US4798663A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputtering installation for the reactive coating of a substrate with hard materials
Assignee: Balzers und Leybold Deutschland Holding AG
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Filing: 1986-01-31
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Granted: 1989-01-17
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Expires: 2006-01-31
Abstract
Abstract Sputtering apparatus for the reactive coating of substrates with hard substances, which has a housing (1) with a feed line (3, 4) for a reaction gas a nobble gas, a magnetron (6) as well as at least one mounting (9) for the substrates, the mounting (9) being positionable in front of the sputtering surface and between an ionization system with at least two electrodes (7, 8), of which the one electrode (8) is operable as an electron emitter and the other electrode (7) is at a positive potential with respect to the emitter electrode, and the substrate mounting (9) itself is at a negative voltage in relation to the ground.
Inventors
- 👤 Gunther Herklotz
- 👤 Hans Eligehausen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 21:46
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; H01J37/3405; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35; C23C14/354; C23C14/355; C23C14/54; C23C14/541
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
189 words
Sputtering apparatus for the reactive coating of substrates with hard substances, especially with titanium nitride or titanium carbide, which has an evacuable housing at ground potential with a feed line for a reaction gas and a noble gas, and in which the sputtering surface of a magnetron serving as sputtering unit as well as at least one mounting for the substrate are disposed, the substrates being positionable in front of the sputtering surface by means of the mounting, characterized in that the mounting for the substrates is disposed in an ionization system with at least two electrodes of which the one electrode is operable as an electron emitter and the other electrode is at positive potential with respect to the emitter electrode, and wherein the substrate mounting itself is at a negative voltage with respect to the ground, and in which at least one magnet system prolonging the path of the electrons leaving the emitter electrode is disposed in the housing, which magnet system is disposed opposite the sputtering surface of the magnetron and the substrate and the electrodes are disposed between the sputtering surface and the magnet system.
Claim 2
Dependent Claim
189 words
Sputtering apparatus for the reactive coating of substrates with hard substances, especially with titanium nitride or titanium carbide, which has an evacuable housing at ground potential with a feed line for a reaction gas and a noble gas, and in which the sputtering surface of a magnetron serving as sputtering unit as well as at least one mounting for the substrate are disposed, the substrates being positionable in front of the sputtering surface by means of the mounting, characterized in that the mounting for the substrates is disposed in an ionization system with at least two electrodes of which the one electrode is operable as an electron emitter and the other electrode is at positive potential with respect to the emitter electrode, and wherein the substrate mounting itself is at a negative voltage with respect to the ground, and in which at least one magnet system prolonging the path of the electrons leaving the emitter electrode is disposed in the housing, which magnet system is disposed opposite the sputtering surface of the magnetron and the substrate and the electrodes are disposed between the sputtering surface and the magnet system.
Claim 3
Dependent Claim
26 words
Sputtering apparatus according to claim 1, characterized in that the at least one positive electrode is on the side of the substrate mounting facing the magnetron.
Claim 4
Dependent Claim
20 words
Sputtering apparatus according to claim 2, characterized in that the at least one positive electrode is immediately adjacent the magnetron.
Claim 5
Dependent Claim
53 words
Sputtering apparatus according to claim 3, characterized in that, in a magnetron with a rectangular sputtering surface, the positive electrode consists of an electrode pair which is disposed on either side of the magnetron and in each case is disposed in the immediate vicinity of the two longest edges of the sputtering surface.
Claim 6
Dependent Claim
29 words
Sputtering apparatus according to claim 1, characterized in that the at least one emitter electrode lies on the side of he substrate mounting that faces away from the magnetron.
Claim 7
Dependent Claim
37 words
Sputtering apparatus according to claim 5, characterized in that, in a magnetron with a rectangular sputtering surface, the emitter electrode consists of an electrode pair of which each electrode is parallel to each of the positive electrodes.
Claim 8
Dependent Claim
49 words
Sputtering apparatus according to claim 6, characterized in that the electrodes lie within a plane that intersects them and is radial to the housing axis, at the corners of a rectangle, two corners lying in each case on either side of a path of movement for the substrate mounting.
Claim 9
Dependent Claim
42 words
Sputtering apparatus according to claim 1, characterized in that the magnet system consists of magnets lying one inside the other, each of opposite polarity, such that a tunnel closed on itself, composed of arcuate magnetic lines of force, issues from the magnets.
Claim 10
Dependent Claim
64 words
Sputtering apparatus according to claim 8, characterized in that the magnet system is disposed on the back (37) of a plate consisting of nonmagnetic material, such that the tunnel is on the front side of the plate, and that the at least one emitter electrode is disposed in the immediate vicinity of the tunnel and parallel to the plate on the front side thereof.
Claim 11
Dependent Claim
32 words
Sputtering apparatus according to claim 9, characterized in that, in a magnetron with a rectangular sputtering surface, the magnetic tunnel has two parallel long sides to which the emitter electrodes are parallel.
Claim 12
Dependent Claim
61 words
Sputtering apparatus according to claim 10, characterized in that the plate is the front side of a rectangular box to whose ends the ends of the emitter electrodes are fastened in an electrically conductive manner, and in whose center a contact means is fastened in an electrically insulated manner, through which a heating voltage can be delivered to the emitter electrodes.
Claim 13
Dependent Claim
17 words
Sputtering apparatus according to claim 11, characterized in that the plate is provided with a cooling system.
Claim 14
Dependent Claim
23 words
Sputtering apparatus according to claim 1, characterized in that the magnetron is surrounded on its circumference by a frame of a magnetizable material.
References Cited (Backward Citations)
US3516919A
Cited
DE1515294A1
Cited
US3844924A
Cited
US3892650A
Cited
US4221652A
Cited
US4038171A
Cited
US4046666A
Cited
US4111783A
Cited
US4252626A
Cited
US4389299A
Cited
US4422916A
Cited
GB2096177A
Cited
US4411763A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-01-17 | 1992-07-18 | 1993-01-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-01-17 | 1996-07-18 | 1997-01-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-01-17 | 2000-07-18 | 2001-01-17 | $7700.00 | Window Closed / Lapsed |