US4172156A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of depositing a reflection reducing coating on substrates of organic material
Assignee: OC Oerlikon Balzers AG
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Filing: 1977-12-23
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Granted: 1979-10-23
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Expires: 1997-12-23
Abstract
Abstract A method of depositing a reflection reducing coating on a substrate of oric material preferably on a spectacle glass of plastic by evaporation in a vacuum comprises depositing chromium by evaporation in an oxygen atmosphere under a pressure of betweeen 4×10 -5 and 8×10 -5 torr at a rate of from 0.01 to 0.05 nm per second and in a thickness of from 1 to 10 nm.
Inventors
- 👤 Elmar Ritter
- 👤 Ludwig R. Kaminski
- 👤 Karl Hohenegger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 05:20
CPC Classifications
G; G02; G02B; G02B1/00; G02B1/10; G02B1/11; G02B1/113; B; B29; B29D; B29D11/00; B29D11/00009; B29D11/00865; G02B1/04
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
161 words
A method of depositing a reflection reducing coating on substrates of organic material, preferably on spectacle glasses of plastic, by evaporation in vacuum, comprising depositing chromium on the substrate in a first layer and in an oxygen atmosphere under a pressure of between 4×10 -5 and 8×10 5 torr by evaporation at a rate of 0.01 to 0.05 nm per second and in a thickness of 1 to 10 nm; then depositing SiO 2 in a second layer over said first layer by means of an electron beam evaporation source and under a pressure of less than 5×10 -5 torr, by evaporation at a rate of 0.5 to 1.5 nm per second and in a thickness of 50 to 150 nm to form a complete coating and thereupon, in an oxygen atmosphere under a pressure of 0.1 to 0.01 torr and with a glow potential of less than 3000 V, subjecting the complete coating to after-glowing for 1 to 10 minutes.
Claim 2
Independent Claim
161 words
A method of depositing a reflection reducing coating on substrates of organic material, preferably on spectacle glasses of plastic, by evaporation in vacuum, comprising depositing chromium on the substrate in a first layer and in an oxygen atmosphere under a pressure of between 4×10 -5 and 8×10 5 torr by evaporation at a rate of 0.01 to 0.05 nm per second and in a thickness of 1 to 10 nm; then depositing SiO 2 in a second layer over said first layer by means of an electron beam evaporation source and under a pressure of less than 5×10 -5 torr, by evaporation at a rate of 0.5 to 1.5 nm per second and in a thickness of 50 to 150 nm to form a complete coating and thereupon, in an oxygen atmosphere under a pressure of 0.1 to 0.01 torr and with a glow potential of less than 3000 V, subjecting the complete coating to after-glowing for 1 to 10 minutes.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-10-22 | 1983-04-23 | 1983-10-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-10-22 | 1987-04-23 | 1987-10-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-10-22 | 1991-04-23 | 1991-10-23 | $7700.00 | Window Closed / Lapsed |