Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivatives

Claim 2

A process for the preparation of a crosslinked protective coating on a carrier which comprises exposing to light or high-energy radiation a coating of a radiation-sensitive polymer applied on said carrier wherein the polymer is a homopolyimide or a copolyimide of at least one aromatic tetracarboxylic acid and at least one diamine, which essentially contains 0.1 to 100 mol % of at least one structural element of the formula I ##STR44## and 99.9 to 0 mol % of at least one structural element of the formulae II and/or III ##STR45## in which Z is at least one tetravalent radical of the formula IV, V, VI or VII ##STR46## in which the free bonds are in the ortho-position relative to one another and Y is direct bond, --CH 2 --, --(CH 2 ) 2 --, --O--, --S--, --SO--, --SO 2 --, --CO--, --NR-- or --CRR 1 --, in which R is a hydrogen atom, C 1 -C 10 -alkyl, phenyl, naphthyl or phenyl-(C a H 2a )-, where a is 1-4, and R 1 is R, with the exception of a hydrogen atom, Ro is C 1 -C 10 -alkyl, halogen, --CN, --NO 2 , C 1 -C 12 -alkoxy, phenoxy, naphthoxy or phenyl-(C a H 2a ), where a is 1-4, n' is 0, 1 or 2, X is an unsubstituted or substituted divalent aliphatic radical, or said radical interrupted by heteroatoms or aromatic, heterocyclic or cyloaliphatic groups, a substituted or unsubstituted heterocyclic, cycloaliphatic or araliphatic radical, an aromatic radical, in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group, hydroxyalkyl group, hydroxyalkoxy group, hydroxyalkylthio group, aralkyl group or, in the case of two adjacent C atoms of the aromatic radical, by an alkylene group, Q' is a trivalent aromatic radical, Z' has the same meaning as Z or is a tetravalent organic radical othen than Z and X' is the divalent radical, other than X, of an organic diamine, and in which Z in formula I is also a tetravalent benzophenone radical if structural elements of the formula III are present.

Claim 3

A process according to claim 1 wherein the polymer is made from an acid of formula IV where Y is a direct bond, --CH 2 --, --O--, --S-- or --CO--.

Claim 4

A process according to claim 1 wherein the free bonds in the radicals of formula IV to VII are in the meta- or para-position relative to the CO group.

Claim 5

A process according to claim 1 where the substituent group on the aromatic radical x in the polymer contains 1 to 20 C atoms as alkyl or alkoxy, 2 to 12 C atoms as alkoxyalkyl, 5 or 6 ring carbon atoms as cycloakyl or 3 or 4 C atoms as alkylene, and is benzyl as aralkyl.

Claim 6

A process according to claim 4 wherein the substituent is alkyl with 1 to 4 C atoms.

Claim 7

A process according to claim 1 where in the polymer Z' is other than Z and contains 6 to 30 C atoms.

Claim 8

A process according to claim 6 wherein Z' is a radical of the formula ##STR47## or a mixture thereof.

Claim 9

A process according to claim 1 where in the polymer one or two substituents on the aromatic radical X are bonded in the ortho-position relative to the N-atom.

Claim 10

A process according to claim 1 where in the structural element of formula I, X contains 2 to 30 C atoms as an aliphatic radical, 5 to 8 ring C atoms as a cycloaliphatic radical, 7 to 30 C atoms as an araliphatic radical or 7 to 30 C atoms as a substituted aromatic radical.

Claim 11

A process according to claim 1 where in the structural element of formula I, a substituted aromatic radical X has the formulae VIII, VIIIa and/or VIIIb ##STR48## in which in formula VIII the free bonds are in the meta- or para-position relative to one another, in formula VIIIa the free bonds are in the meta-or para- position relative to the R 11 group and R 5 and R 6 are bonded in the two ortho-positions relative to the free bond, and in formula VIIIb the free bonds are in the 2-, 3-, 6- and 7-position and R 5 and R 6 are in the two ortho-positions relative to the free bonds, R 11 is a direct bond, --O--, --S--, --SS--, --SO--, --SO 2 --, --CO--, --COO--, --NH--, -N-alkyl with 1 to 6 C atoms in the alkyl, ##STR49## --CONH--, --CON-alkyl- with 1 to 6 C. atoms in the alkyl, -CON-phenyl-, -CON-benzyl-, ##STR50## in which Y' is ##STR51## and R 17 is a hydrogen atom, C 1 -C 6 -alkyl or phenyl, linear or branched alkylene with 1 to 3 C atoms, alkylidene with 2 to 12 C atoms which is unsubstituted or substituted by Cl or F, cycloalkylidene with 5 or 6 ring carbon atoms, phenylene, phenylenedioxy or the group ##STR52## in which R 3 and R 4 are alkyl or alkoxy with 1 to 6 C atoms, phenyl, benzyl, phenoxy or benzyloxy, r is a number from 1 to 10, t is 0 or 1 and s is 0 or 1, and R' is --O-- or --S-- and Q is C 1 -C 6 -alkylene, and Q is a number from 1 to 100, R 5 and R 6 are alkyl, or alkoxy with 1 to 12 C atoms, alkoxyalkyl with 2 to 12 C atoms, cyclopentyl, cyclohexyl or benzyl, or in the formula VIII or VIIIa R 5 and R 7 are bonded in adjacent positions and together are trimethylene or tetramethylene, in which R 6 is also a hydrogen atom, R 7 and R 8 are a hydrogen atom or independently have the meaning of R 5 and R 6 , and R 9 and R 10 are a hydrogen atom, or independently have the meaning of R 5 and R 6 , or R 7 and R 9 in formula VIIIa together are trimethylene or tetramethylene.

Claim 12

A process according to claim 10 wherein R 5 and R 6 are alkyl with 1 to 6 C. atoms.

Claim 13

A process according to claim 10 wherein R 11 is --CH 2 --, --O--, --CO-- or a direct bond.

Claim 14

A process according to claim 10 wherein the free bonds in formula VIIIa are in the para-position relative to the R 11 group.

Claim 15

A process according to claim 10 wherein X in formula I is a radical of the formula ##STR53## in which the free bonds are in the meta- or para-position relative to one another, or of the formula ##STR54## in which R 5 and R 6 independently are methyl, ethyl, n-propyl or isopropyl and R 7 and R 8 are a hydrogen atom or have the meaning of R 5 , or R 5 and R 7 together are trior tetramethylene and R 6 and R 8 are a hydrogen atom, and R 11 is a direct bond, CH 2 or CO.

Claim 16

A process according to claim 14 wherein the polymer is a copolyimide with two or more radicals of the formulae ##STR55## in which the free bonds are in the meta- or para-position relative to one another, and/or of the formula ##STR56## in which R 5 , R 6 , and R 7 and R 8 are methyl and R 11 is a direct bond, --CH 2 -- or --CO--.

Claim 17

A process according to claim 1 where in the polymer a substituted aromatic radical X has the formula IX ##STR57## in which m is 0 or 1, the free bonds are in the meta- or in the ortho-position relative to the R 12 group, R 11 is a direct bond, --O--, --S--, --SS--, --SO--, --SO 2 --, --CO--, --COO--, --NH--, --N-alkyl with 1 to 6 C atoms in the alkyl, --N--phenyl, --N--benzyl, --CONH--, -CON-alkyl- with 1 to 6 C. atoms in the alkyl, -CON-phenyl-CON-benzyl-, ##STR58## in which Y' is ##STR59## and R 17 is a hydrogen atom, C 1 -C 6 -alkyl or phenyl, linear or branched alkylene with 1 to 3 C atoms, alkylidene with 2 to 12 C atoms which is unsubstituted or substituted by Cl or F, cycloalkylidene with 5 or 6 ring carbon atoms, phenylene, phenylenedioxy or the group ##STR60## in which R 3 and R 4 are alkyl or alkoxy with 1 to 6 C atoms, phenyl, benzyl, phenoxy or benzyloxy, r is a number from 1 to 10, t is 0 or 1 and s is 0 or 1, and R' is --O-- or -S- and Q is C 1 -C 6 -alkalene, an q is a number from 1 to 100, and R 12 is alkyl, or alkoxy with 1 to 12 C atoms, alkoxyalkyl with 2 to 12 C atoms, cyclopentyl, cyclohexyl or benzyl.

Claim 18

A process according to claim 1 where in the structural element of formula III, Q' is a trivalent radical of the formula ##STR61## in which the free bond is in the meta- or para-position relative to the R 18 group and R 18 is a direct bond, --CH 2 --, --O--, --S-- or --CO--.

Claim 19

A process according to claim 1 where in the structural element of formula II, X' is phenylene which is unsubstituted or substituted by halogen or C 1 -C 4 -acyl, or bisphenylene of the formula ##STR62## in which q is 0 or 1 and R"' is a direct bond, --O--, --S--, --SS--, --SO--, --SO 2 --, --CO--, ##STR63## --COO--, --NR 2 --, --NH--, --CONH--, --SiR 3 R 4 -- or --OSi(R 3 R 4 )O--, and R 2 , R 3 and R 4 are C 1 -C 6 -alkyl, phenyl or benzyl and R 3 and R 4 are also C 1 -C 6 -alkoxy, phenoxy or benzyloxy.

Claim 20

A process according to claim 1 where the polymer consists of structural elements of formula I, or of 2 to 4 structural elements of formulae I to III.

Claim 21

A process for the preparation of a relief image on a carrier which comprises exposing to light or high-energy radiation imagewise through a photomask a radiation-sensitive polymer applied on said carrier wherein the polymer is a homopolyimide or a copolyimide of at least one aromatic tetracarboxylic acid and at least one diamine, which essentially contains 0.1 to 100 ml % of at least one structural element of the formula I ##STR64## and 99.9 to 0 mol % of at least one structural element of the formulae II and/or III ##STR65## in which Z is at least one tetravalent radical of the formula IV, V, VI or VII ##STR66## in which the free bonds are in the ortho-position relative to one another and Y is a direct bond, --CH 2 --, --(CH 2 ) 2 --, --O--, --S--, --SO--, --SO 2 --, --CO--, --NR-- or --CRR 1 --, in which R is a hydrogen atom, C 1 -C 10 -alkyl, phenyl, naphthyl or phenyl(C a H 2a )-, where a is 1-4, and R 1 is R, with the exception of a hydrogen atom, R o is C 1 -C 10 -alkyl, halogen, --CN, --NO 2 , C 1 -C 12 -alkoxy, phenoxy, naphthoxy or phenyl-(C a H 2a )-, where a is 1-4, n' is 0, 1 or 2, X is an unsubstituted or substituted divalent aliphatic radical, or said radical interrupted by heteroatoms or aromatic, heterocyclic or cycloaliphatic groups, a substituted or unsubstituted heterocyclic, cycloaliphatic or araliphatic radical, an aromatic radical, in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group, hydroxyalkyl group, hydroxyalkoxy group, hydroxyalkylthio group, aralkyl group or, in the case of two adjacent C atoms of the aromatic radical, by an alkylene group, Q' is a trivalent aromatic radical, Z' has the same meansing as Z or is a tetravalent organic radical other than Z and X' is the divalent radical, other than X, of an organic diamine, and in which Z in formula I is also a tetravalent benzophenone radical if structural elements of the formula III are present, and then removing the non-exposed portions with a solvent.

Claim 22

A process for the preparation of a relief image on a carrier which comprises exposing to light or high-energy radiation imagewise through a photomask a radiation-sensitive polymer applied on said carrier wherein the polymer is a homopolyimide or a copolyimide of at least one aromatic tetracarboxylic acid and at least one diamine, which essentially contains 0.1 to 100 ml % of at least one structural element of the formula I ##STR64## and 99.9 to 0 mol % of at least one structural element of the formulae II and/or III ##STR65## in which Z is at least one tetravalent radical of the formula IV, V, VI or VII ##STR66## in which the free bonds are in the ortho-position relative to one another and Y is a direct bond, --CH 2 --, --(CH 2 ) 2 --, --O--, --S--, --SO--, --SO 2 --, --CO--, --NR-- or --CRR 1 --, in which R is a hydrogen atom, C 1 -C 10 -alkyl, phenyl, naphthyl or phenyl(C a H 2a )-, where a is 1-4, and R 1 is R, with the exception of a hydrogen atom, R o is C 1 -C 10 -alkyl, halogen, --CN, --NO 2 , C 1 -C 12 -alkoxy, phenoxy, naphthoxy or phenyl-(C a H 2a )-, where a is 1-4, n' is 0, 1 or 2, X is an unsubstituted or substituted divalent aliphatic radical, or said radical interrupted by heteroatoms or aromatic, heterocyclic or cycloaliphatic groups, a substituted or unsubstituted heterocyclic, cycloaliphatic or araliphatic radical, an aromatic radical, in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group, hydroxyalkyl group, hydroxyalkoxy group, hydroxyalkylthio group, aralkyl group or, in the case of two adjacent C atoms of the aromatic radical, by an alkylene group, Q' is a trivalent aromatic radical, Z' has the same meansing as Z or is a tetravalent organic radical other than Z and X' is the divalent radical, other than X, of an organic diamine, and in which Z in formula I is also a tetravalent benzophenone radical if structural elements of the formula III are present, and then removing the non-exposed portions with a solvent.

Claim 23

A process according to claim 20 wherein the polymer is made from an acid of formula IV where Y is a direct bond, --CH 2 --, --O--, --S-- or --CO--.

Claim 24

A process according to claim 20 wherein the free bonds in the radicals of formula IV to VII are in the meta- or para-position relative to the CO group.

Claim 25

A process according to claim 20 where the substituent group on the aromatic radical X in the polymer contains 1 to 20 C atoms as alkyl or alkoxy, 2 to 12 C atoms as alkoxyalkyl, 5 or 6 ring carbon atoms as cycloakyl or 3 or 4 C atoms as alkylene, and is benzyl as aralkyl.

Claim 26

A process according to claim 23 wherein the substituent is alkyl with 1 to 4 C atoms.

Claim 27

A process according to claim 23 where in the polymer Z' is other than Z and contains 6 to 30 C atoms.

Claim 28

A process according to claim 25 wherein Z' is a radical of the formula ##STR67## or a mixture thereof.

Claim 29

A process according to claim 20 where in the polymer one or two substituents on the aromatic radical X are bonded in the ortho-position relative to the N-atom.

Claim 30

A process according to claim 20 where in the structural element of formula I, X contains 2 to 30 C atoms as an aliphatic radical, 5 to 8 ring C atoms as a cycloaliphatic radical, 7 to 30 C atoms as an araliphatic radical or 7 to 30 C atoms as a substituted aromatic radical.

Claim 31

A process according to claim 20 where in the structural element of formula I, a substituted aromatic radical X has the formulae VIII, VIIIa and/or VIIIb ##STR68## in which in formula VIII the free bonds are in the meta- or para-position relative to one another, in formula VIIIa the free bonds are in the meta- or para- position relative to the R 11 group and R 5 and R 6 are bonded in the two ortho-positions relative to the free bond, and in formula VIIIb the free bonds are in the 2-, 3,- 6- and 7-position and R 5 and R 6 are in the two ortho-positions relative to the free bonds, R 11 is a direct bond, --O--, --S--, --SS--, --SO--, --SO 2 --, --CO--, --COO--, --NH--, --N-alkyl with 1 to 6 C atoms in the alkyl, ##STR69## --CONH--, -CON-alkyl- with 1 to 6 C atoms in the alkyl, -CON-phenyl, -CON-benzyl, ##STR70## in which Y' is ##STR71## and R 17 is a hydrogen atom, C 1 -C 6 -alkyl or phenyl, linear or branched alkylene with 1 to 3 C atoms, alkylidene with 2 to 12 C atoms which is unsubstituted or substituted by Cl or F, cycloalkylidene with 5 or 6 ring carbon atoms, phenylene, phenylenedioxy or the group ##STR72## in which R 3 and R 4 are alkyl or alkoxy with 1 to 6 C atoms, plenyl, benzyl, phenoxy or benzyloxy, r is a number from 1 to 10, t is 0 or 1 and s is 0 or 1, and R' is --O-- or --S-- and Q is C 1 -C 6 -alkylene, and q is a number from 1 to 100, R 5 and R 6 are alkyl, or alkoxy with 1 to 12 C atoms, alkoxyalkyl with 2 to 12 C atoms, cyclopentyl, cyclohexyl or benzyl, or in the formula VIII or VIIa R 5 and R 7 are bonded in adjacent positions and together are trimethylene or tetramethylene, in which R 6 is also a hydrogen atom, R 7 and R 8 are a hydrogen atom or independently have the meaning of R 5 and R 6 , and R 9 and R 10 are a hydrogen atom, or independently have the meaning of R 5 and R 6 , or R 7 and R 9 in formula VIIIa together are trimethylene or tetramethylene.

Claim 32

A process according to claim 29 wherein R 5 and R 6 are alkyl with 1 to 6 C atoms.

Claim 33

A process according to claim 29 wherein R 11 is --CH 2 --, --O--, --CO-- or a direct bond.

Claim 34

A process according to claim 29 wherein the free bonds in formula VIIa are in the para-position relative to the R 11 group.

Claim 35

A process according to claim 29 wherein X in formula I is a radical of the formula ##STR73## in which the free bonds are in the meta- or para-position relative to one another, or of the formula ##STR74## in which R 5 and R 6 independently are methyl, ethyl, n-propyl or isopropyl and R 7 and R 8 are a hydrogen atom or have the meaning of R 5 , or R 5 and R 7 together are trior tetramethylene and R 6 and R 8 are a hydrogen atom, and R 11 is a direct bond, CH 2 or CO.

Claim 36

A process according to claim 33 wherein the polymer is a copolyimide with two or more radicals of the formulae ##STR75## in which the free bonds are in the meta- or para-position relative to one another, and/or of the formula ##STR76## in which R 5 , R 6 , R 7 and R 8 are methyl and R 11 is a direct bond, --CH 2 -- or --CO--.

Claim 37

A process according to claim 20 where in the polymer a substituted aromatic radical X has the formula IX ##STR77## in which m is 0 or 1, the free bonds are in the meta- or in the ortho-position relative to the R 12 group, R 11 is a direct bond, --O--, --S--, --SS--, --SO--, --SO 2 --, --CO--, --COO--, --NH--, -N-alkyl with 1 to 6 C atoms in the alkyl, --N-phenyl, --N-benzyl, -CONH-, -CON-alkyl- with 1 to 6 C atoms in the alkyl, -CON-phenyl- -CON-benzyl-, ##STR78## in which Y' is ##STR79## and R 17 is a hydrogen atom, C 1 -C 6 -alkyl or phenyl, linear or branched alkylene with 1 to 3 C atoms, alkylidene with 2 to 12 C atoms which is unsubstituted or substituted by Cl or F, cycloalkylidene with 5 or 6 ring carbon atoms, phenylene, phenylenedioxy or the group ##STR80## in which R 3 and R 4 are alkyl or alkoxy with 1 to 6 C atoms, phenyl, benzyl, phenoxy or benzyloxy, r is a number from 1 to 10, t is 0 or 1 and s is 0 or 1, and R' is --O-- or --S-- and Q is C 1 -C 6 -alkylene, and q is a number from 1 to 100, and R 12 is alkyl, or alkoxy with 1 to 12 C atoms, alkoxyalkyl with 2 to 12 C atoms, cyclopentyl, cyclohexyl or benzyl.

Claim 38

A process according to claim 20 where in the structural element of formula III, Q' is a trivalent radical of the formula ##STR81## in which the free bond is in the meta- or para-position relative to the R 18 group and R 18 is a direct bond, --CH 2 --, --O--, --S-- or --CO--.

Claim 39

A process according to claim 20 where in the structural element of formula II, X' is phenylene which is unsubstituted or substituted by halogen or C 1 -C 4 -acyl, or bisphenylene of the formula ##STR82## in which q is 0 or 1 and R"' is a direct bond, --O--, --S--, --SS--, --SO--, --SO 2 --, --CO--, ##STR83## --COO--, --NR 2 --, --NH--, --CONH--, --SiR 3 R 4 -- or --OSi(R 3 R 4 )O--, and R 2 , R 3 and R 4 are C 1 -C 6 -alkyl, phenyl or benzyl and R 3 and R 4 are also C 1 -C 6 -alkoxy, phenoxy or benzyloxy.

Claim 40

A process according to claim 20 where the polymer consists of stuctural elements of formula I, or of 2 to 4 structural elements of formulae I to III.