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US4417261A Expired / Lapsed US ⏱️ 0.0 years remaining

Transferred electron devices

Assignee: UK Secretary of State for Defence
•
Filing: 1977-09-06
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Granted: 1983-11-22
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Expires: 1997-09-06
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Abstract

Abstract A transferred electron device includes a novel cathode giving improvement in the dc to microwave conversion efficiency over a wide temperature range. The cathode comprises a narrow n + semiconductor zone next to the device active region or layer and, next to the n + zone, a high field contact which includes a region of semiconductor.

Inventors

  • 👤 Kenneth W. Gray
  • 👤 James E. Pattison
  • 👤 Huw D. Rees

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 05:20
CPC Classifications
H; H10; H10N; H10N80/00; H10N80/10; H10N80/107

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 192 words
A transferred electron effect oscillator device comprising a cathode structure and an anode structure with a layer of n-type supercritically doped active material therebetween, said active material exhibiting the transferred electron effect by which electrons are scattered from states of high mobility to states of low mobility by the application of an electric field greater than a certain threshold level and thereby leading to a region of negative differential mobility in the functional dependence of mean electron velocity on electric field, wherein the cathode structure comprises a first zone next to the active layer, and a second zone providing a high electrical resistance to the first zone; said first zone comprising a layer of n+ semiconductor material of the same material as the active layer but having a doping concentration greater than that of the active material and a thickness less than 2 μm; said second zone comprising, next to the first zone, a layer of semiconductor material of the same material as the active layer but differently doped and of a thickness greater than 0.03 μm so that no appreciable amount of electrons can tunnel therethrough, and an outer metal layer.
Claim 2
Dependent Claim 192 words
A transferred electron effect oscillator device comprising a cathode structure and an anode structure with a layer of n-type supercritically doped active material therebetween, said active material exhibiting the transferred electron effect by which electrons are scattered from states of high mobility to states of low mobility by the application of an electric field greater than a certain threshold level and thereby leading to a region of negative differential mobility in the functional dependence of mean electron velocity on electric field, wherein the cathode structure comprises a first zone next to the active layer, and a second zone providing a high electrical resistance to the first zone; said first zone comprising a layer of n+ semiconductor material of the same material as the active layer but having a doping concentration greater than that of the active material and a thickness less than 2 μm; said second zone comprising, next to the first zone, a layer of semiconductor material of the same material as the active layer but differently doped and of a thickness greater than 0.03 μm so that no appreciable amount of electrons can tunnel therethrough, and an outer metal layer.
Claim 3
Dependent Claim 12 words
A device according to claim 1 wherein the active material is InP.
Claim 4
Dependent Claim 17 words
A device according to claim 1 wherein the active material is InP x As 1-x where 1>x>0.75.
Claim 5
Dependent Claim 12 words
A device according to claim 1 wherein the active material is GaAs.
Claim 6
Dependent Claim 32 words
A device according to claim 1 wherein the active material is In 1-y Al y P where y is small enough so that the transferred electron effect is observed at room temperature.
Claim 7
Dependent Claim 23 words
A device according to claim 1 wherein the semiconductor layer in the second zone has a thickness between 0.1 and 1 μm inclusive.
Claim 8
Dependent Claim 23 words
A device according to claim 1 wherein the donor concentration in the n + layer is greater than 10 16 cm -3 .
Claim 9
Dependent Claim 28 words
A device according to claim 6 wherein the semiconductor layer in the second zone is n-type material having a donor concentration less than that of the active layer.
Claim 10
Dependent Claim 30 words
A device according to claim 8 wherein said semiconductor layer of said second zone also comprises an n + layer between said n-type layer and the said outer metal layer.
Claim 11
Dependent Claim 31 words
A device according to claim 1 wherein the semiconductor layer of said second zone is a p-type layer having an average thickness less than 2 μm next to the first zone.
Claim 12
Dependent Claim 29 words
A device according to claim 10 wherein the semiconductor layer of the second zone also comprises an n + layer between said p-type layer and said outer metal region.
Claim 13
Dependent Claim 21 words
A device according to claim 6 wherein the semiconductor layer of the second zone is an ion bombarded high resistivity region.
Claim 14
Dependent Claim 116 words
A transferred electron oscillator device having a region of active material exhibiting the transferred electron effect by which electrons are scattered from states of high mobility to states of low mobility by the application of an electric field greater than a certain threshold level and thereby leading to a region of negative differential mobility in the functional dependence of mean electron velocity on electric field, said device comprising in sequence: an ohmic anode, a layer of supercritically doped n-type indium phosphide active material, an n + layer of indium phosphide material of thickness less than 2 μm, a layer of n-type indium phosphide material of thickness 0.1 to 1 μm inclusive, and a silver cathode contact.
Claim 15
Dependent Claim 116 words
A transferred electron oscillator device having a region of active material exhibiting the transferred electron effect by which electrons are scattered from states of high mobility to states of low mobility by the application of an electric field greater than a certain threshold level and thereby leading to a region of negative differential mobility in the functional dependence of mean electron velocity on electric field, said device comprising in sequence: an ohmic anode, a layer of supercritically doped n-type indium phosphide active material, an n + layer of indium phosphide material of thickness less than 2 μm, a layer of n-type indium phosphide material of thickness 0.1 to 1 μm inclusive, and a silver cathode contact.

References Cited (Backward Citations)

US3614549A Cited
US3600705A Cited
US3836990A Cited
US3977015A Cited
US4006490A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-11-21 1987-05-23 1987-11-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-11-21 1991-05-23 1991-11-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-11-21 1995-05-23 1995-11-22 $7700.00 Window Closed / Lapsed

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