US4690529A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Optical exposer
Assignee: Hitachi Ltd
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Filing: 1984-10-03
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Granted: 1987-09-01
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Expires: 2004-10-03
Abstract
Abstract This invention relates to an optical exposer wherein a predetermined pattern is projected onto a work piece through a projector lens, and an alignment mark on the work piece is detected through the projector lens. It is desirable that a detection waveform of the alignment mark will not be deformed. Since the wave deformation is due to distortion of the alignment light, a first wavelength light and a second wavelength light are used as the alignment light to reduce the distortion effect.
Inventors
- 👤 Shuji Sugiyama
- 👤 Shuji Syohda
- 👤 Shinji Kuniyoshi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 10:53
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; H; H10; H10P; H10P95/00
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
140 words
An optical projection exposure system comprising: means for generating light; a mask having a predetermined pattern and at least one alignment mark; means for directing said light to said mask; a projection lens for projecting an image of said predetermined pattern onto a work piece, said work piece including at least one alignment mark; and means for detecting a first superposed image of a first light wavelength composed of a first focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask, and for detecting a second superposed image of a second wavelength composed of a second focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask.
Claim 2
Dependent Claim
140 words
An optical projection exposure system comprising: means for generating light; a mask having a predetermined pattern and at least one alignment mark; means for directing said light to said mask; a projection lens for projecting an image of said predetermined pattern onto a work piece, said work piece including at least one alignment mark; and means for detecting a first superposed image of a first light wavelength composed of a first focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask, and for detecting a second superposed image of a second wavelength composed of a second focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask.
Claim 3
Dependent Claim
22 words
An optical projection exposure system according to claim 1, wherein said projection lens is achromatic for said first and second light wavelengths.
Claim 4
Dependent Claim
34 words
An optical projection exposure system according to claim 1, further comprising means for displacing the work piece so as to produce the first and second superposed images to be detected at a predetermined position.
Claim 5
Dependent Claim
59 words
An optical projection exposure system according to claim 1, further comprising means for producing said first and second superposed images to be detected at first and second predetermined positions, respectively, wherein said detecting means includes first and second detectors arranged so as to detect said first and second superposed images produced at said first and second predetermined positions, respectively.
Claim 6
Dependent Claim
52 words
An optical projection exposure system according to claim 1, further comprising means disposed between said mask and said detecting means for producing said first and second superposed images at a predetermined position, wherein said detecting means includes a single detector arranged so as to simultaneously detect the first and second superposed images.
Claim 7
Dependent Claim
30 words
An optical projection exposure system according to claim 3, further comprising means for disposing a slit at said predetermined position and for scanning said slit in a direction perpendicular thereto.
Claim 8
Dependent Claim
56 words
An optical projection exposure system according to claim 4, further comprising means for disposing a first slit at said first predetermined position and for scanning said first slit in a direction perpendicular thereto and means for disposing a second slit at said second predetermined position and for scanning said second slit in a direction perpendicular thereto.
Claim 9
Dependent Claim
30 words
An optical projection exposure system according to claim 5, further comprising means for disposing a slit at said predetermined position and for scanning said slit in a direction perpendicular thereto.
Claim 10
Dependent Claim
153 words
An optical projection exposure system comprising: means for generating light; a mask having a predetermined pattern and at least one alignment mark; means for directing said light to said mask to thereby transmit said light through said predetermined pattern of said mask; a projection lens for projecting an image of said predetermined pattern onto a work piece, said work piece including at least one alignment mark; and means for detecting a first superposed image of a first light wavelength, composed of a first focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask, and for detecting a second superposed image of a second light wavelength composed of a second focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask.
Claim 11
Dependent Claim
153 words
An optical projection exposure system comprising: means for generating light; a mask having a predetermined pattern and at least one alignment mark; means for directing said light to said mask to thereby transmit said light through said predetermined pattern of said mask; a projection lens for projecting an image of said predetermined pattern onto a work piece, said work piece including at least one alignment mark; and means for detecting a first superposed image of a first light wavelength, composed of a first focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask, and for detecting a second superposed image of a second light wavelength composed of a second focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask.
Claim 12
Dependent Claim
22 words
An optical projection exposure system according to claim 9, wherein said projection lens is achromatic for said first and second light wavelengths.
Claim 13
Dependent Claim
177 words
An optical projection exposure system comprising: means for generating light; a mask having a predetermined pattern and at least one alignment mark; means for directing said light to said mask to thereby transmit said light through said predetermined pattern of said mask; a projection lens for projecting an image of said predetermined pattern onto a work piece having at least one alignment mark; means for detecting a first superposed image of a first light wavelength, composed of a first focused image of said at least one alignment mark of said work piece through said projection lens and said alignment mark of said mask, and for detecting a second superposed image of a second light wavelength, composed of a second focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask, said detecting means converting the detected first and second superposed images into first and second electric signals corresponding thereto, respectively; and means for averaging the converted first and second electric signals.
Claim 14
Dependent Claim
177 words
An optical projection exposure system comprising: means for generating light; a mask having a predetermined pattern and at least one alignment mark; means for directing said light to said mask to thereby transmit said light through said predetermined pattern of said mask; a projection lens for projecting an image of said predetermined pattern onto a work piece having at least one alignment mark; means for detecting a first superposed image of a first light wavelength, composed of a first focused image of said at least one alignment mark of said work piece through said projection lens and said alignment mark of said mask, and for detecting a second superposed image of a second light wavelength, composed of a second focused image of said at least one alignment mark of said work piece through said projection lens and said at least one alignment mark of said mask, said detecting means converting the detected first and second superposed images into first and second electric signals corresponding thereto, respectively; and means for averaging the converted first and second electric signals.
Claim 15
Dependent Claim
22 words
An optical projection exposure system according to claim 11, wherein said projection lens is achromatic for said first and second light wavelengths.
Claim 16
Dependent Claim
34 words
An optical projection exposure system according to claim 11, further comprising means for displacing said work piece so as to produce said first and second superposed images to be detected at a predetermined position.
Claim 17
Dependent Claim
30 words
An optical projection exposure system according to claim 13, further comprising means for disposing a slit at said predetermined position and for scanning said slit in a direction perpendicular thereto.
Claim 18
Dependent Claim
77 words
An optical projection exposure system according to claim 11, further comprising means for producing said first and second superposed images to be detected at first and second positions, respectively, wherein said detecting means includes first and second detectors arranged so as to detect said first and second superposed images produced at said first and second predetermined positions respectively, and to produce said first and second electric signals corresponding to said detected first and second superposed images, respectively.
Claim 19
Dependent Claim
56 words
An optical projection exposure system according to claim 15, further comprising means for disposing a first slit at said first predetermined position and for scanning said first slit in a direction perpendicular thereto and means for disposing a second slit at said second predetermined position and for scanning said second slit in a direction perpendicular thereto.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-08-31 | 1991-03-02 | 1991-09-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-08-31 | 1995-03-02 | 1995-09-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-08-31 | 1999-03-02 | 1999-09-01 | $7700.00 | Window Closed / Lapsed |