US4659639A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photosensitive member with an amorphous silicon-containing insulating layer
Assignee: Minolta Co Ltd
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Filing: 1984-09-10
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Granted: 1987-04-21
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Expires: 2004-09-10
Abstract
Abstract A photosensitive member which comprises a photoconductive layer and an insulating layer located on the photoconductive layer, the photoconductive layer including amorphous silicon and the insulating layer including amorphous silicon, carbon, oxygen and fluorine. The photoconductive layer has a higher resistivity than the photosensitive member. A barrier layer may be located beneath the photoconductive layer, the barrier layer including either amorphous silicon, oxygen and a Group III impurity or amorphous silicon, carbon and oxygen.
Inventors
- 👤 Hiroshi Mizuno
- 👤 Shuji Iino
- 👤 Izumi Osawa
- 👤 Isao Doi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 15:58
CPC Classifications
H; H10; H10F; H10F71/00; H10F71/10; H10F71/103; H10F30/00; H10F30/10; H10F30/15; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02P; Y02P70/00; Y02P70/50
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
42 words
A photosensitive member which comprises a photoconductive layer that includes amorphous silicon, and an insulating layer on said photoconductive layer, said insulating layer including amorphous silicon, carbon, oxygen and fluorine, said insulating layer having a thickness of about 0.01 to 3 microns.
Claim 2
Dependent Claim
42 words
A photosensitive member which comprises a photoconductive layer that includes amorphous silicon, and an insulating layer on said photoconductive layer, said insulating layer including amorphous silicon, carbon, oxygen and fluorine, said insulating layer having a thickness of about 0.01 to 3 microns.
Claim 3
Dependent Claim
75 words
A photosensitive member which comprises a photoconductive layer that includes amorphous silicon and has a thickness of 5 to 100 microns, and an insulating layer on said photoconductive layer which includes amorphous silicon, carbon, oxygen and fluorine, and which has a thickness of about 0.01 to 3 microns, said insulating layer including about 5 to 65 atomic % of carbon, up to 10 atomic % of oxygen and up to 10 atomic % of fluorine.
Claim 4
Dependent Claim
75 words
A photosensitive member which comprises a photoconductive layer that includes amorphous silicon and has a thickness of 5 to 100 microns, and an insulating layer on said photoconductive layer which includes amorphous silicon, carbon, oxygen and fluorine, and which has a thickness of about 0.01 to 3 microns, said insulating layer including about 5 to 65 atomic % of carbon, up to 10 atomic % of oxygen and up to 10 atomic % of fluorine.
Claim 5
Dependent Claim
21 words
A photosensitive member as claimed in claim 2, wherein said carbon, oxygen and fluorine are included uniformly throughout said insulating layer.
Claim 6
Dependent Claim
65 words
A photosensitive member as claimed in claim 2, further including an electroconductive substrate and a barrier layer on said electroconductive substrate, said photoconductive layer being located on said barrier layer, said barrier layer including amorphous silicon, about 5 to 60 atomic % of oxygen and a Group IIIA impurity of the Periodic Table, said barrier layer having a thickness of about 0.003 to 2 microns.
Claim 7
Dependent Claim
64 words
A photosensitive member as claimed in claim 2, further including an electroconductive substrate and a barrier layer on said electroconductive substrate, said photoconductive layer being located on said barrier layer, said barrier layer including amorphous silicon, about 5 to 60 atomic % of carbon and up to 10 atomic % of oxygen, said barrier layer having a thickness of about 0.003 to 2 microns.
Claim 8
Dependent Claim
88 words
A photosensitive member which comprises a photoconductive layer that includes amorphous silicon and has a thickness of 5 to 100 microns, and an insulating layer on said photoconductive layer which includes amorphous silicon, carbon, oxygen and fluorine, and which has a thickness of about 0.01 to 3 microns, said insulating layer including about 1 to 65 atomic % of carbon, up to 25 atomic % of oxygen and up to 10 atomic % of fluorine varying within said insulating layer in the direction away from said photoconductive layer.
Claim 9
Dependent Claim
88 words
A photosensitive member which comprises a photoconductive layer that includes amorphous silicon and has a thickness of 5 to 100 microns, and an insulating layer on said photoconductive layer which includes amorphous silicon, carbon, oxygen and fluorine, and which has a thickness of about 0.01 to 3 microns, said insulating layer including about 1 to 65 atomic % of carbon, up to 25 atomic % of oxygen and up to 10 atomic % of fluorine varying within said insulating layer in the direction away from said photoconductive layer.
Claim 10
Dependent Claim
150 words
A photosensitive member which comprises: an electrically-conductive substrate; a barrier layer on said substrate, said barrier layer including either amorphous silicon, about 5 to 60 atomic % of oxygen and no more than 2000 ppm of a Group IIIA impurity of the Periodic Table, or amorphous silicon, about 5 to 60 atomic % of carbon and no more than 10 atomic % of oxygen, said barrier layer having a thickness of about 0.003 to 2 microns; a photoconductive layer, said photoconductive layer including amorphous silicon and having a thickness of 5 to 100 microns; and an insulating layer on said photoconductive layer, said insulating layer including amorphous silicon, carbon, oxygen and fluorine, and which has a thickness of about 0.01 to 3 microns, said insulating layer including about 5 to 65 atomic % of carbon, up to 10 atomic % of oxygen and up to 10 atomic % of fluorine.
Claim 11
Dependent Claim
150 words
A photosensitive member which comprises: an electrically-conductive substrate; a barrier layer on said substrate, said barrier layer including either amorphous silicon, about 5 to 60 atomic % of oxygen and no more than 2000 ppm of a Group IIIA impurity of the Periodic Table, or amorphous silicon, about 5 to 60 atomic % of carbon and no more than 10 atomic % of oxygen, said barrier layer having a thickness of about 0.003 to 2 microns; a photoconductive layer, said photoconductive layer including amorphous silicon and having a thickness of 5 to 100 microns; and an insulating layer on said photoconductive layer, said insulating layer including amorphous silicon, carbon, oxygen and fluorine, and which has a thickness of about 0.01 to 3 microns, said insulating layer including about 5 to 65 atomic % of carbon, up to 10 atomic % of oxygen and up to 10 atomic % of fluorine.
Claim 12
Dependent Claim
173 words
A photosensitive member which comprises: an electrically-conductive substrate; a barrier layer on said substrate, said barrier layer including either amorphous silicon, about 5 to 60 atomic % of oxygen and up to 2000 ppm of a Group IIIA impurity of the Periodic Table, or amorphous silicon, about 5 to 60 atomic % of carbon and up to 10 atomic % of oxygen, said barrier layer having a thickness of about 0.003 to 2 microns; a photoconductive layer, said photoconductive layer including amorphous silicon and having a thickness of 5 to 100 microns; and an insulating layer on said photoconductive layer, said insulating layer including amorphous silicon, carbon, oxygen and fluorine, and which has a thickness of about 0.01 to 3 microns, said insulating layer including about 1 to 65 atomic % of carbon, up to 25 atomic % of oxygen and up to 10 atomic % of fluorine, the concentration of at least one of said carbon, oxygen and fluorine varying within said insulating layer in the direction away from said photoconductive layer.
Claim 13
Dependent Claim
173 words
A photosensitive member which comprises: an electrically-conductive substrate; a barrier layer on said substrate, said barrier layer including either amorphous silicon, about 5 to 60 atomic % of oxygen and up to 2000 ppm of a Group IIIA impurity of the Periodic Table, or amorphous silicon, about 5 to 60 atomic % of carbon and up to 10 atomic % of oxygen, said barrier layer having a thickness of about 0.003 to 2 microns; a photoconductive layer, said photoconductive layer including amorphous silicon and having a thickness of 5 to 100 microns; and an insulating layer on said photoconductive layer, said insulating layer including amorphous silicon, carbon, oxygen and fluorine, and which has a thickness of about 0.01 to 3 microns, said insulating layer including about 1 to 65 atomic % of carbon, up to 25 atomic % of oxygen and up to 10 atomic % of fluorine, the concentration of at least one of said carbon, oxygen and fluorine varying within said insulating layer in the direction away from said photoconductive layer.
Claim 14
Dependent Claim
36 words
A photosensitive member as claimed in claim 2, wherein said insulating layer includes between about 0.01 atomic % and 10 atomic % of oxygen and between about 0.01 atomic % and 10 atomic % of fluorine.
Claim 15
Dependent Claim
28 words
A photosensitive member as claimed in claim 6, wherein said insulating layer includes at least 0.01 atomic % of oxygen and at least 0.01 atomic % of fluorine.
Claim 16
Dependent Claim
28 words
A photosensitive member as claimed in claim 7, wherein said insulating layer includes at least 0.01 atomic % of oxygen and at least 0.01 atomic % of fluorine.
Claim 17
Dependent Claim
28 words
A photosensitive member as claimed in claim 8, wherein said insulating layer includes at least 0.01 atomic % of oxygen and at least 0.01 atomic % of fluorine.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-04-20 | 1990-10-20 | 1991-04-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-04-20 | 1994-10-20 | 1995-04-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-04-20 | 1998-10-20 | 1999-04-21 | $7700.00 | Window Closed / Lapsed |