Patent US4745287A successfully refreshed from Google Patents.
US4745287A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Ion implantation with variable implant angle
Assignee: Varian Semiconductor Equipment Associates Inc
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Filing: 1986-10-23
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Granted: 1988-05-17
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Expires: 2006-10-23
Abstract
Abstract A target holder for an ion implantation system is disclosed. The targets are supported on a disk which is mounted on a motor which spins the disk. The motor is in turn mounted on a shaft which makes a reciprocating scanning movement along its axis. The spinning of the disk and the reciprocation of the shaft provide uniform exposure of the targets to the incident ion beam. In addition, the shaft can be rotated about its axis to control the angle of incidence of the ion beam as it strikes the targets.
Inventors
- 👤 Norman L. Turner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 14:29
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3171; H10; H10P; H10P72/00; H10P72/50
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
114 words
Ion implantation apparatus in which the implant angle may be varied during implantation comprising, in combination, means for producing an ion beam, a wafer support comprising a spinning disk and adapted to support one or more wafers in the path of said ion beam in such a manner that the implant angle in one dimension is fixed during the implantation process, and means for imparting a scanning movement to said spinning disk along a scan axis transverse to the axis of spin of said spinning disk, and means for rotating said spinning disk about said scan axis so as to control and vary said implant angle in a dimension transverse to said one dimension.
Claim 2
Dependent Claim
114 words
Ion implantation apparatus in which the implant angle may be varied during implantation comprising, in combination, means for producing an ion beam, a wafer support comprising a spinning disk and adapted to support one or more wafers in the path of said ion beam in such a manner that the implant angle in one dimension is fixed during the implantation process, and means for imparting a scanning movement to said spinning disk along a scan axis transverse to the axis of spin of said spinning disk, and means for rotating said spinning disk about said scan axis so as to control and vary said implant angle in a dimension transverse to said one dimension.
Claim 3
Dependent Claim
127 words
Ion implantation apparatus in which the implant angle may be varied during implantation comprising, in combination, means for producing an ion beam, a wafer support comprising a spinning disk and adapted to support one or more wafers in the path of said ion beam in such a manner that the implant angle in one dimension is fixed during the implantation process, a rotatable shaft capable of movement along its axis, a motor mounted on said shaft, means for mounting said wafer support disk upon said motor so as to be spun thereby, means for imparting a scanning movement to said shaft along its axis, and means for rotating said shaft so as to control and vary said implant angle in a dimension transverse to said one dimension.
Claim 4
Dependent Claim
127 words
Ion implantation apparatus in which the implant angle may be varied during implantation comprising, in combination, means for producing an ion beam, a wafer support comprising a spinning disk and adapted to support one or more wafers in the path of said ion beam in such a manner that the implant angle in one dimension is fixed during the implantation process, a rotatable shaft capable of movement along its axis, a motor mounted on said shaft, means for mounting said wafer support disk upon said motor so as to be spun thereby, means for imparting a scanning movement to said shaft along its axis, and means for rotating said shaft so as to control and vary said implant angle in a dimension transverse to said one dimension.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-05-17 | 1991-11-16 | 1992-05-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-05-17 | 1995-11-16 | 1996-05-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-05-17 | 1999-11-16 | 2000-05-17 | $7700.00 | Window Closed / Lapsed |