Mass for removal, through chemical sorption, of homogeneously dissolved impurities, particularly oxygen, from gases or liquids

Claim 1

In a procedure for producing a chromium-containing mass usable for removing oxygen impurities by chemical sorption from a gas to be purified wherein the mass is formed by applying chromium to an oxidic carrier, then activating the carrier with oxygen at an elevated temperature and then subjecting the activated carrier to a reduction step by treatment with a reducing gas before bringing the mass into contact with the gas to be purified, the improvement being in subjecting the activated carrier to a second stage of reduction by treatment with a reactive process gas selected from the group consisting of monosilane, disilane, halogensilane, dichlorosilane, diborane, arsine, phosphine, trimethylgallium, trimethylaluminum, trimethylindium, ethylgallium, ethylaluminum, and trimethylindium and mixtures there-of with inert gases whereby the mass is capable of removing oxygen in amounts as low as trace amounts from the gas to be purified including a reactive process gas containing oxygen impurities as well as from a gas selected from the group consisting of nitrous oxide, hydrogen halides, hydrogen sulfide, sulfur dioxide, ammonia, carbon dioxide, and saturated and aromatic hydrocarbons and ether.