Process for production of high-hardness boron nitride film

Claim 2

A process for the production of a high-hardness boron nitride film, which comprises vacuum-depositing a boron component on a substrate from a boron-containing vacuum deposition source and simultaneously irradiating the substrate with an ion seed comprising at least nitrogen from an ion-generating source for generating said ion seed, to form boron nitride on the substrate, wherein the atomic ratio (B/N) between boron and nitrogen supplied from the vacuum deposition source and the ion seed is adjusted within a range of from 4 to 25, the ion acceleration energy of the ion seed is adjusted to 5 to 100 KeV per atom of the ion seed, and vacuum deposition and irradiation are carried out in an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed.

Claim 3

A process according to claim 1, wherein the temperature of the substrate is maintained at -200° to 700° C.

Claim 4

A process according to claim 1, wherein the irradiation with the ion seed is carried out so that the quantity of heat generated in the substrate by the irradiation with the ion seed is 0.01 to 20 W/cm 2 .

Claim 5

A process according to claim 1, wherein the boron-containing vacuum deposition source is metallic boron.

Claim 6

A process according to claim 1, wherein the nitrogen-containing ion seed is one obtained by ionization and acceleration of a nitrogen gas.

Claim 7

A process according to claim 1, wherein the atmosphere of the nitrogen atoms or nitrogen compound activated at an energy level lower than that of the ion seed is one formed by generating arc discharge in a current of a nitrogen gas or a nitrogen compound.

Claim 8

A process according to claim 1, wherein the atmosphere of the nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed is supplied together with the high-energy ion seed from the ion-generating source.

Claim 9

A process according to claim 1, wherein the total concentration of oxygen and carbon atoms in the atmosphere adopted for the vacuum deposition and ion seed irradiation is controlled below 100 ppm.

Claim 10

A process according to claim 1, wherein activated boron is vacuum-deposited on the substrate by supplying a boron-containing gas to an arc discharge region.

Claim 11

A process according to claim 1, wherein a boron-containing substance is used as an arc discharge electrode material to provide an arc discharge region, and activated boron is vacuum-deposited on the substrate.

Claim 12

A process for the production of a high-hardness boron nitride film, which comprises vacuum-depositing on a substrate activated boron formed by generating an arc discharge region by using a boron-containing substance as an arc discharge electrode material, and simultaneously irradiating the substrate with an ion seed comprising at least nitrogen from an ion-generating source for generating said ion seed, to form boron nitride on the substrate, wherein the ion acceleration energy of the ion seed is adjusted to 5 to 100 KeV per atom of the in seed, at least one member selected from nitrogen gas, nitrogen compound gases and inert gases is supplied to the arc discharge region, and a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed is formed in the atmosphere.

Claim 13

A process for the production of a high-hardness boron nitride film, which comprises vacuum-depositing on a substrate activated boron formed by generating an arc discharge region by using a boron-containing substance as an arc discharge electrode material, and simultaneously irradiating the substrate with an ion seed comprising at least nitrogen from an ion-generating source for generating said ion seed, to form boron nitride on the substrate, wherein the ion acceleration energy of the ion seed is adjusted to 5 to 100 KeV per atom of the in seed, at least one member selected from nitrogen gas, nitrogen compound gases and inert gases is supplied to the arc discharge region, and a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed is formed in the atmosphere.

Claim 14

A process for the production of a high-hardness BN film, which comprises vacuum-depositing a boron component on a substrate from a boron-containing vacuum deposition source and simultaneously irradiating the substrate with an ion seed comprising at least nitrogen from an ion-generating source for generating said ion seed, to form BN on the substrate, wherein the ion acceleration energy of the ion seed is adjusted to 5 to 100 KeV per atom of the ion seed, vacuum deposition and irradiation are carried out in an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed, and simultaneously, a negative bias voltage is applied to the substrate.

Claim 15

A process for the production of a high-hardness BN film, which comprises vacuum-depositing a boron component on a substrate from a boron-containing vacuum deposition source and simultaneously irradiating the substrate with an ion seed comprising at least nitrogen from an ion-generating source for generating said ion seed, to form BN on the substrate, wherein the ion acceleration energy of the ion seed is adjusted to 5 to 100 KeV per atom of the ion seed, vacuum deposition and irradiation are carried out in an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed, and simultaneously, a negative bias voltage is applied to the substrate.

Claim 16

A process according to claim 12, wherein the atomic ratio B/N in boron and nitrogen atoms supplied from the vacuum deposition source and in seed is adjusted within a range of from 0.2 to 10.

Claim 17

A process according to claim 12, wherein the temperature of the substrate is maintained at -200° to 700° C.

Claim 18

A process according to claim 12, wherein the irradiation with the ion seed is carried out so that the quantity of heat generated in the substrate by the irradiation with the ion seed is 0.01 to 20 W/cm 2 .

Claim 19

A process according to claim 12, wherein the bias voltage is within a range of from -100 V to -10 V.

Claim 20

A process according to claim 12, wherein the total concentration of oxygen and carbon atoms in the atmosphere adopted for the vacuum deposition and irradiation with the ion seed is controlled below 100 ppm.

Claim 21

A process for the production of a high-hardness boron nitride film on a substrate which comprises (i) placing a substrate into a reaction chamber maintained in a vacuum less than 10 -4 torr, (ii) maintaining the substrate at a temperature of 0° to 400° C., (iii) heating a boron-containing vacuum deposition source contained in the reaction chamber to vaporize the source, said source being selected from the group consisting of metallic boron and boron compounds, (iv) introducing a gas selected from the group consisting of nitrogen and nitrogen compounds into an ion source to ionize gas and form an ion seed comprising at least nitrogen, (v) accelerating the ion seed by an accelerator so that the ion seed has the ion acceleration energy of from 5 to 100 KeV per nitrogen atom of the ion seed, (vi) forming an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed in the reaction chamber, and (vii) vacuum-depositing a boron component on the substrate from the vaporized source and simultaneously irradiating the substrate with the ion seed while maintaining the atomic ratio (B/N) between boron and nitrogen supplied from the vaporized source and the ion seed within a range of from 4 to 25.

Claim 22

A process for the production of a high-hardness boron nitride film on a substrate which comprises (i) placing a substrate into a reaction chamber maintained in a vacuum less than 10 -4 torr, (ii) maintaining the substrate at a temperature of 0° to 400° C., (iii) heating a boron-containing vacuum deposition source contained in the reaction chamber to vaporize the source, said source being selected from the group consisting of metallic boron and boron compounds, (iv) introducing a gas selected from the group consisting of nitrogen and nitrogen compounds into an ion source to ionize gas and form an ion seed comprising at least nitrogen, (v) accelerating the ion seed by an accelerator so that the ion seed has the ion acceleration energy of from 5 to 100 KeV per nitrogen atom of the ion seed, (vi) forming an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed in the reaction chamber, and (vii) vacuum-depositing a boron component on the substrate from the vaporized source and simultaneously irradiating the substrate with the ion seed while maintaining the atomic ratio (B/N) between boron and nitrogen supplied from the vaporized source and the ion seed within a range of from 4 to 25.

Claim 23

A process for the production of a high-hardness boron nitride film on a substrate which comprises (i) placing a substrate into a reaction chamber maintained in a vacuum less than 10 -4 torr, (ii) maintaining the substrate at a temperature of 0° to 400° C., (iii) supplying a boron-containing gas to an arc discharge region in the reaction chamber to ionize a part of boron, (iv) introducing a gas selected from the group consisting of nitrogen and nitrogen compounds into an ion source to ionize gas and form an ion seed comprising at least nitrogen, (v) accelerating the ion seed by an accelerator so that the ion seed has the ion acceleration energy of from 5 to 100 KeV per nitrogen atom of the ion seed, (vi) supplying nitrogen gas or a nitrogen compound gas to the arc discharge region to form an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed in the reaction chamber, and (vii) vacuum-depositing a boron component on the substrate from the activated boron containing gas and simultaneously irradiating the substrate with the ion seed in said atmosphere while maintaining the atomic ratio (B/N) between boron and nitrogen supplied from the vacuum deposition source and the ion seed within a range of from 4 to 25.

Claim 24

A process for the production of a high-hardness boron nitride film on a substrate which comprises (i) placing a substrate into a reaction chamber maintained in a vacuum less than 10 -4 torr, (ii) maintaining the substrate at a temperature of 0° to 400° C., (iii) supplying a boron-containing gas to an arc discharge region in the reaction chamber to ionize a part of boron, (iv) introducing a gas selected from the group consisting of nitrogen and nitrogen compounds into an ion source to ionize gas and form an ion seed comprising at least nitrogen, (v) accelerating the ion seed by an accelerator so that the ion seed has the ion acceleration energy of from 5 to 100 KeV per nitrogen atom of the ion seed, (vi) supplying nitrogen gas or a nitrogen compound gas to the arc discharge region to form an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed in the reaction chamber, and (vii) vacuum-depositing a boron component on the substrate from the activated boron containing gas and simultaneously irradiating the substrate with the ion seed in said atmosphere while maintaining the atomic ratio (B/N) between boron and nitrogen supplied from the vacuum deposition source and the ion seed within a range of from 4 to 25.

Claim 25

A process for the production of a high-hardness boron nitride film on a substrate which comprises (i) placing a substrate into a reaction chamber maintained in a vacuum less than 10 -4 torr, (ii) maintaining the substrate at a temperature of 0° to 400° C., (iii) causing arc discharge between double electrodes comprising a boron containing material while introducing nitrogen gas or nitrogen compound gas into the arc discharge region to form a nitrogen-containing boron ion, (iv) introducing a gas selected from the group consisting of nitrogen and nitrogen compounds into an ion source to ionize gas and form an ion seed comprising at least nitrogen, (v) accelerating the ion seed by an accelerator so that the ion seed has the ion acceleration energy of from 5 to 100 KeV per nitrogen atom of the ion seed, and (vi) vacuum-depositing a boron component on the substrate from the nitrogen-containing boron ion and simultaneously irradiating the substrate with the ion seed while maintaining the atomic ratio (B/N) between boron and nitrogen supplied from the vacuum deposition source and the ion seed within a range of 4 to 25.

Claim 26

A process for the production of a high-hardness boron nitride film on a substrate which comprises (i) placing a substrate into a reaction chamber maintained in a vacuum less than 10 -4 torr, (ii) maintaining the substrate at a temperature of 0° to 400° C., (iii) causing arc discharge between double electrodes comprising a boron containing material while introducing nitrogen gas or nitrogen compound gas into the arc discharge region to form a nitrogen-containing boron ion, (iv) introducing a gas selected from the group consisting of nitrogen and nitrogen compounds into an ion source to ionize gas and form an ion seed comprising at least nitrogen, (v) accelerating the ion seed by an accelerator so that the ion seed has the ion acceleration energy of from 5 to 100 KeV per nitrogen atom of the ion seed, and (vi) vacuum-depositing a boron component on the substrate from the nitrogen-containing boron ion and simultaneously irradiating the substrate with the ion seed while maintaining the atomic ratio (B/N) between boron and nitrogen supplied from the vacuum deposition source and the ion seed within a range of 4 to 25.

Claim 27

A process for the production of a high-hardness boron nitride film on a substrate which comprises (i) placing a substrate into a reaction chamber maintained in a vacuum less than 10 -4 torr, (ii) maintaining the substrate at a temperature of 0° to 400° C., (iii) heating a boron-containing vacuum deposition source contained in the reaction chamber to vaporize the source, said source being selected from the group consisting of metallic boron and boron compounds, (iv) introducing a gas selected from the group consisting of nitrogen and nitrogen compounds into an ion source to ionize gas and form an ion seed comprising at least nitrogen, (v) accelerating the ion seed by an accelerator so that the ion seed has the ion acceleration energy of from 5 to 100 KeV per nitrogen atom of the ion seed, (vi) forming an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed in the reaction chamber, (vii) applying a negative bias voltage within a range of from -100 Volt to -10 KV to the substrate, and (viii) vacuum-depositing a boron component on the substrate from the vaporized source and simultaneously irradiating the substrate with the ion seed while maintaining the atomic ratio (B/N) between boron and nitrogen supplied from the vacuum deposition source and the ion seed within a range of from 0.2 to 10.

Claim 28

A process for the production of a high-hardness boron nitride film on a substrate which comprises (i) placing a substrate into a reaction chamber maintained in a vacuum less than 10 -4 torr, (ii) maintaining the substrate at a temperature of 0° to 400° C., (iii) heating a boron-containing vacuum deposition source contained in the reaction chamber to vaporize the source, said source being selected from the group consisting of metallic boron and boron compounds, (iv) introducing a gas selected from the group consisting of nitrogen and nitrogen compounds into an ion source to ionize gas and form an ion seed comprising at least nitrogen, (v) accelerating the ion seed by an accelerator so that the ion seed has the ion acceleration energy of from 5 to 100 KeV per nitrogen atom of the ion seed, (vi) forming an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed in the reaction chamber, (vii) applying a negative bias voltage within a range of from -100 Volt to -10 KV to the substrate, and (viii) vacuum-depositing a boron component on the substrate from the vaporized source and simultaneously irradiating the substrate with the ion seed while maintaining the atomic ratio (B/N) between boron and nitrogen supplied from the vacuum deposition source and the ion seed within a range of from 0.2 to 10.