Process for preparing thin film having high light transmittance

Claim 2

A process for preparing a thin coated film, which comprises coating, by vacuum vapor deposition, a thin film of a transparent resin selected from the group consisting of cellulose nitrate, cellulose acetate propionate, cellulose acetate butyrate, cellulose acetate, cellulose propionate and cyanoethyl cellulose and having a uniform thickness of 0.5 to 10 μm, with a colorless metal fluoride or oxide to a thickness of about 100 nm or one or both surfaces of said thin film while holding said thin film in a uniformly tensioned state.

Claim 3

A process for preparing a thin coated film as claimed in claim 1, wherein said coating comprises a double layer structure consisting of a layer of calcium fluoride deposited on said resin and a layer of magnesium fluoride or silicon dioxide deposited on said calcium fluoride layer.

Claim 4

A process for preparing a thin coated film as claimed in claim 1, wherein said thin film is made of cellulose nitrate, and the coating is calcium fluoride.

Claim 5

A process for preparing a thin coated film, comprising holding a 0.5-10 μm thick film of a transparent resin in a uniformly tensioned state and coating by vapor deposition at least one surface of said film with a coating of a fluoride or oxide of a metal selected from the group consisting of calcium fluoride, barium fluoride, sodium fluoride, magnesium fluoride and silicon dioxide to a thickness of about 100 nm, by heating said oxide or fluoride of metal in a vacuum of from 10 -3 -10 -5 Torr, under conditions effective for vacuum vapor deposition of said coating on said transparent resin, wherein said metal is deposited in its fluoride or oxide state, the resulting coated film having a transmittance of 96% or more for light having a wavelength in the range of 300-700 nm.

Claim 6

A process for preparing a thin coated film, comprising holding a 0.5-10 μm thick film of a transparent resin in a uniformly tensioned state and coating by vapor deposition at least one surface of said film with a coating of a fluoride or oxide of a metal selected from the group consisting of calcium fluoride, barium fluoride, sodium fluoride, magnesium fluoride and silicon dioxide to a thickness of about 100 nm, by heating said oxide or fluoride of metal in a vacuum of from 10 -3 -10 -5 Torr, under conditions effective for vacuum vapor deposition of said coating on said transparent resin, wherein said metal is deposited in its fluoride or oxide state, the resulting coated film having a transmittance of 96% or more for light having a wavelength in the range of 300-700 nm.

Claim 7

A process as claimed in claim 4, wherein said coating is transparent to radiation having a wavelength of 436 μm.

Claim 8

A process as claimed in claim 4, wherein said thin film comprises a transparent resin selected from the group consisting of cellulose nitrate, cellulose acetate propionate, cellulose acetate butyrate and cyanoethyl cellulose.

Claim 9

A process for preparing a thin transparent resin film having a high light transmittance of 96% or higher, for light having a wavelength of from 300 to 700 nm, which comprises the steps of: forming a thin, nonoriented, substrate film having a thickness of from 0.5 to 10 μm of a transparent resin having a refractive index, at 300 to 700 nm, in the range of from about 1.50 to about 1.55, said resin being selected from the group consisting of cellulose nitrate, cellulose acetate, cellulose propionate, cellulose acetate propionate, cellulose acetate butyrate and cyanoethyl cellulose, and supporting said substrate film on a frame so that said substrate film is in a uniformly tensional state, then coating, by vacuum vapor deposition, one or both surfaces of said substrate film with a coating layer consisting of transparent material having a refractive index lower than that of said transparent resin and selected form the group consisting of calcium fluoride, barium fluoride, sodium fluoride and magnesium fluoride, said coating layer having a thickness such that the light transmittance of said coated transparent resin film is 96% or higher, for light having a wavelength of from 300 to 700 nm.

Claim 10

A process for preparing a thin transparent resin film having a high light transmittance of 96% or higher, for light having a wavelength of from 300 to 700 nm, which comprises the steps of: forming a thin, nonoriented, substrate film having a thickness of from 0.5 to 10 μm of a transparent resin having a refractive index, at 300 to 700 nm, in the range of from about 1.50 to about 1.55, said resin being selected from the group consisting of cellulose nitrate, cellulose acetate, cellulose propionate, cellulose acetate propionate, cellulose acetate butyrate and cyanoethyl cellulose, and supporting said substrate film on a frame so that said substrate film is in a uniformly tensional state, then coating, by vacuum vapor deposition, one or both surfaces of said substrate film with a coating layer consisting of transparent material having a refractive index lower than that of said transparent resin and selected form the group consisting of calcium fluoride, barium fluoride, sodium fluoride and magnesium fluoride, said coating layer having a thickness such that the light transmittance of said coated transparent resin film is 96% or higher, for light having a wavelength of from 300 to 700 nm.

Claim 11

A process as claimed in claim 7 in which the thickness of said coating layer is about 1/4 of the wavelength of the light that is to be transmitted through said thin transparent resin film.

Claim 12

A process as claimed in claim 7 in which the thickness of said coating layer is about 100 nm.

Claim 13

A process as claimed in claim 7 in which said transparent material has a refractive index of less than 1.3.

Claim 14

A process as claimed in claim 7 in which said thin substrate film consists of cellulose nitrate and said coating layer consists of calcium fluoride.

Claim 15

A process as claimed in claim 7 in which said thin substrate film consisting of cellulose nitrate and said coating layer consists of a first sublayer of calcium fluoride deposited on said substrate film and a second sublayer of magnesium fluoride or silicon dioxide deposited on said first sublayer.

Claim 16

A process as claimed in claim 7 in which a coating layer is coated on both surfaces of said substrate film.