said groove to said workpiece surface is greater than the size of said gap.
Claim 10
Dependent Claim
45 words
The system as claimed in claim 5 wherein said ring of ionized gas is formed by a plurality of counterbores connected to a source of pressurized gas and the distance from said counterbores to said workpiece surface is greater than the size of said gap.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-06-05 | 1992-12-05 | 1993-06-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-06-05 | 1996-12-05 | 1997-06-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-06-05 | 2000-12-05 | 2001-06-06 | $7700.00 | Window Closed / Lapsed |