Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
210 words
A high frequency transferred electron device having electron ballistic injection and extraction for very high efficiency, comprising: a semiconductor body portion; a first electrode; a ballistic injection region connecting said first electrode to a first end of said body portion, said region including a potential barrier for injecting electrons into said body portion at an energy level sufficiently high to enable the electrons to traverse said body portion ballistically; a second electrode portion; a collector semiconductor region connecting said second electrode portion to a second end of said body portion, the connection between the second end of said body portion and said collector semiconductor region being free of any potential barrier; and means for applying a high frequency varying potential across said electrodes to cause injection of ballistic electrons into said body portions, said applied potential varying between a low applied potential value which causes very high peak electron velocity and results in ballistic travel across said body portion and a high applied potential value which causes a transfer of injected ballistic electrons to a high mass condition for travel at a low velocity across said body portion, the potential variation producing a high efficiency ratio between the peak velocity of average electrons and the valley velocity of average electrons.
Claim 2
Dependent Claim
210 words
A high frequency transferred electron device having electron ballistic injection and extraction for very high efficiency, comprising: a semiconductor body portion; a first electrode; a ballistic injection region connecting said first electrode to a first end of said body portion, said region including a potential barrier for injecting electrons into said body portion at an energy level sufficiently high to enable the electrons to traverse said body portion ballistically; a second electrode portion; a collector semiconductor region connecting said second electrode portion to a second end of said body portion, the connection between the second end of said body portion and said collector semiconductor region being free of any potential barrier; and means for applying a high frequency varying potential across said electrodes to cause injection of ballistic electrons into said body portions, said applied potential varying between a low applied potential value which causes very high peak electron velocity and results in ballistic travel across said body portion and a high applied potential value which causes a transfer of injected ballistic electrons to a high mass condition for travel at a low velocity across said body portion, the potential variation producing a high efficiency ratio between the peak velocity of average electrons and the valley velocity of average electrons.
Claim 3
Dependent Claim
30 words
The device of claim 1, wherein said means for applying a high frequency potential comprises a bias voltage and resonant LC circuit means producing a self-oscillating voltage across said electrode.
Claim 4
Dependent Claim
40 words
The device of claim 1, wherein said collector semiconductor region is heavily doped to form a substantially neutral space charge in its connection to said body portion to remove ballistic electrons from said device by way of said second electrode.
Claim 5
Dependent Claim
24 words
The device of claim 3, wherein said ballistic injection region comprises a material having a different energy band than that of said body portion.
Claim 6
Dependent Claim
39 words
The device of claim 3, wherein said ballistic injection region and said body portion interface at a heterojunction between dissimilar semiconductor materials to form a barrier for launching ballistic electrons into said body portion over a fixed potential step.
Claim 7
Dependent Claim
35 words
The device of claim 3, wherein said ballistic injection region and said body portion interface to form a planar doped barrier for launching ballistic electrons into said body portion over a nearly fixed potential step.
Claim 8
Dependent Claim
27 words
The device of claim 1, wherein said body portion has a thickness of about 0.7 micron and said injection region has a thickness of about 0.1 micron.
Claim 9
Dependent Claim
16 words
The device of claim 7, wherein said body portion is a doped N- type GaAs material.
Claim 10
Dependent Claim
16 words
The device of claim 8, wherein said collector semiconductor region is an N+ type GaAs region.
Claim 11
Dependent Claim
23 words
The device of claim 7, wherein said body portion is a lightly-doped semiconductor material having a low, controlled density of electrons and impurities.
Claim 12
Dependent Claim
20 words
The device of claim 10, wherein said material is GaAs, doped to a level of 2-6×10 15 atoms/cm 3 .
Claim 13
Dependent Claim
43 words
The device of claim 10, wherein said injection region comprises a layer of AlGaAs doped at about twenty times the level of doping of said body portion to produce a barrier at the junction between said main body portion and said injection region.
Claim 14
Dependent Claim
41 words
The device of claim 10, wherein said injection region comprises a layer of undoped GaAs forming a depletion region at the interface between said main body portion and said injection region, said depletion region forming a barrier for launching ballistic electrons.
Claim 15
Dependent Claim
16 words
The device of claim 10, wherein said collector semiconductor region is an N+ type GaAs region.
Claim 16
Dependent Claim
65 words
The device of claim 7, wherein said means for applying a varying potential across said electrodes includes a source of bias potential and an LC circuit comprising an inductor capacitively coupled across and resonant with said transferred electron device, said LC circuit being self-oscillating at a high frequency at a total voltage across said electrodes which varies between about 0.4 V and about 1.6 V.
Claim 17
Independent Claim
220 words
A method for providing a transferred electron device with improved high frequency response and increased efficiency, comprising: forming a semiconductor body portion having a low, controlled density of electrons and impurities to provide a semiconductor drift region; forming at one end of said body portion a collector semiconductor region having a substantially neutral space charge for connecting said body portion to an anode electrode, without a potential barrier; forming at the opposite end of said body portion a ballistic injection region connecting said body portion to a cathode electrode and forming a barrier between said body portion and said injection region; applying a high frequency potential across said electrodes, said potential varying between a low value for launching ballistic electrons over said barrier and into said drift region at a high velocity substantially without causing intervalley transitions so that injected electrons retain a low mass condition and high velocity across the entire width of said body portion, and a high value for launching ballistic electrons over said barrier and into said drift region with an energy level sufficient to cause transfer of electrons to a high mass condition, said high mass electrons returning to a low mass condition when said applied potential returns to a low value, said electrons being extracted from said body portion through said collector semiconductor region.
Claim 18
Independent Claim
220 words
A method for providing a transferred electron device with improved high frequency response and increased efficiency, comprising: forming a semiconductor body portion having a low, controlled density of electrons and impurities to provide a semiconductor drift region; forming at one end of said body portion a collector semiconductor region having a substantially neutral space charge for connecting said body portion to an anode electrode, without a potential barrier; forming at the opposite end of said body portion a ballistic injection region connecting said body portion to a cathode electrode and forming a barrier between said body portion and said injection region; applying a high frequency potential across said electrodes, said potential varying between a low value for launching ballistic electrons over said barrier and into said drift region at a high velocity substantially without causing intervalley transitions so that injected electrons retain a low mass condition and high velocity across the entire width of said body portion, and a high value for launching ballistic electrons over said barrier and into said drift region with an energy level sufficient to cause transfer of electrons to a high mass condition, said high mass electrons returning to a low mass condition when said applied potential returns to a low value, said electrons being extracted from said body portion through said collector semiconductor region.