US4667392A
Expired / Lapsed
US
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Solid-state image sensor manufacturing process
Assignee: Mitsubishi Electric Corp
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Filing: 1986-07-03
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Granted: 1987-05-26
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Expires: 2006-07-03
Abstract
Abstract A solid-state image sensor comprises an n-type silicon substrate (11), a p-type silicon layer (12) formed on the substrate (11), a plurality of nMOS transistors (1), a field insulating film (13) for separating the nMOS transistors (1) and a buried insulating film (20) provided between the substrate (11) and the field insulating film (13). The buried insulating film (20) serve to prevent electrons from flowing between the adjacent nMOS transistors (1). Accordingly, occurrence of a color mixture phenomenon, a blooming phenomenon or a smear phenomenon can be suppressed. In addition, when a p-type junction layer (21) is provided on the substrate (11) and a bias power supply (19) is connected between them, and when the voltage is adjusted, the red color sensitivity of a photodiode consisting of an n-type source region (16) in each nMOS transistor (1) can be uniformly and easily adjusted.
Inventors
- 👤 Shiro Hine
- 👤 Hidenobu Ishikura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 03:51
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/10; H10F39/12; H10F39/18; H10F39/186; H10F39/182
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
166 words
A manufacturing process of a solid-state image sensor comprising: a first step of forming an insulating film on one major surface of a semiconductor substrate of the first conduction type and subjecting said insulating film to selective etching so that on one major surface of said semiconductor substrate, at least portions corresponding to regions assigned for photoelectric transducers are exposed and the remaining insulating film serves as a buried insulating film, a second step of forming an epitaxial growth semiconductor layer of the second conduction type thicker than said buried insulating film by epitaxial growth on the exposed surface of said semiconductor substrate so that it extends over said buried insulating film, a third step of subjecting the surface of said epitaxial growth semiconductor layer to selective oxidation so that a field insulating film is formed to be in contact with said buried insulating film, and a fourth step of forming photoelectric transducers in said regions assigned for photoelectric transducers in said epitaxial growth semiconductor layer.
Claim 2
Dependent Claim
166 words
A manufacturing process of a solid-state image sensor comprising: a first step of forming an insulating film on one major surface of a semiconductor substrate of the first conduction type and subjecting said insulating film to selective etching so that on one major surface of said semiconductor substrate, at least portions corresponding to regions assigned for photoelectric transducers are exposed and the remaining insulating film serves as a buried insulating film, a second step of forming an epitaxial growth semiconductor layer of the second conduction type thicker than said buried insulating film by epitaxial growth on the exposed surface of said semiconductor substrate so that it extends over said buried insulating film, a third step of subjecting the surface of said epitaxial growth semiconductor layer to selective oxidation so that a field insulating film is formed to be in contact with said buried insulating film, and a fourth step of forming photoelectric transducers in said regions assigned for photoelectric transducers in said epitaxial growth semiconductor layer.
Claim 3
Dependent Claim
35 words
A manufacturing process of a solid-state image sensor in accordance with claim 1, wherein said epitaxial growth semiconductor layer is formed in a vapor-phase epitaxy furnace where pressure is reduced to less than 100 Torr.
Claim 4
Dependent Claim
30 words
A manufacturing process of a solid-state image sensor in accordance with claim 1, wherein said buried insulating film is formed so as to have a width less than 100 μm.
Claim 5
Dependent Claim
40 words
A manufacturing process of a solid-state image sensor in accordance with claim 1, wherein a layer of high impurity concentration is formed in said epitaxial growth semiconductor layer over said buried insulating film before formation of said field insulating film.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-05-25 | 1990-11-24 | 1991-05-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-05-25 | 1994-11-24 | 1995-05-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-05-25 | 1998-11-24 | 1999-05-26 | $7700.00 | Window Closed / Lapsed |