Floating gate memory device with facing asperities on floating and control gates
Abstract
Abstract A floating gate memory device includes a substrate of semiconductor material having on a surface thereof a layer of insulating material. On the insulating layer is a floating gate of conductive polycrystalline silicon with the floating gate having a textured outer surface and relatively smoother sidewalls. A second layer of insulating material extends over the outer surface and sidewalls of the floating gate. The portion of the second insulating material over the outer surface of the floating gate has a textured surface and is thinner than the portions of the second insulating layer over the sidewalls of the floating gate. A control gate is over the second insulating layer and extends over the outer surface and sidewalls of the floating gate. The control gate is of conductive polycrystalline silicon and has an inner surface portion over the textured outer surface of the control gate which is textured and has undulations which substantially follow the undulations of the textured surface of the floating gate.
Inventors
- 👤 Lorenzo Faraone
Bibliographic Details
Claims Analysis
Total Claims: 6References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-07-12 | 1992-01-11 | 1992-07-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-07-12 | 1996-01-11 | 1996-07-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-07-12 | 2000-01-11 | 2000-07-12 | $7700.00 | Window Closed / Lapsed |