US4264715A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of preparing resist pattern
Assignee: Toshiba Corp
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Filing: 1979-11-14
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Granted: 1981-04-28
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Expires: 1999-11-14
Abstract
Abstract A method of preparing a fine and highly precise resist pattern comprising a step of forming a positive resist layer consisting of poly-(methacrylic anhydride) on a substrate, a step of irradiating the resist layer thus formed with a predetermined pattern of ionizing radiation and a step of developing the irradiated resist pattern with a developer comprising a solvent mixture composed of a polar organic solvent (A) capable of dissolving poly-(methyacrylic anhydride) and a non-solvent (B) incapable of dissolving poly-(methacrylic anhydride).
Inventors
- 👤 Akira Miura
- 👤 Shozo Hideyama
- 👤 Iwao Higashikawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 05:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/26; G03F7/30; G03F7/32; G03F7/325
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
141 words
A method of preparing a resist pattern comprising a step of forming a positive resist layer consisting of poly-(methacrylic anyhdride), a step of irradiating said resist layer with a predetermined pattern of ionizing radiation, and a step of developing the irradiated area with a developer comprising a mixture solvent composed of a polar organic solvent (A) capable of dissolving poly-(methacrylic anhydride) and a solvent (B) which is a non-solvent for poly-(methacrylic anyhdride, said solvent (A) being at least one member selected from the group consisting of dimethylformamide, dimethylacetoamide, N-methylpyrrolidone and dimethylsulfoxide, said solvent (B) being at least one member selected from the group consisting of benzene, toluene chlorobenzene, methylisobutylketone, methylethylketone, ethyl acetate, isoamyl acetate, butyl cellosolve acetate and ethyl cellosolve acetate, and the weight ratio of said solvent (A) to said solvent (B) being within a range between 1/4 to 4/1.
Claim 2
Independent Claim
141 words
A method of preparing a resist pattern comprising a step of forming a positive resist layer consisting of poly-(methacrylic anyhdride), a step of irradiating said resist layer with a predetermined pattern of ionizing radiation, and a step of developing the irradiated area with a developer comprising a mixture solvent composed of a polar organic solvent (A) capable of dissolving poly-(methacrylic anhydride) and a solvent (B) which is a non-solvent for poly-(methacrylic anyhdride, said solvent (A) being at least one member selected from the group consisting of dimethylformamide, dimethylacetoamide, N-methylpyrrolidone and dimethylsulfoxide, said solvent (B) being at least one member selected from the group consisting of benzene, toluene chlorobenzene, methylisobutylketone, methylethylketone, ethyl acetate, isoamyl acetate, butyl cellosolve acetate and ethyl cellosolve acetate, and the weight ratio of said solvent (A) to said solvent (B) being within a range between 1/4 to 4/1.
Claim 3
Dependent Claim
30 words
The method according to claim 1, wherein polymethacrylic acid or polymethacrylate is used as a starting material in said step of forming a positive resist layer consisting of poly-(methacrylic anhydride).
Claim 4
Dependent Claim
25 words
The method according to claim 2, wherein said poly-methacrylate is polyalkyl methacrylate having an alkyl group with a carbon atom number of 4 or above.
Claim 5
Dependent Claim
36 words
The method according to claim 2 or 3, wherein said step of forming a positive resist layer consists of coating polymethacrylic acid or polymethacrylate on said substrate and thermally treating the coating at 200°to 250° C.
Claim 6
Dependent Claim
51 words
The method according to claim 2 or 3, wherein said step of forming a positive resist layer consists of converting polymethacrylic acid or polymethacrylate into poly-(methacrylic anhydride) through thermal treatment at 200° to 250° C. dissolving said poly-(methacrylic anhydride) in said solvent (A) and coating the resultant solution on said substrate.
Claim 7
Dependent Claim
24 words
The method according to claim 1, wherein said ionizing radiation is selected from a group consisting of an electron beam, X-rays, γ-rays and α-rays.
Claim 8
Dependent Claim
29 words
The method according to claim 1, wherein said non-solvent (B) is at least a member of a group consisting of an aromatic series solvent and a ketone series solvent.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-04-27 | 1984-10-27 | 1985-04-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-04-27 | 1988-10-27 | 1989-04-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-04-27 | 1992-10-27 | 1993-04-28 | $7700.00 | Window Closed / Lapsed |