Patent US4673482A successfully refreshed from Google Patents.
US4673482A
Expired / Lapsed
US
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Sputtering apparatus
Assignee: Hitachi Ltd
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Filing: 1986-09-25
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Granted: 1987-06-16
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Expires: 2006-09-25
Abstract
Abstract A sputtering apparatus for sputtering magnetic materials. The apparatus comprises at least one pair of magnetic field-generating sources, a substrate disposed within the magnetic field-generating sources, a target disposed opposite to the substrate, and a magnetic thin plate disposed at a side of the substrate which is remote from the target. The magnetic thin plate is disposed at a position in close contact with the substrate or a position slightly away from the substrate, or is disposed movably between such positions. When sputtering a magnetic material onto the substrate, a uniform magnetic field can be generated on the substrate surface by virtue of the provision of the thin magnetic plate.
Inventors
- 👤 Eiji Setoyama
- 👤 Keiji Arimatsu
- 👤 Youichi Ohshita
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 14:23
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35; C23C14/351; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
59 words
A sputtering apparatus comprising: at least one pair of magnetic field-generating sources; a substrate disposed within said magnetic field-generating sources; a target disposed opposite to said substrate; and a magnetic thin plate disposed at a side of said substrate which is remote from said target so that a uniform magnetic field is generated on the surface of said substrate.
Claim 2
Dependent Claim
59 words
A sputtering apparatus comprising: at least one pair of magnetic field-generating sources; a substrate disposed within said magnetic field-generating sources; a target disposed opposite to said substrate; and a magnetic thin plate disposed at a side of said substrate which is remote from said target so that a uniform magnetic field is generated on the surface of said substrate.
Claim 3
Dependent Claim
24 words
A sputtering apparatus as claimed in claim 1, wherein said magnetic thin plate is disposed at a position in close contact with said substrate.
Claim 4
Dependent Claim
23 words
A sputtering apparatus as claimed in claim 1, wherein said magnetic thin plate is disposed at a position slightly away from said substrate.
Claim 5
Dependent Claim
36 words
A sputtering apparatus as claimed in claim 1, wherein said magnetic thin plate is disposed in a movable manner between a position slightly away from said substrate and a position in close contact with said substrate.
Claim 6
Dependent Claim
24 words
A sputtering apparatus as claimed in claim 1, wherein at least one additional substrate is disposed in a manner coplanar with said first substrate.
Claim 7
Dependent Claim
62 words
A sputtering apparatus as claimed in claim 1, further including a heater disposed at a side of said substrate which is remote from said target for heating said substrate, and a uniformizing plate arranged on the surface of said heater for making uniform the radiant heat from said heater, said magnetic thin plate being provided on the surface of said uniformizing plate.
Claim 8
Dependent Claim
22 words
A sputtering apparatus as claimed in claim 6, wherein said magnetic thin plate being constructed as a part of said uniformizing plate.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-06-15 | 1990-12-15 | 1991-06-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-06-15 | 1994-12-15 | 1995-06-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-06-15 | 1998-12-15 | 1999-06-16 | $7700.00 | Window Closed / Lapsed |