Apparatus and method for controlling irradiation of an electron beam at a fixed position in an electron beam tester system

Claim 1

An electron beam tester system having a beam control device for correcting a deviation from an irradiating position due to drift of the electron beam while measuring a sample, the system comprising: an electron gun for generating an electron beam for irradiating the sample; a deflecting coil for deflecting the electron beam generated from said electron gun; a scintillator for detecting a secondary electron generated due to irradiation of the electron beam onto said sample; a current/voltage converter for converting an output current of said scintillator to a voltage corresponding to said current; an image display device to which an output of said current/voltage converter converter is supplied and which displays an image obtained due to the irradiation of the electron beam onto the sample; binarizing means for binarizing the output voltage of the current/voltage converter; reference pattern data memory means for irradiating the electron beam from said electron gun onto a scanning area of the sample according to a specific pattern that is on said sample to be measured prior to measuring the sample, for detecting the secondary electron derived by said scintillator during irradiation of the sample, and for storing a binarized signal as reference pattern data, the binarized signal being derived by said binarizing means by binarizing the image signal obtained by converting an output current of said scintillator to a voltage by said current/voltage converter; analog/digital converting means for converting an analog deflection current, which is supplied to said deflecting coil, to digital data; reference deflection current memory means for storing a value of said deflection current coverted to the digital data by said analog/digital converting means when said reference pattern data is obtained; comparison pattern data memory means for interrupting the measurement of said sample to be measured, for deflecting the electron beam by supplying the deflection current stored in said reference deflection current memory means to said deflecting coil, for detecting the secondary electrons derived due to the irradiation of the electron beam by said scintillator, and for storing the binarized signal as comparison pattern data which is derived by said binarizing means by binarizing the image signal obtained by coverting the output current of the scintillator to the voltage by said current/voltage converter; comparison deflection current memory means for storing the deflection current which is obtained by converting the analog deflection current to the deflecting coil when obtaining said comparison pattern data to the digital data; exclusive OR means for obtaining an exclusive OR of the reference pattern data stored in said reference pattern data memory means and the comparison pattern data stored in said comparison pattern data memory means; deviation amount calculating means for calculating deviation amounts in saidcomparasion pattern data on the basis of the exclusive OR data derived by said exclusive OR means and said reference pattern data; deflection current converting means for converting the deviation amounts calculated by said deviation amount calculating means for to deflection currents for said deflecting coil; and digital/analog converting means for converting the digital comparison pattern data which is output from said deflection current converting means to the analog data and for supplying said analog data as drift correction data to said deflecting coil.

Claim 9

A method for correcting deviation of an irradiating position due to drift of an electron beam while measuring patterns on a sample by means of an electron beam tester system, said method comprising the steps of: selecting any one of the patterns of the sample as a reference pattern; storing a deflection current value, as a reference deflection current, of a deflecting coil when said reference pattern image is obtained; binarizing an image signal of a scanning area including said selected reference pattern image and obtaining reference pattern data; storing said reference pattern data; starting a measurement of said sample to be measured; interrupting the measurement of said sample to be measured; supplying said stored reference deflection current to the deflecting coil; binarizing the pattern image obtained due to the supply of said reference deflection current to the defecting coil and obtaining comparison pattern data; obtaining an exclusive OR of the binarized comparison, pattern data and the binarized reference pattern data; comparing the exclusive OR obtained in the preceding step with the binarized reference pattern data to determine any difference between the two patterns which results from drift of said electron beam; calculating a digital DC offset bias data for the deflecting coil based on the difference determined by said comparing step; and converting said digital DC offset bias data to analog data and supplying the analog data to the deflecting coil.

Claim 10

A method for correcting deviation of an irradiating position due to drift of an electron beam while measuring patterns on a sample by means of an electron beam tester system, said method comprising the steps of: selecting any one of the patterns of the sample as a reference pattern; storing a deflection current value, as a reference deflection current, of a deflecting coil when said reference pattern image is obtained; binarizing an image signal of a scanning area including said selected reference pattern image and obtaining reference pattern data; storing said reference pattern data; starting a measurement of said sample to be measured; interrupting the measurement of said sample to be measured; supplying said stored reference deflection current to the deflecting coil; binarizing the pattern image obtained due to the supply of said reference deflection current to the defecting coil and obtaining comparison pattern data; obtaining an exclusive OR of the binarized comparison, pattern data and the binarized reference pattern data; comparing the exclusive OR obtained in the preceding step with the binarized reference pattern data to determine any difference between the two patterns which results from drift of said electron beam; calculating a digital DC offset bias data for the deflecting coil based on the difference determined by said comparing step; and converting said digital DC offset bias data to analog data and supplying the analog data to the deflecting coil.