Optical disk transmission monitor for deposited films

Claim 2

An instrument for determining a characteristic of a film deposted on a substrate during a deoosition process which comprises: (a) a supporting structure; (b) a monitor substrate in the form of a transparent disk; (c) a motor for rotating said disk mounted on said supporting structure; (d) shielding means mounted on said supporting structure said means shielding a portion of the surface area of said disk from said deposition process whereby substantially no deposition will occur on the disk within the shielded area: (e) a source of light; (f) means for directing a beam of said light through said disk within said shielded area; and (g) means for generating an electrical signal responsive ot the amount of light passing through said disk.

Claim 3

An instrument as recited in claim 1 and further including stabilizing means for stabilizing the intensity of the light incident on said disk.

Claim 4

An instrument as recited in claim 1 where said source of light is an LED.

Claim 5

An instrument as recited in claim 3 wherein said LED is excited with an AC voltage and wherein said means for generating an electrical signal comprises a photocell and demodulating means for demodulating the output of said photocell.

Claim 6

An instrument as recited in claim 1 and further including signal conditioning means to condition said electrical signal whereby the magnitude of said conditioned electrical signal will be a function of the optical transmissivity of said film.

Claim 7

An instrument as recited in claim 1 and further including signal conditioning means to condition said electrical signal whereby the magnitude of said conditioned electrical signal will be a function of the thickness of said film.

Claim 8

A mehtod for determining a characteristic of a film deposited on a substrate during a deposition process which comprises: (a) placing a substrate to be coated in a chamber positioned to be bombarded by particles of the material to be deposited on said substrate; (b) placing a transparent disk in said chamber positioned to be bombarded by particles of said material, said positioning being such that the intensity of bombardment on said disk will be a multiple of the intensity of oarticles bombarding said substrate; (c) shielding a portion of the surface area of said disk from the deposition process whereby substantially no deposition will take place within the shielded area; (d) rotating said disk whereby different areas of said disk will be shielded from said deposition orocess as said disk rotates; (e) passing light having a predetermined intensity through said disk within the shielded area; and (f) generating an electrical signal dependent on the amount of said light passing through a portion of said disk.

Claim 9

A mehtod for determining a characteristic of a film deposited on a substrate during a deposition process which comprises: (a) placing a substrate to be coated in a chamber positioned to be bombarded by particles of the material to be deposited on said substrate; (b) placing a transparent disk in said chamber positioned to be bombarded by particles of said material, said positioning being such that the intensity of bombardment on said disk will be a multiple of the intensity of oarticles bombarding said substrate; (c) shielding a portion of the surface area of said disk from the deposition process whereby substantially no deposition will take place within the shielded area; (d) rotating said disk whereby different areas of said disk will be shielded from said deposition orocess as said disk rotates; (e) passing light having a predetermined intensity through said disk within the shielded area; and (f) generating an electrical signal dependent on the amount of said light passing through a portion of said disk.

Claim 10

The method as recited in claim 7 where said disk is positioned whereby said multiple is one.

Claim 11

The method as recited in claim 7 and further including the step of conditioning said electrical electrical signal will be representative of the optical transmissivity of said film.

Claim 12

The method as recited in claim 7 and further including the step of conditioning said electrical signal whereby the magnitude of the conditioned electrical signal will be representative of the thickness of said film.

Claim 13

An instrument for determining a characteristic of film deposited on a substrate during a deposition process which comprises: (a) a supporting structure; (b) a monitor substrate in the form of a transparent disk; (c) a motor for rotating said disk mounted on said supporting structure; (d) a source of light; (e) an optical system for directing a beam of said light through said disk: (f) shielding means for preventing deposition on said optical system: (g) means for generating an electrical signal responsive to the amount of light passing through said disk.

Claim 14

An instrument for determining a characteristic of film deposited on a substrate during a deposition process which comprises: (a) a supporting structure; (b) a monitor substrate in the form of a transparent disk; (c) a motor for rotating said disk mounted on said supporting structure; (d) a source of light; (e) an optical system for directing a beam of said light through said disk: (f) shielding means for preventing deposition on said optical system: (g) means for generating an electrical signal responsive to the amount of light passing through said disk.

Claim 15

An instrument as recited in claim 11 where said shielding means further prevents deposition on a predetermined fraction of the circumference of said said disk;