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US4740693A
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Electron beam pattern line width measurement system
Assignee: Hitachi Ltd
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Filing: 1985-12-11
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Granted: 1988-04-26
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Expires: 2005-12-11
Abstract
Abstract Disclosed is an electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the electron beam are detected, and the detected signal is processed to determine a line width of the pattern to-be-measured, comprising a secondary electron detector which detects a signal corresponding to an amount of all secondary electrons generated by the scanning, and a secondary electron energy analyzer which selectively detects a signal corresponding to an amount of secondary electrons of specified energy. With the electron beam pattern line width measurement system, it becomes possible to precisely detect a pattern boundary region defined by different sorts of materials in a stepped structure of a small level difference not having been measurable with a prior-art electron beam pattern line width measurement system.
Inventors
- 👤 Yoshinori Nakayama
- 👤 Shinji Okazaki
- 👤 Hidehito Obayashi
- 👤 Mikio Ichihashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 20:42
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/26; H01J37/28; G; G01; G01B; G01B15/00; G01B7/00; G01B7/02
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
190 words
An electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the electron beam are detected, and the detected signal is processed to determine a line width of the pattern to-be-measured comprising: a secondary electron detector which detects a signal corresponding to an amount of all secondary electrons generated by the scanning electron beam to detect stepped portions of the sample, a secondary electron energy analyzer which selectively detects a signal corresponding to an amount of secondary electrons having a specified energy to detect substance changes in the sample and, a signal processor, including display means for enabling simultaneous comparison of a first graph showing the relation between the intensity of the seconday electron detection signal measured by said secondary electron detector and the electron beam irradiation position and a second graph showing the relation between the intensity of the secondary electron detection signal measured by said secondary electron energy analyzer and the electron beam irradiation position.
Claim 2
Dependent Claim
190 words
An electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the electron beam are detected, and the detected signal is processed to determine a line width of the pattern to-be-measured comprising: a secondary electron detector which detects a signal corresponding to an amount of all secondary electrons generated by the scanning electron beam to detect stepped portions of the sample, a secondary electron energy analyzer which selectively detects a signal corresponding to an amount of secondary electrons having a specified energy to detect substance changes in the sample and, a signal processor, including display means for enabling simultaneous comparison of a first graph showing the relation between the intensity of the seconday electron detection signal measured by said secondary electron detector and the electron beam irradiation position and a second graph showing the relation between the intensity of the secondary electron detection signal measured by said secondary electron energy analyzer and the electron beam irradiation position.
Claim 3
Dependent Claim
23 words
An electron beam pattern line width measurement system according to claim 1, wherein said secondary electron energy analyzer is a cylindrical mirror analyzer.
Claim 4
Dependent Claim
37 words
An electron beam pattern line width measurement system according to claim 1, wherein said secondary electron energy analyzer is a secondary electron detector in front of which a grid electrode serving as an energy filter is disposed.
Claim 5
Dependent Claim
21 words
An electron beam pattern line width measurement system according to claim 1, wherein said secondary electron detector is a scintillation counter.
Claim 6
Dependent Claim
21 words
An electron beam pattern line width measurement system according to claim 2, wherein said secondary electron detector is a scintillation counter.
Claim 7
Dependent Claim
46 words
An electron beam pattern line width measurement system according to claim 1, wherein said display means includes means for displaying said first and second graphs in alignment in corresponding units so that positions along the abscissas of said first and second graphs can be readily compared.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-04-26 | 1991-10-26 | 1992-04-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-04-26 | 1995-10-26 | 1996-04-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-04-26 | 1999-10-26 | 2000-04-26 | $7700.00 | Window Closed / Lapsed |