US4779282A
Expired / Lapsed
US
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Low leakage current GaInAsP/InP buried heterostructure laser and method of fabrication
Assignee: Raytheon Co
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Filing: 1987-10-05
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Granted: 1988-10-18
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Expires: 2007-10-05
Abstract
Abstract The device provided is a GaInAsP/InP laser, of the buried heterostructure type, fabricated by a two-step liquid-phase epitaxy technique. The active region is defined by a mesa etch to achieve low threshold current and a single transverse optical mode. The mesa is subsequently buried by a second step of liquid-phase epitaxy for optical and current confinement. A low bandgap heterobarrier is employed to reduce leakage current near the active region at high current biases. A contact layer is grown directly over a majority carrier confining clad layer to reduce defects in the crystal face on the side of the clad layer, and thereby further reduce leakage current.
Inventors
- 👤 Willie W. Ng
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 13:12
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/20; H01S5/22; H01S5/227; H01S5/06; H01S5/062; H01S5/06209; H01S5/06213; H01S5/2275
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
155 words
A buried heterostructure semiconductor laser, comprising: a p-type doped semiconductor substrate, a semiconductor p-type buffer layer, active region and n-type clad layer formed in succession over the substrate and collectively forming a mesa shape, first and second blocking layers of oppositely doped semiconductor material of n and p type conductivity, respectively disposed in succession over the buffer layer lateral to the active region and forming a blocking p-n junction to confine majority carrier flow to the active region, a layer of n-type doped semiconductor material having a lower bandgap than the first blocking layer disposed between said buffer layer and said first blocking layer, an electrically conductive n-type doped semiconductor contact layer overlying and in direct contact with said second blocking layer and said clad layer, an insulating layer overlying said contact layer above said second blocking layer and generally lateral to said clad layer, and an electrical contact overlying said insulating and contact layers.
Claim 2
Dependent Claim
155 words
A buried heterostructure semiconductor laser, comprising: a p-type doped semiconductor substrate, a semiconductor p-type buffer layer, active region and n-type clad layer formed in succession over the substrate and collectively forming a mesa shape, first and second blocking layers of oppositely doped semiconductor material of n and p type conductivity, respectively disposed in succession over the buffer layer lateral to the active region and forming a blocking p-n junction to confine majority carrier flow to the active region, a layer of n-type doped semiconductor material having a lower bandgap than the first blocking layer disposed between said buffer layer and said first blocking layer, an electrically conductive n-type doped semiconductor contact layer overlying and in direct contact with said second blocking layer and said clad layer, an insulating layer overlying said contact layer above said second blocking layer and generally lateral to said clad layer, and an electrical contact overlying said insulating and contact layers.
Claim 3
Dependent Claim
38 words
The semiconductor laser of claim 1, wherein said substrate, buffer layer and second blocking layer comprise p-type InP, said first blocking, clad, and contact layers comprise n-type InP, and said active region and low bandgap layers are GaInAsP.
Claim 4
Dependent Claim
19 words
The semiconductor laser of claim 2, wherein said insulating layer comprises SiO 2 and said electrical contact comprises Au.
Claim 5
Dependent Claim
163 words
A buried heterostructure semiconductor laser, comprising: a p-type substrate, a p-type buffer layer contiguous with and overlying said substrate, an active semiconductor region contiguous with and overlying a central portion of said buffer layer, an n-type heterobarrier layer contiguous with and overlying said buffer layer and extending generally laterally from said active region, an n-type blocking layer contiguous with and overlying said heterobarrier layer extending generally laterally from said active region, an n-type clad contiguous with and overlying said active region, a p-type blocking layer contiguous with and overlying said n-type blocking layer extending generally laterally from said active region, a n-type doped semiconductor contact layer contiguous with and overlying said p-type blocking layer and said clad layer, an insulating layer contiguous with and overlying said contact layer generally lateral to said clad layer to expose a central portion of said contact layer, and an electrically conductive contact contiguous with and overlying said insulating layer and the exposed portion of said contact layer.
Claim 6
Dependent Claim
163 words
A buried heterostructure semiconductor laser, comprising: a p-type substrate, a p-type buffer layer contiguous with and overlying said substrate, an active semiconductor region contiguous with and overlying a central portion of said buffer layer, an n-type heterobarrier layer contiguous with and overlying said buffer layer and extending generally laterally from said active region, an n-type blocking layer contiguous with and overlying said heterobarrier layer extending generally laterally from said active region, an n-type clad contiguous with and overlying said active region, a p-type blocking layer contiguous with and overlying said n-type blocking layer extending generally laterally from said active region, a n-type doped semiconductor contact layer contiguous with and overlying said p-type blocking layer and said clad layer, an insulating layer contiguous with and overlying said contact layer generally lateral to said clad layer to expose a central portion of said contact layer, and an electrically conductive contact contiguous with and overlying said insulating layer and the exposed portion of said contact layer.
Claim 7
Dependent Claim
38 words
The semiconductor laser of claim 4, wherein said substrate, buffer layer and p-type blocking layer comprise p-type InP, said first blocking, clad, and contact layers comprises n-type InP, and said active region and heterobarrier layers comprise substantially GaInAsP.
Claim 8
Dependent Claim
17 words
The semiconductor laser of claim 5, wherein said active region has a width of about 1 micron.
Claim 9
Dependent Claim
21 words
The semiconductor laser of claim 4, wherein said insulating layer comprises SiO 2 and has a thickness of about 400 nanometers.
Claim 10
Dependent Claim
12 words
The semiconductor laser of claim 4, wherein said electrical contact comprises Au.
References Cited (Backward Citations)
US4425650A
Cited
US4426700A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1991-10-18 | 1992-04-18 | 1992-10-18 | $2000.00 | Window Closed / Lapsed |
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