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US4748646A Expired / Lapsed US ⏱️ 0.0 years remaining

X-ray lithography system

Assignee: Fujitsu Ltd
•
Filing: 1987-03-18
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Granted: 1988-05-31
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Expires: 2007-03-18
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Abstract

Abstract An X-ray lithography system, in which an X-ray beam is separated from synchrotron radiation beams and reflected by a scanning mirror which vertically scans the reflected X-ray beam. The X-ray is irradiated into an exposure chamber via a beryllium window, which is vertically oscillated in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam.

Inventors

  • 👤 Toshihiko Osada
  • 👤 Ichiro Honjo
  • 👤 Kenji Sugishima

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 04:23
CPC Classifications
H; H05; H05G; H05G1/00; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70075; G03F7/708; G03F7/70808

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 128 words
An X-ray lithography system comprising: means for generating synchrotron beams and separating an X-ray beam thereform a vacuum chamber for defining a passage of the X-ray beam; a scanning mirror arranged in one section of said vacuum chamber for reflecting the X-ray beam; means for oscillating said scanning mirror so as to scan the reflected X-ray beam in a vertical direction; a beryllium window defined as a part of said vacuum chamber, through which the X-ray beam is irradiated into an exposure chamber in which is arranged a work piece to be exposed to the X-ray radiation; and, means for vertically oscillating said beryllium window in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam.
Claim 2
Dependent Claim 128 words
An X-ray lithography system comprising: means for generating synchrotron beams and separating an X-ray beam thereform a vacuum chamber for defining a passage of the X-ray beam; a scanning mirror arranged in one section of said vacuum chamber for reflecting the X-ray beam; means for oscillating said scanning mirror so as to scan the reflected X-ray beam in a vertical direction; a beryllium window defined as a part of said vacuum chamber, through which the X-ray beam is irradiated into an exposure chamber in which is arranged a work piece to be exposed to the X-ray radiation; and, means for vertically oscillating said beryllium window in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam.
Claim 3
Dependent Claim 35 words
A system as set forth in claim 1, wherein said beryllium window is relatively wide in a horizontal direction, but narrow in the vertical direction, and the thickness of said beryllium window is relatively thin.
Claim 4
Dependent Claim 41 words
A system as set forth in claim 1, wherein said beryllium window is relatively wide in a horizontal direction, but narrow in the vertical direction and has a size of 50 mm×5 mm, and a relatively thin thickness of, 10 μm.
Claim 5
Dependent Claim 35 words
A system as set forth in claim 1, wherein the oscillating means for the mirror and the oscillating means for the window comprise each linear motor separate, said linear motors are connected to a controller.

References Cited (Backward Citations)

US4516254A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1991-05-31 1991-11-30 1992-05-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1995-05-31 1995-11-30 1996-05-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1999-05-31 1999-11-30 2000-05-31 $7700.00 Window Closed / Lapsed

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