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US4675239A
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Perpendicular magnetization film
Assignee: DANEGAFUCHI KAGAKU KOGYO KK
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Filing: 1985-06-10
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Granted: 1987-06-23
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Expires: 2005-06-10
Abstract
Abstract A perpendicular magnetization amorphous thin film of an alloy of samarium, cobalt and bismuth having an easy magnetizing axis perpendicular to a plane of substrate, and the preparation thereof. According to the thin film, a large saturation magnetization is obtained along an easy magnetizing direction perpendicular to the plane of substrate. The thin film can be prepared by depositing samarium, cobalt and bismuth on the substrate without any applying a bias voltage to the substrate.
Inventors
- 👤 Yoshifumi Sakurai
- 👤 Koji Saiki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 21:44
CPC Classifications
G; G11; G11B; G11B5/00; G11B5/62; G11B5/64; G11B5/65; G11B5/656; H; H01; H01F; H01F10/00; H01F10/08; H01F10/10; H01F10/12; H01F10/13; H01F10/133; H01F10/135; H01F10/137; Y; Y10; Y10S; Y10S428/00; Y10S428/922; Y10S428/9265; Y10S428/928; Y10T; Y10T428/00; Y10T428/12; Y10T428/12431; Y10T428/12438; Y10T428/12465; Y10T428/12493; Y10T428/12736; Y10T428/1275
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
54 words
A perpendicular magnetization film comprising an amorphous magnetic thin film of an alloy of 5 to 50 atomic % of samarium, 0.1 to 40 atomic % of bismuth and remainder cobalt and a substrate, said amorphous magnetic thin film being supported on the substrate and having an easy magnetizing axis perpendicular to the substrate.
Claim 2
Dependent Claim
54 words
A perpendicular magnetization film comprising an amorphous magnetic thin film of an alloy of 5 to 50 atomic % of samarium, 0.1 to 40 atomic % of bismuth and remainder cobalt and a substrate, said amorphous magnetic thin film being supported on the substrate and having an easy magnetizing axis perpendicular to the substrate.
Claim 3
Dependent Claim
41 words
A process for preparing an amorphous magnetic thin film having an easy magnetizing axis perpendicular to a substrate, which comprises sputtering 5 to 50 atomic % of samarium, 0.1 to 40 atomic % of bismuth and remainder cobalt on the substrate.
Claim 4
Dependent Claim
41 words
A process for preparing an amorphous magnetic thin film having an easy magnetizing axis perpendicular to a substrate, which comprises sputtering 5 to 50 atomic % of samarium, 0.1 to 40 atomic % of bismuth and remainder cobalt on the substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-06-22 | 1990-12-22 | 1991-06-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-06-22 | 1994-12-22 | 1995-06-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-06-22 | 1998-12-22 | 1999-06-23 | $7700.00 | Window Closed / Lapsed |