Patent US4744833A successfully refreshed from Google Patents.
US4744833A
Expired / Lapsed
US
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Electrostatic removal of contaminants
Assignee: International Business Machines Corp
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Filing: 1987-06-11
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Granted: 1988-05-17
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Expires: 2007-06-11
Abstract
Abstract An apparatus and method for electrostatic removal of micron and sub-micron sized contaminant particles is disclosed herein. The apparatus and method comprise creating a potential difference with a megavolt/cm electrostatic field between two conducting bases in a predetermined geometrical relation to each other. An insulator (e.g. a dielectric film) is maintained at or near contact between one of the bases and the surface to be cleaned to electrostatically remove particles from said surface. The bases can be made to move relative to each other and the surface to be cleaned.
Inventors
- 👤 Douglas W. Cooper
- 👤 Henry L. Wolfe
- 👤 James T. C. Yeh
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 07:09
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; B; B08; B08B; B08B6/00; G; G11; G11B; G11B23/00; G11B23/50; G11B5/00; G11B5/84
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
151 words
A method for removing micron and/or sub-micron sized contaminant particles from a surface comprising the steps of: (a) establishing a first electrically conductive base means, said first base means being connected to one terminal of a high voltage, direct current power supply, (b) locating the surface from which the particles are to be removed on said first base means, (c) establishing a second electrically conductive base means in a predetermined and geometrical position at least one particle diameter apart from said first base means and said surface, said second base means being connected to the other terminal of said high voltage, direct current power supply, (d) placing an insulator between said second base means and said surface from which particles are to be removed, and (e) applying an electric field of approximately 0.1 MV/cm or larger between said first and second base means to electrostatically remove said particles from said surface.
Claim 2
Independent Claim
151 words
A method for removing micron and/or sub-micron sized contaminant particles from a surface comprising the steps of: (a) establishing a first electrically conductive base means, said first base means being connected to one terminal of a high voltage, direct current power supply, (b) locating the surface from which the particles are to be removed on said first base means, (c) establishing a second electrically conductive base means in a predetermined and geometrical position at least one particle diameter apart from said first base means and said surface, said second base means being connected to the other terminal of said high voltage, direct current power supply, (d) placing an insulator between said second base means and said surface from which particles are to be removed, and (e) applying an electric field of approximately 0.1 MV/cm or larger between said first and second base means to electrostatically remove said particles from said surface.
Claim 3
Dependent Claim
15 words
A method according to claim 1 wherein said insulator is comprised of a dielectric film.
Claim 4
Dependent Claim
15 words
A method according to claim 2 wherein said dielectric film is comprised of a polymer.
Claim 5
Dependent Claim
19 words
A method according to claim 3 wherein said polymer film is comprised of a lamination of polyester and polyethylene.
Claim 6
Dependent Claim
14 words
A method according to claim 2 wherein said dielectric film is comprised of mica.
Claim 7
Dependent Claim
18 words
A method according to claim 1 wherein said insulator is comprised of a dielectric film under a vacuum.
Claim 8
Dependent Claim
20 words
A method according to claim 1 wherein said insulator is comprised of a dielectric film under a high gaseous pressure.
Claim 9
Dependent Claim
18 words
A method according to claim 2 wherein said dielectric film is between approximately 0.1 to 1.0 mil. thick.
Claim 10
Dependent Claim
28 words
A method according to claim 2 wherein said first and second conducting bases are made to move relative to each other for traversing said film across said surface.
Claim 11
Dependent Claim
13 words
A method according to claim 9 wherein said second base is a roller.
Claim 12
Dependent Claim
13 words
A method according to claim 9 wherein said surface is a conducting medium.
Claim 13
Dependent Claim
13 words
A method according to claim 9 wherein said surface is a nonconducting medium.
Claim 14
Dependent Claim
19 words
A method according to claim 9 wherein said surface is a composite medium comprised of conducting and nonconducting parts.
Claim 15
Dependent Claim
20 words
A method according to claim 9 wherein the potential difference between bases is in the range 0.1 to 20.0 KV.
Claim 16
Dependent Claim
22 words
A method according to claim 1 wherein said surface to be cleaned is conducting and acts as the first electrical base means.
Claim 17
Dependent Claim
29 words
A method according to claim 1 wherein said insulator is comprised of a conductor laminated with a dielectric film and said conductor acts as the first electrical base means.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-05-17 | 1991-11-16 | 1992-05-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-05-17 | 1995-11-16 | 1996-05-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-05-17 | 1999-11-16 | 2000-05-17 | $7700.00 | Window Closed / Lapsed |