Patent US4692997A successfully refreshed from Google Patents.
US4692997A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for fabricating MOMOM tunnel emission transistor
Assignee: Eaton Corp
•
Filing: 1986-05-15
•
Granted: 1987-09-15
•
Expires: 2006-05-15
Abstract
Abstract An MOMOM semiconductor device (72) has a plurality of mesa stacked horizontal layers including at least one metal layer (75) having an exposed edge at a generally vertical side (86) of the mesa. An oxide layer (76) is formed on the exposed edge of the metal layer. A second metal layer (77) extends along the side of the mesa over the first oxide layer. A second oxide layer (78) is formed on the second metal layer, and a third metal layer (79) is formed on the second oxide layer. An MOMOM tunnel emission transistor is provided by emitter metal (75) - oxide (76) - base metal (77) - oxide (78) - collector metal (79).
Inventors
- 👤 Joseph A. Calviello
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 16:42
CPC Classifications
H; H10; H10N; H10N70/00; Y; Y10; Y10S; Y10S148/00; Y10S148/043; Y10S438/00; Y10S438/957
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
259 words
A method for making an MOMOM tunnel emission transistor comprising the steps of: providing a substrate having a generally horizontal planar upper surface; forming a first insulator layer on said upper surface of said substrate; forming a first metal layer ranging in thickness from 100 to 1,000 angstroms on the upper surface of said first insulator layer; forming a second insulator layer ranging in thickness from 1,000 to 10,000 angstroms on the upper surface of said first metal layer; forming a second metal layer ranging in thickness from 50 to 500 angstroms on the upper surface of said second insulator layer; defining a mesa having generally vertical sides exposing the edges of said layers; oxidizing the exposed edge of said second metal layer to form a first oxide layer ranging in thickness from 5 to 20 angstroms; forming a third metal layer extending along a portion of the upper surface of said first insulator layer adjacent said first metal layer and also extending along said side of said mesa; oxidizing said third metal layer to form a second oxide layer ranging in thickness from 10 to 40 angstroms; forming a fourth metal layer extending along said second oxide layer and including a portion on said insulator layer proximate said third metal layer and separated therefrom by said second oxide layer, said second metal layer being one of the emitter and collector of said transistor, said fourth metal layer being the other of the emitter and collector of said transistor, said third metal layer being the base of said transistor.
Claim 2
Independent Claim
259 words
A method for making an MOMOM tunnel emission transistor comprising the steps of: providing a substrate having a generally horizontal planar upper surface; forming a first insulator layer on said upper surface of said substrate; forming a first metal layer ranging in thickness from 100 to 1,000 angstroms on the upper surface of said first insulator layer; forming a second insulator layer ranging in thickness from 1,000 to 10,000 angstroms on the upper surface of said first metal layer; forming a second metal layer ranging in thickness from 50 to 500 angstroms on the upper surface of said second insulator layer; defining a mesa having generally vertical sides exposing the edges of said layers; oxidizing the exposed edge of said second metal layer to form a first oxide layer ranging in thickness from 5 to 20 angstroms; forming a third metal layer extending along a portion of the upper surface of said first insulator layer adjacent said first metal layer and also extending along said side of said mesa; oxidizing said third metal layer to form a second oxide layer ranging in thickness from 10 to 40 angstroms; forming a fourth metal layer extending along said second oxide layer and including a portion on said insulator layer proximate said third metal layer and separated therefrom by said second oxide layer, said second metal layer being one of the emitter and collector of said transistor, said fourth metal layer being the other of the emitter and collector of said transistor, said third metal layer being the base of said transistor.
Claim 3
Dependent Claim
103 words
The invention according to claim 1 comprising: forming said third insulator layer on the upper surface of said second metal layer; forming said third metal layer, said second oxide layer and said fourth metal layer extending along said side of said mesa and then along the upper surface of said third insulator layer to be spaced above said second metal layer in a semi-arch configuration; forming said fourth metal layer having a widened section on said first insulator layer and a narrowed section on said second oxide layer and a transition section on said first insulator layer connecting said widened and narrowed sections.
References Cited (Backward Citations)
US3155886A
Cited
GB1004396A
Cited
US3366519A
Cited
US3331998A
Cited
US3397446A
Cited
US3493767A
Cited
US3500142A
Cited
US4549194A
Cited
US4633278A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-09-14 | 1991-03-16 | 1991-09-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-09-14 | 1995-03-16 | 1995-09-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-09-14 | 1999-03-16 | 1999-09-15 | $7700.00 | Window Closed / Lapsed |