Optical system for aligning two patterns and a photorepeater embodying such a system

Claim 2

An optical system for aligning with respect to each other a first pattern having a first and second portion borne by a first mobile support and a second pattern borne by a second mobile support by means of a third intermediate pattern having a first and second portion forming a reference, said system comprising radiant energy source means and having, with said third pattern borne by a fixed support, first optical means with +1 magnification, combining means for optically combining said first portion of said first pattern and said first portion of said third pattern and first opto-electronic means detecting the coincidence of the optical projection of one of said first portion of said first and third patterns on the other of said first portion of said first and third patterns, and comprising further second optical means with a given magnification for optically combining said second pattern and said second portion of said third pattern and second opto-electronic means detecting the coincidence of the optical projection of said second portion of said third pattern on said second pattern.

Claim 3

The system as claimed in claim 1, wherein said first portion of said first pattern comprises a first pair of alignment reference marks disposed along an axis and spaced from each other by a given length, each reference mark comprising at least two zones of different optical density and wherein the first portion of said third pattern comprises a second pair of alignment reference marks optically complementary to the reference marks of said first portion of said first pattern, disposed along an axis and spaced from each other by the same given length.

Claim 4

The system as claimed in claim 2, wherein said first optical means with a magnification equal to +1, comprise for each alignment reference mark of said first pattern to be optically combined with said reference marks of said third pattern, a double-reflection prism, a change-of-direction mirror and a plurality of lenses, and wherein the radiant energy source means comprise a first source associated with optical means concentrating the light energy only on the alignment reference marks.

Claim 5

The system as claimed in claim 1, wherein said second pattern comprises a pair of optical networks forming alignment reference marks, disposed respectively along two orthogonal axes, spaced by the same first, respectively second distance from the point of intersection of the two orthogonal axes, and wherein said second portion of said third pattern comprises furthermore a third pair of reference marks formed by optical networks complementary to the networks of said second pattern; these networks being disposed along two orthogonal axes.

Claim 6

The system as claimed in claim 4, wherein the optical networks of said second and third patterns are each formed by a succession of parallel strokes whose width and spatial distribution in a first direction are determined by a particular distribution code; the strokes of the optical networks of said second pattern being furthermore periodically interrupted in a second direction so as to form an optical network with constant pitches in this direction; and wherein: the radiant energy source means are formed by at least one second monochromatic radiant energy source combined with second optical means for illuminating said second pattern by projection on this pattern of the image of said third pattern with the given magnification and to produce orders of diffraction in said first and second directions; the monochromatic source illuminating predetermined network parts of said third pattern, defining two illumination windows with homothetic surface at the surface of the networks of said second pattern in the inverse ratio of said given magnification and at the same third, respectively fourth distance from the point of intersection of the two orthogonal axes, the common ratio between said first and third distances and said second and fourth distances being equal to the magnification; and said second opto-electronic means detect the intensity of a predetermined part of the orders of diffraction in said second direction, the detected intensity passing through a maximum and the precise alignment being obtained when the spatial correlation of said second pattern and of the projection of the image of said third pattern on said second pattern is maximum.

Claim 7

The system as claimed in claim 5, wherein said fixed support is made from a transparent material on which is inscribed said third pattern formed by strokes defining the alternate zones differentiated by their coefficient of transmission; and wherein said second mobile support is made from a reflecting material on which is etched said second pattern formed by strokes defining alternate zones differentiated by thickness or nature.

Claim 8

The system as claimed in claim 4, wherein said first and third patterns are in parallel planes and said second pattern is in a plane orthogonal to the plane of said first and third patterns.

Claim 9

The system as claimed in claim 7, wherein said second optical means of given magnification comprise an objective for projection at the given magnification and a fixed mirror reflecting back by π/2 the beam rays used for aligning said third and second patterns and produced by said monochromatic source.

Claim 10

The system as claimed in claim 4, wherein said first and third patterns are in the same plane and said second pattern is in a plane parallel to the plane of said first and third patterns.

Claim 11

The system as claimed in claim 9, wherein said second optical means of given magnification comprise an objective for projection at the given magnification, a fixed mirror reflecting back a first time by π/2 the beam of rays used for the alignment of said third and second patterns and produced by said monochromatic source and a mobile mirror reflecting back a second time by π/2 this beam; the mobile mirror being switchable between two positions in a plane parallel to the plane of said second pattern and in a direction parallel to one of said first or second directions.

Claim 12

A photorepeater for the alignment of a semiconductor wafer having on its upper face a layer of photosensitive resin and on which is inscribed a first alignment pattern, with respect to at least one reticle on which is inscribed a second alignment pattern, as well as other patterns to be projected on the wafer; said photorepeater comprising an optical alignment system as claimed in claim 1, wherein said second optical means at the given magnification comprise an objective for projection at said given magnification used alternately for projection of the image of said first alignment pattern on said second alignment pattern during alignment phases and for projection on said wafer at given locations of the image of said other patterns during exposure phases.

Claim 13

The photorepeater as claimed in claim 11, comprising at least one first radiant energy source having a first wavelength, activated during said exposure phases, and a second radiant energy source having a second wavelength, activated during said alignment phases; in which photorepeater said objective for projecting at the given magnification is corrected for said first wavelength and comprising optical focusing direction means compensating for the magnification and focusing deviation due to the use of radiations of different wavelengths.

Claim 14

The photorepeater as claimed in claim 12, wherein said second optical means of given magnification comprise further a mirror partially transparent at said second wavelength; this mirror having a coefficient of reflection substantially equal to one for said first wavelength.

Claim 15

The photorepeater as claimed in claim 11, comprising a single radiant energy source used alternately for alignment and exposure wherein, during said alignment phases, this source is heavily diaphragmed so as to obtain coherent illumination of very low intensity.