Patent US4744047A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4744047A Expired / Lapsed US ⏱️ 0.0 years remaining

Pattern test apparatus including a plurality of pattern generators

Assignee: Hitachi Ltd
•
Filing: 1985-10-31
•
Granted: 1988-05-10
•
Expires: 2005-10-31
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract An apparatus for testing printed wiring patterns for use in combination with an apparatus including a plurality of dedicated pattern generators for generating arcuate wiring patterns. In contrast to the conventional LSI pattern inspection effected with design data being inputted, the apparatus can inspect the pattern including curved portions peculiar to the printed wiring pattern. Although the conventional LSI inspection technique involves an impracticably increased amount of design data, the invention allows the test or inspection to be performed at a high speed with an improved reliability and can be applied to the inspection of any pattern including arcuate patterns. By inputting graphic data in conformance with the order for generating patterns, pattern generation can be accomplished not only through ordinary raster scan but also by other various scanning methods.

Inventors

  • 👤 Keiichi Okamoto
  • 👤 Toshimitsu Hamada
  • 👤 Mineo Nomoto

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 07:07
CPC Classifications
G; G01; G01R; G01R31/00; G01R31/28; G01R31/2801; G01R31/281

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 475 words
A pattern test apparatus comprising: (a) imaging means for providng an image of an object under test by scanning said object using light in X-axis and Y-axis directions and for outputting a digital video signal of said image; (b) detecting means for detecting X and Y coordinates of said imaging means as said image is being scanned; (c) a design pattern generator including; converting means for converting design data including specific position coordinates of an aperture pattern used in manufacturing said object under test and specific position coordinates of a starting point and an end point of said aperture pattern, into test data in accordance with a predetermined order of patterns on said object under test, said test data including aperture data which contains a code indicating a pattern type and specific position coordinates of said aperture pattern, rectangular data which contains a code indicating a rectangular pattern and coordinate data corresponding to predetermined positions on said rectangular pattern, a memory for storing at least one of said aperture patterns as two dimensional image data with respect to said specific position coordinates thereof, aperture pattern generating means for reading out of said memory and said two dimensional image data, for converting said two dimensional image data into aperture pattern generating area data based on said specific position coordinates and for generating a bit train pattern corresponding to said aperture pattern generating for each scanning line in an X axis direction when said X and Y coordinates detected by said detecting means correspond to said converted aperture pattern generating area data, rectangular pattern generating means including a first arithmetic and comparing circuit for calculating starting point coordinates and end point coordinates of each side of said rectangular pattern based on inputted coordinate data representing said rectangular pattern and for generating a bit train pattern corresponding to said rectangular pattern for each scanning line in the X axis direction when said X and Y coordinates detected by said detecting means correspond to said starting point coordinates and end point coordinates calculated by said first arithmetic and comparing circuit, selecting means for selecting said aperture pattern generating means and said rectangular pattern generating means based on the order of said aperture data and said rectangular data designated by said converting means and for inputting said aperture data and said rectangular data to said aperture pattern generating means and said rectangular pattern generating means respectively, and a bit train synthesizing circuit for synthesizing a design pattern through a logic operation of said bit train pattern corresponding to said aperture pattern obtained from said aperture pattern generating means and said rectangular pattern obtained from said bit train pattern corresponding to said rectangular pattern generating means; and (d) comparing means for comparing said digital video signal obtained from said imaging means with said design pattern obtained from said design pattern generator.
Claim 2
Dependent Claim 475 words
A pattern test apparatus comprising: (a) imaging means for providng an image of an object under test by scanning said object using light in X-axis and Y-axis directions and for outputting a digital video signal of said image; (b) detecting means for detecting X and Y coordinates of said imaging means as said image is being scanned; (c) a design pattern generator including; converting means for converting design data including specific position coordinates of an aperture pattern used in manufacturing said object under test and specific position coordinates of a starting point and an end point of said aperture pattern, into test data in accordance with a predetermined order of patterns on said object under test, said test data including aperture data which contains a code indicating a pattern type and specific position coordinates of said aperture pattern, rectangular data which contains a code indicating a rectangular pattern and coordinate data corresponding to predetermined positions on said rectangular pattern, a memory for storing at least one of said aperture patterns as two dimensional image data with respect to said specific position coordinates thereof, aperture pattern generating means for reading out of said memory and said two dimensional image data, for converting said two dimensional image data into aperture pattern generating area data based on said specific position coordinates and for generating a bit train pattern corresponding to said aperture pattern generating for each scanning line in an X axis direction when said X and Y coordinates detected by said detecting means correspond to said converted aperture pattern generating area data, rectangular pattern generating means including a first arithmetic and comparing circuit for calculating starting point coordinates and end point coordinates of each side of said rectangular pattern based on inputted coordinate data representing said rectangular pattern and for generating a bit train pattern corresponding to said rectangular pattern for each scanning line in the X axis direction when said X and Y coordinates detected by said detecting means correspond to said starting point coordinates and end point coordinates calculated by said first arithmetic and comparing circuit, selecting means for selecting said aperture pattern generating means and said rectangular pattern generating means based on the order of said aperture data and said rectangular data designated by said converting means and for inputting said aperture data and said rectangular data to said aperture pattern generating means and said rectangular pattern generating means respectively, and a bit train synthesizing circuit for synthesizing a design pattern through a logic operation of said bit train pattern corresponding to said aperture pattern obtained from said aperture pattern generating means and said rectangular pattern obtained from said bit train pattern corresponding to said rectangular pattern generating means; and (d) comparing means for comparing said digital video signal obtained from said imaging means with said design pattern obtained from said design pattern generator.
Claim 3
Dependent Claim 176 words
A pattern test apparatus according to claim 1, wherein said design pattern generator further includes: a second arithmetic and comparing circuit for calculating starting point coordinates of a starting side of a circular pattern and end point coordinates of an end side of said circular pattern; and circular arc pattern generating means for generating a bit train pattern corresponding to said circular arc pattern for each scanning line in the X axis direction when said X-Y coordinates detected by said detecting means correspond to said starting point coordinates and said end point coordinates calculated by said second arithmetic and comparing circuit, said test data generated by said converting means including circular arc data having a code indicating said circular arc pattern, coordinates of apex points of the circular arc and center coordinates of the circular arc for said circular arc pattern, said selecting means additionally selects said circular arc pattern generating means, and said bit train synthesizing circuit additionally synthesizes said bit pattern corresponding to said circular arc pattern obtained from said circular pattern generating means.
Claim 4
Dependent Claim 24 words
A pattern test apparatus according to claim 1, wherein said object under test is an object having a wiring pattern for a printed substance.
Claim 5
Dependent Claim 50 words
A pattern test apparatus according to claim 1, wherein image data having reference coordinates corresponding to said specific position coordinates stored in said memory includes coordinates of a starting point and an end point of each scanning line extending over an area of said aperture pattern in the Y-axis direction.
Claim 6
Dependent Claim 19 words
A pattern test apparatus according to claim 3, wherein said specific position coordinates are selected to be center coordinates.
Claim 7
Dependent Claim 31 words
A pattern test apparatus according to claim 3, wherein the coordinate data corresponding to said predetermined positions on said rectangular pattern are selected to be coordinates of the apex points thereof.

References Cited (Backward Citations)

US4013832A Cited
US4538232A Cited
US4584573A Cited
US4498079A Cited
US4644584A Cited
US4614941A Cited
US4620288A Cited
US4623256A Cited
US4639919A Cited
US4641255A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1991-05-10 1991-11-09 1992-05-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1995-05-10 1995-11-09 1996-05-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1999-05-10 1999-11-09 2000-05-10 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag