US4777119A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for developing poly(methacrylic anhydride) resists
Assignee: The AT&T MVPD Group LLC
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Filing: 1987-01-07
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Granted: 1988-10-11
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Expires: 2007-01-07
Abstract
Abstract The present invention relates to a process for forming an image with a positive resist, said process involves the steps of forming on a substrate a positive resist layer of poly(methacrylic anhydride). The resist layer baked at a temperature of 200 DEG C. to 350 DEG C. and thereafter irradiated with a pedetermined pattern of ionizing radiation. The irradiated area is then developed utilizing a developer solvent that is composed of solution of a base selected from the group consisting of alkali metal hydrozides, ammonium hydroxides (including quarternary ammonium hydroxides), alkali metal alkoxides and alkali metal carbonates; and a hydroxylic solvent selected from the group consisting of branched or straight chain alcohols having a C1-C12 carbon content and water or mixtures thereof; and rinsing the resist with the same solvent selected above.
Inventors
- 👤 Robert G. Brault
- 👤 Leroy J. Miller
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 07:15
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
130 words
A process for forming an image with a positive resist, said process comprising the steps of: (a) forming on a substrate a positive resist layer of poly(methacrylic anhydride); (b) baking the resist at a temperature of 200° to 350° C.; (c) irradiating said resist layer with a predetermined pattern of ionizing radiation; (d) developing the irradiated area with a developer comprising a solution of a base selected from the group consisting of alkali metal hydroxides, ammonium hydroxides (including quarternary ammonium hydroxides), alkali metal alkoxides and alkali metal carbonates; and a hydroxylic solvent selected from the group consisting of branched or straight chain alcohols having a C 1 -C 12 carbon content and water or mixtures thereof; and (e) rinsing the resist with the same solvent selected above, or with water.
Claim 2
Dependent Claim
130 words
A process for forming an image with a positive resist, said process comprising the steps of: (a) forming on a substrate a positive resist layer of poly(methacrylic anhydride); (b) baking the resist at a temperature of 200° to 350° C.; (c) irradiating said resist layer with a predetermined pattern of ionizing radiation; (d) developing the irradiated area with a developer comprising a solution of a base selected from the group consisting of alkali metal hydroxides, ammonium hydroxides (including quarternary ammonium hydroxides), alkali metal alkoxides and alkali metal carbonates; and a hydroxylic solvent selected from the group consisting of branched or straight chain alcohols having a C 1 -C 12 carbon content and water or mixtures thereof; and (e) rinsing the resist with the same solvent selected above, or with water.
Claim 3
Dependent Claim
54 words
The method of claim 1 wherein the formation of a positive resist layer of poly(methacrylic anhydride) further comprises: (a) coating the substrate with a solution of poly(tert-butyl methacrylate); and (b) heating the coated substrate to about 220° to 280° C. for 1 to 24 hours to sufficiently convert the resist film to poly(methacrylic anhydride).
Claim 4
Dependent Claim
17 words
The process of claim 1 wherein the base is potassium hydroxide and the hydroxylic solvent is 2-ethoxyethanol.
Claim 5
Dependent Claim
19 words
The process of claim 1 wherein the concentration of the base in the hydroxylic solvent is .5M to 1M.
Claim 6
Dependent Claim
17 words
The process of claim 1 wherein the base is sodium hydroxide and the hydroxylic solvent is cellosolve.
Claim 7
Dependent Claim
17 words
The process of claim 1 wherein the base is potassium hydroxide and the hydroxylic solvent is water.
Claim 8
Dependent Claim
17 words
The process of claim 1 wherein the base is sodium hydroxide and the hydroxylic solvent is water.
Claim 9
Dependent Claim
17 words
The process of claim 1 wherein the base is potassium carbonate and the hydroxylic solvent is water.
Claim 10
Dependent Claim
17 words
The process of claim 1 wherein the base is sodium carbonate and the hydroxylic solvent is water.
Claim 11
Dependent Claim
17 words
The process of claim 1 wherein the base is tetrabutylammonium hydroxide and the hydroxylic solvent is water.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-10-11 | 1992-04-11 | 1992-10-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-10-11 | 1996-04-11 | 1996-10-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-10-11 | 2000-04-11 | 2000-10-11 | $7700.00 | Window Closed / Lapsed |