US4768883A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Alignment reticle for a semiconductor wafer stepper system and method of use
Assignee: NXP USA Inc
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Filing: 1986-11-07
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Granted: 1988-09-06
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Expires: 2006-11-07
Abstract
Abstract In a semiconductor wafer stepper system, a reticle having an alignment mark positioned adjacent the center thereof and utilized to align each wafer in the stepper system, as well as to adjust the stepper software of the system.
Inventors
- 👤 Whitson G. Waldo
- 👤 Lawrence M. Genduso
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 09:01
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
156 words
A method of determining software corrections to provide correct baseline distances for off axis alignment stepper systems including microscope alignment apparatus and software for stepping functions, comprising the steps of: providing a reticle with a center and an alignment mark located at the center of said reticle; placing said reticle in the alignment stepper system to be corrected; placing a resist coated wafer in the alignment stepper system; bringing the resist coated wafer to an aligned position with the reticle and noting the position in the alignment stepper system; exposing the resist coated wafer through the reticle twice at spaced apart positions corresponding to the microscope alignment apparatus; developing the resist coated wafer while maintaining the wafer mounted in the alignment stepper system; aligning the developed alignment marks in the microscope alignment apparatus and noting the position in the alignment stepper system; and adjusting the software in accordance with the difference between the two noted positions.
Claim 2
Independent Claim
156 words
A method of determining software corrections to provide correct baseline distances for off axis alignment stepper systems including microscope alignment apparatus and software for stepping functions, comprising the steps of: providing a reticle with a center and an alignment mark located at the center of said reticle; placing said reticle in the alignment stepper system to be corrected; placing a resist coated wafer in the alignment stepper system; bringing the resist coated wafer to an aligned position with the reticle and noting the position in the alignment stepper system; exposing the resist coated wafer through the reticle twice at spaced apart positions corresponding to the microscope alignment apparatus; developing the resist coated wafer while maintaining the wafer mounted in the alignment stepper system; aligning the developed alignment marks in the microscope alignment apparatus and noting the position in the alignment stepper system; and adjusting the software in accordance with the difference between the two noted positions.
Claim 3
Independent Claim
145 words
A method of manufacturing semiconductor dies using off axis alignment stepper systems including microscope alignment apparatus and software for stepping functions, comprising the steps of: providing a reticle with a center and an alignment mark located at the center of said reticle; placing said reticle in the alignment stepper system to be used in the manufacture of semiconductor dies; placing a resist coated wafer in the alignment stepper system; exposing the resist coated wafer through the reticle twice at spaced apart positions corresponding to the microscope alignment apparatus; developing the resist coated wafer while maintaining the wafer mounted in the alignment stepper system; aligning the developed alignment marks in the microscope alignment apparatus and noting the position in the alignment stepper system; adjusting the software in accordance with the difference between the two noted positions; and using the alignment stepper system to manufacture semiconductor dies.
Claim 4
Independent Claim
145 words
A method of manufacturing semiconductor dies using off axis alignment stepper systems including microscope alignment apparatus and software for stepping functions, comprising the steps of: providing a reticle with a center and an alignment mark located at the center of said reticle; placing said reticle in the alignment stepper system to be used in the manufacture of semiconductor dies; placing a resist coated wafer in the alignment stepper system; exposing the resist coated wafer through the reticle twice at spaced apart positions corresponding to the microscope alignment apparatus; developing the resist coated wafer while maintaining the wafer mounted in the alignment stepper system; aligning the developed alignment marks in the microscope alignment apparatus and noting the position in the alignment stepper system; adjusting the software in accordance with the difference between the two noted positions; and using the alignment stepper system to manufacture semiconductor dies.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-09-06 | 1992-03-07 | 1992-09-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-09-06 | 1996-03-07 | 1996-09-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-09-06 | 2000-03-07 | 2000-09-06 | $7700.00 | Window Closed / Lapsed |