← Back to Patent Explorer
US4798739A Expired / Lapsed US ⏱️ 0.0 years remaining

Plasma-assisted method for thin film fabrication

Assignee: SOLEMS 3 RUE LEON BLUM ZI LES GLAISES 91120 PALAISEAU (FRANCE) A CORP OF FRANCE SA
•
Filing: 1986-10-21
•
Granted: 1989-01-17
•
Expires: 2006-10-21
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A device has a low-pressure tank placed inside an airtight chamber for plasma-depositing onto at least two substrata spaced apart in a substantial parallel relationship in the tank thin films. To effect the decomposition of the gas reagent inside the tank, at least one perforated polarized plasma generating electrode is interposed between the substrate. The airtight chamber has a pressure lower than that of the tank.

Inventors

  • 👤 Jacques Schmitt

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 19:43
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/515

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 81 words
Process of forming thin films by means of a plasma assisted chemical deposit of the type having a non-airtight tank in which is enclosed at least one reagent gas, at least one substratum in the form of a support plate for the thin films, and at least one polarized plasma-generating electrode, the process comprising the steps of: placing the tank inside an airtight chamber; and maintaining lower pressure in the airtight chamber than in the tank wherein the reagent gas circulates.
Claim 2
Dependent Claim 81 words
Process of forming thin films by means of a plasma assisted chemical deposit of the type having a non-airtight tank in which is enclosed at least one reagent gas, at least one substratum in the form of a support plate for the thin films, and at least one polarized plasma-generating electrode, the process comprising the steps of: placing the tank inside an airtight chamber; and maintaining lower pressure in the airtight chamber than in the tank wherein the reagent gas circulates.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-01-17 1992-07-18 1993-01-17 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-01-17 1996-07-18 1997-01-17 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-01-17 2000-07-18 2001-01-17 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag