Abstract An electron beam metrology system for measuring the width of a pattern on a surface of a sample in such a manner that the surface of the sample is scanned with an electron beam, secondary electrons emitted from the surface are detected to obtain a detection signal, and the width of the pattern is measured by using the detection signal, is disclosed in which a pair of detectors are disposed symmetrically with respect to the optical axis of the electron beam in a scanning direction thereof, a ratio of one of the output signals of the detectors to the other output signal and a ratio of the other output signal to the one output signal are formed, and a sum signal indicative of the sum of two ratios is produced, to be used for measuring the width of the pattern correctly and accurately, without being affected by a change in pattern material.
An electron beam metrology system for measuring the width of a pattern on a surface of a sample by scanning the surface of the sample with an electron beam, detecting secondary electrons or others emitted from the surface of the sample to obtain a detection signal, and measuring the width of the pattern by using the detection signal, said electron beam metrology system comprising: detection means including a pair of detectors for obtaining the detection signal, said detectors being disposed symmetrically with respect to the optical axis of the electron beam in a scanning direction of the electron beam; means for obtaining a first ratio signal indicative of a ratio of the output signal of one of the detectors to the output signal of the other detector, and for obtaining a second ratio signal indicative of a ratio of the output signal of the other detector to the output signal of the one detector; and means for obtaining a sum signal indicative of the sum of the first ratio signal and the second ratio signal.
Claim 2
Dependent Claim
175 words
An electron beam metrology system for measuring the width of a pattern on a surface of a sample by scanning the surface of the sample with an electron beam, detecting secondary electrons or others emitted from the surface of the sample to obtain a detection signal, and measuring the width of the pattern by using the detection signal, said electron beam metrology system comprising: detection means including a pair of detectors for obtaining the detection signal, said detectors being disposed symmetrically with respect to the optical axis of the electron beam in a scanning direction of the electron beam; means for obtaining a first ratio signal indicative of a ratio of the output signal of one of the detectors to the output signal of the other detector, and for obtaining a second ratio signal indicative of a ratio of the output signal of the other detector to the output signal of the one detector; and means for obtaining a sum signal indicative of the sum of the first ratio signal and the second ratio signal.