Abstract A method for forming a pattern of conjugated system polymer which can be given an electrical conductivity by doping treatment which comprises forming a thin film of a polymeric sulfonium salt having a recurring unit represented by the following general formula: ##STR1## wherein R 1 represents a group capable of conjugating with an adjacent vinylene group formed by elimination of sulfonium salt as a side chain, R 2 and R 3 each represents hydrocarbon group having 1 to 20 carbon atoms, and X - represents counter ion, on a substrate, irradiating said thin film with a prescribed pattern of light including a deep ultraviolet ray having a wavelength not longer than 300 nm and then subjecting the thin film to development.
A method for forming a fine pattern of conjugated system polymer which comprises forming a thin film of a polymeric sulfonium salt having a recurring unit represented by the following general formula: ##STR4## wherein R 1 represents a group capable of conjugating with an adjacent vinylene group formed by elimination of sulfonium salt as a side chain, R 2 and R 3 each represents hydrocarbon group having 1 to 20 carbon atoms, and X - represents counter ion, on a substrate, irradiating said thin film with a prescribed pattern of light including a deep ultraviolet ray having a wavelength between 200 and 300 nm and then subjecting the thin film to development.
Claim 2
Independent Claim
112 words
A method for forming a fine pattern of conjugated system polymer which comprises forming a thin film of a polymeric sulfonium salt having a recurring unit represented by the following general formula: ##STR4## wherein R 1 represents a group capable of conjugating with an adjacent vinylene group formed by elimination of sulfonium salt as a side chain, R 2 and R 3 each represents hydrocarbon group having 1 to 20 carbon atoms, and X - represents counter ion, on a substrate, irradiating said thin film with a prescribed pattern of light including a deep ultraviolet ray having a wavelength between 200 and 300 nm and then subjecting the thin film to development.
Claim 3
Dependent Claim
27 words
A method for forming a pattern of conjugated system polymer according to claim 1, wherein said deep ultraviolet ray has a wavelength between 200 and 260 nm.
Claim 4
Dependent Claim
39 words
A method for forming a fine patern of conjugated stystem polymer according to claim 1, wherein a heat treatment of the fine pattern is carried out at a temperature of 100°-400° C. in an inert atmosphere after the development.