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US4657350A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for manufacturing a double refraction plate

Assignee: Sony Corp
•
Filing: 1986-02-18
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Granted: 1987-04-14
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Expires: 2006-02-18
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Abstract

Abstract A novel process for producing a double refraction plate is disclosed. According to the process, a transparent dielectric material is directed to and deposited on a substrate from an oblique direction. Above all, for controlling the retardation of the resulting double refraction plate, a polarized light having a plane of polarization in a specific direction relative to the substrate is directed to the substrate through the variable phase plate and the light reflected from the substrate is observed through the variable phase plate, as the dielectric material is deposited from an oblique direction.

Inventors

  • 👤 Toshio Mori

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 10:12
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/225; C23C14/54; C23C14/542; C23C14/545; C23C14/547; G; G01; G01N; G01N21/00; G01N21/17; G01N21/21; G02; G02B; G02B5/00; G02B5/30; G02B5/3083; G01N21/23; Y; Y10; Y10S; Y10S359/00; Y10S359/90

Claims Analysis

Total Claims: 17
Claim 1
Independent Claim 70 words
A process for manufacturing a double refraction plate, comprising the steps of: impinging and vapor-depositing dielectric material on a surface of a substrate from an oblique direction of at least 30° relative to a perpendicular to a surface thereof; and controlling the impinging oblique direction and deposited film thickness so that a resulting double refraction layer on the surface has a desired retardation of at least one-eighth of a wavelength.
Claim 2
Dependent Claim 70 words
A process for manufacturing a double refraction plate, comprising the steps of: impinging and vapor-depositing dielectric material on a surface of a substrate from an oblique direction of at least 30° relative to a perpendicular to a surface thereof; and controlling the impinging oblique direction and deposited film thickness so that a resulting double refraction layer on the surface has a desired retardation of at least one-eighth of a wavelength.
Claim 3
Dependent Claim 19 words
The process as claimed in claim 1 characterized by depositing dielectric material at an incident angle more than 45°.
Claim 4
Dependent Claim 47 words
The process as claimed in claim 1 characterized by using a material selected from the group consisting of an oxide of titanium (Ti), an oxide of zirconium (Zr), an oxide of cerium (Ce), an oxide of gallium (Ga) and an oxide of silicon (Si) as dielectric material.
Claim 5
Dependent Claim 18 words
The process as claimed in claim 1 characterized by using an oxide of titanium (Ti) as dielectric material.
Claim 6
Dependent Claim 21 words
A process according to claim 1 wherein a desired retardation is achieved partly through selection of the dielectric material being deposited.
Claim 7
Dependent Claim 12 words
A process according to claim 1 wherein the dielectric material is transparent.
Claim 8
Dependent Claim 118 words
A process for producing a double refraction plate, comprising the steps of: impinging and depositing dielectric material on a substrate from an oblique direction of at least 30° relative to a perpendicular to the surface thereof so as to create a double-refraction layer on the surface; and directing a polarized light through a variable phase plate to said substrate, said polarized light having a plane of polarization in a specific direction, and by observing the light reflected from said substrate through said variable phase plate determining a retardation of the resulting double refraction plate and controlling the impinging oblique direction and deposited film thickness so as to achieve a desired retardation of at least one-eight of a wavelength.
Claim 9
Dependent Claim 118 words
A process for producing a double refraction plate, comprising the steps of: impinging and depositing dielectric material on a substrate from an oblique direction of at least 30° relative to a perpendicular to the surface thereof so as to create a double-refraction layer on the surface; and directing a polarized light through a variable phase plate to said substrate, said polarized light having a plane of polarization in a specific direction, and by observing the light reflected from said substrate through said variable phase plate determining a retardation of the resulting double refraction plate and controlling the impinging oblique direction and deposited film thickness so as to achieve a desired retardation of at least one-eight of a wavelength.
Claim 10
Dependent Claim 20 words
The process as claimed in claim 7 characterized by controlling the retardation to be equal to one-fourth of a wavelength.
Claim 11
Dependent Claim 20 words
The process as claimed in claim 7 characterized by controlling the retardation to be equal to one-eighth of a wavelength.
Claim 12
Dependent Claim 67 words
A double refraction plate produced by the steps of: impinging and vapor-depositing dielectric material on a surface of a substrate from an oblique direction of at least 30° relative to a perpendicular to the surface thereof; and controlling the impinging oblique direction and deposited film thickness so that a resulting double refraction layer on the surface has a desired retardation of at least one-eighth of a wavelength.
Claim 13
Dependent Claim 67 words
A double refraction plate produced by the steps of: impinging and vapor-depositing dielectric material on a surface of a substrate from an oblique direction of at least 30° relative to a perpendicular to the surface thereof; and controlling the impinging oblique direction and deposited film thickness so that a resulting double refraction layer on the surface has a desired retardation of at least one-eighth of a wavelength.
Claim 14
Dependent Claim 22 words
The double refraction plate as claimed in claim 10 having a deposited film providing a retardation equal to one-fourth of a wavelength.
Claim 15
Dependent Claim 22 words
The double refraction plate as claimed in claim 10 having a deposited film providing a retardation equal to one-eighth of a wavelength.
Claim 16
Dependent Claim 92 words
A process for manufacturing a double refraction plate, comprising the steps of: selecting a transparent dielectric material; vapor-depositing the dielectric material on a surface of a substrate at a given angle of at least 30° relative to a perpendicular to the surface; observing a retardation of a deposited double refraction layer on the substrate during the overall process; and controlling the retardation so as to achieve a desired retardation value of at least one-eighth of a wave length by controlling the angle of incidence of deposited material and thickness of deposited material.
Claim 17
Dependent Claim 92 words
A process for manufacturing a double refraction plate, comprising the steps of: selecting a transparent dielectric material; vapor-depositing the dielectric material on a surface of a substrate at a given angle of at least 30° relative to a perpendicular to the surface; observing a retardation of a deposited double refraction layer on the substrate during the overall process; and controlling the retardation so as to achieve a desired retardation value of at least one-eighth of a wave length by controlling the angle of incidence of deposited material and thickness of deposited material.

References Cited (Backward Citations)

US2973686A Cited
US3698946A Cited
US3834792A Cited
US4024291A Cited
US4150877A Cited
US4248502A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-04-13 1990-10-13 1991-04-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-04-13 1994-10-13 1995-04-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1998-04-13 1998-10-13 1999-04-14 $7700.00 Window Closed / Lapsed

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