US4686113A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma confinement in a low pressure electrically grounded R.F. heated reactor and deposition method
Assignee: National Semiconductor Corp
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Filing: 1985-12-18
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Granted: 1987-08-11
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Expires: 2005-12-18
Abstract
Abstract A deposition reactor system is described for producing a coating containing a predetermined component on a substrate from a plasma containing such component in an ionized state. The substrate is supported on a susceptor within a reactor chamber to which is introduced a gas containing the predetermined component. A radio frequency field is inductively coupled to the gas, forming a plasma in the reactor chamber in the region of the susceptor. The susceptor is maintained at ground potential in the radio frequency field.
Inventors
- 👤 Michelangelo Delfino
- 👤 Bruce R. Cairns
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 02:07
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/507; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/332; H01J2237/3322; H01J2237/3323
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
107 words
A deposition reactor system for producing a coating containing a predetermined component on a substrate from a plasma containing such component in an ionized state, said reactor system comprising, means defining a reactor chamber, means for introducing a gas containing the predetermined component to said reactor chamber, susceptor means for supporting the substrate to be coated within said reactor chamber, induction heating means including coil means positioned for inductively coupling a radio frequency field to the gas for forming a plasma in said reactor chamber in the region of said susceptor means, and means for maintaining said susceptor means at ground potential in the radio frequency field.
Claim 2
Dependent Claim
107 words
A deposition reactor system for producing a coating containing a predetermined component on a substrate from a plasma containing such component in an ionized state, said reactor system comprising, means defining a reactor chamber, means for introducing a gas containing the predetermined component to said reactor chamber, susceptor means for supporting the substrate to be coated within said reactor chamber, induction heating means including coil means positioned for inductively coupling a radio frequency field to the gas for forming a plasma in said reactor chamber in the region of said susceptor means, and means for maintaining said susceptor means at ground potential in the radio frequency field.
Claim 3
Dependent Claim
19 words
A system according to claim 1 wherein said grounding means are positioned proximate an end of said coil means.
Claim 4
Dependent Claim
26 words
A system according to claim 1 wherein said grounding means include a portion of said susceptor means within said reactor chamber extending beyond said coil means.
Claim 5
Independent Claim
137 words
A method for operating a deposition reactor system for producing a coating containing a predetermined component on a substrate from a plasma containing such component in an ionized state, wherein the reactor system includes a reactor chamber, a susceptor for supporting the substrate to be coated within the reactor chamber, and an induction coil surrounding the susceptor for producing a radio frequency field for forming a plasma in the reactor chamber in the region of the susceptor, said method comprising, introducing a gas containing the predetermined component to the reactor chamber, inductively coupling a radio frequency magnetic field to the gas for forming a plasma in the reactor chamber in the region of the susceptor by energizing the coil with a radio frequency current, and maintaining the susceptor at ground potential in the radio frequency magnetic field.
Claim 6
Independent Claim
137 words
A method for operating a deposition reactor system for producing a coating containing a predetermined component on a substrate from a plasma containing such component in an ionized state, wherein the reactor system includes a reactor chamber, a susceptor for supporting the substrate to be coated within the reactor chamber, and an induction coil surrounding the susceptor for producing a radio frequency field for forming a plasma in the reactor chamber in the region of the susceptor, said method comprising, introducing a gas containing the predetermined component to the reactor chamber, inductively coupling a radio frequency magnetic field to the gas for forming a plasma in the reactor chamber in the region of the susceptor by energizing the coil with a radio frequency current, and maintaining the susceptor at ground potential in the radio frequency magnetic field.
Claim 7
Dependent Claim
18 words
A method according to claim 4 wherein the susceptor is held at a temperature below about 750° C.
Claim 8
Dependent Claim
14 words
A method according to claim 4 wherein the predetermined component is a chemical element.
Claim 9
Dependent Claim
12 words
A method according to claim 4 wherein the predetermined component is nitrogen.
Claim 10
Dependent Claim
11 words
A method according to claim 4 wherein the substrate is silicon.
Claim 11
Dependent Claim
17 words
A method according to claim 4 wherein the gas pressure in the reactor is less than atmospheric.
References Cited (Backward Citations)
US3980854A
Cited
US4298629A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-08-10 | 1991-02-09 | 1991-08-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-08-10 | 1995-02-09 | 1995-08-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-08-10 | 1999-02-09 | 1999-08-11 | $7700.00 | Window Closed / Lapsed |