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US4664748A Expired / Lapsed US ⏱️ 0.0 years remaining

Surface roughening method

Assignee: New Energy Development Organization
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Filing: 1985-10-17
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Granted: 1987-05-12
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Expires: 2005-10-17
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Abstract

Abstract A surface roughening method, preferably for a substrate of a solar cell, comprising coating the substrate with a photoresist material having light-shielding particles mixed therein, exposing and developing the photoresist coating and then etching the substrate with a suitable etchant.

Inventors

  • 👤 Masakazu Ueno
  • 👤 Toshiaki Kato

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 20:39
CPC Classifications
C; C03; C03C; C03C15/00; H; H10; H10F; H10F77/00; H10F77/40; H10F77/42; H10F77/484; H10F77/488; H10F77/70; H10F77/707; H10P; H10P50/00; H10P50/69; H10P50/691; H10P50/692; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/52

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 50 words
A surface roughening method, comprising the following steps: coating the surface of a piece of glass with a photoresist incorporating light-shielding micro-particles; exposing and developing the photoresist coat; and etching the substrate with hydrofluoric acid capable of etching the glass, but not etching the undeveloped photoresist behind the light-shielding particles.
Claim 2
Dependent Claim 50 words
A surface roughening method, comprising the following steps: coating the surface of a piece of glass with a photoresist incorporating light-shielding micro-particles; exposing and developing the photoresist coat; and etching the substrate with hydrofluoric acid capable of etching the glass, but not etching the undeveloped photoresist behind the light-shielding particles.
Claim 3
Dependent Claim 22 words
The method of claim 1 in which the photoresist is a positive working photoresist material having a thickness of about 1 μm.
Claim 4
Dependent Claim 61 words
A surface roughening method, comprising the following steps: coating the surface of a piece of aluminum with a photoresist incorporating light-shielding micro-particles of silver glass beads having a diameter of about 10 μm; exposing and developing the photoresist coat; and etching the aluminum with an etchant capable of etching the aluminum, but not etching the undeveloped photoresist behind the light-shielding particles.
Claim 5
Dependent Claim 61 words
A surface roughening method, comprising the following steps: coating the surface of a piece of aluminum with a photoresist incorporating light-shielding micro-particles of silver glass beads having a diameter of about 10 μm; exposing and developing the photoresist coat; and etching the aluminum with an etchant capable of etching the aluminum, but not etching the undeveloped photoresist behind the light-shielding particles.
Claim 6
Independent Claim 127 words
A method of roughening the surface of a piece of glass, comprising: coating said glass surface with a coat having a thickness of about 1 μm with a positive working photoresist material, said material having mixed therein light-shielding particles and being non-reacting with hydrofluoric acid; exposing the coating to light for a sufficient time to react with the photoresist material so that only the portions behind the light-shielding particles remain unexposed; developing the photoresist material; and etching the surface of the glass with hydrofluoric acid for a sufficient time to react with that portion of the glass surface not covered by the light-shielding particles to produce a glass surface upon which multiple cylindrical glass columns are dispersed in location corresponding to the locations of the light-shielding particles.
Claim 7
Independent Claim 127 words
A method of roughening the surface of a piece of glass, comprising: coating said glass surface with a coat having a thickness of about 1 μm with a positive working photoresist material, said material having mixed therein light-shielding particles and being non-reacting with hydrofluoric acid; exposing the coating to light for a sufficient time to react with the photoresist material so that only the portions behind the light-shielding particles remain unexposed; developing the photoresist material; and etching the surface of the glass with hydrofluoric acid for a sufficient time to react with that portion of the glass surface not covered by the light-shielding particles to produce a glass surface upon which multiple cylindrical glass columns are dispersed in location corresponding to the locations of the light-shielding particles.

References Cited (Backward Citations)

US4407695A Cited
US4532537A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-05-11 1990-11-10 1991-05-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-05-11 1994-11-10 1995-05-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1998-05-11 1998-11-10 1999-05-12 $7700.00 Window Closed / Lapsed

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