US4649278A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Generation of intense negative ion beams
Assignee: California Institute of Technology
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Filing: 1985-05-02
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Granted: 1987-03-10
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Expires: 2005-05-02
Abstract
Abstract An electron gun is used with a mirror electrostatic field to produce zero or near zero velocity electrons by forming a turning point in their trajectories. A gas capable of attaching zero or near zero velocity is introduced at this turning point, and negative ions are produced by the attachment or dissociative attachment process. Operation may be continuous or pulsed. Ions thus formed are extracted by a simple lens system and suitable biasing of grids.
Inventors
- 👤 Ara Chutjian
- 👤 Otto J. Orient
- 👤 Samuel H. Aladzhadzhyan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 10:42
CPC Classifications
H; H01; H01J; H01J27/00; H01J27/02; H01J27/028
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
96 words
A method for generating negative ions using a beam of electrons comprising the steps of: producing an electric field in the path of said electron beam for reversal of said electron beam to produce at the turning point electrons having a distribution of energies centered at zero; introducing a gas containing thermal electron-attaching molecules at a point in the path of said electron beam where said electrons have a low energy and a high probability for attachment to said molecules, thereby efficiently generating ions; and directing said ions in a focused beam to a utilization device.
Claim 2
Independent Claim
96 words
A method for generating negative ions using a beam of electrons comprising the steps of: producing an electric field in the path of said electron beam for reversal of said electron beam to produce at the turning point electrons having a distribution of energies centered at zero; introducing a gas containing thermal electron-attaching molecules at a point in the path of said electron beam where said electrons have a low energy and a high probability for attachment to said molecules, thereby efficiently generating ions; and directing said ions in a focused beam to a utilization device.
Claim 3
Dependent Claim
38 words
A method as defined in claim 1 for generating negative ions from thermal electron-attaching molecules having an extremely large attachment cross section at zero electron energy wherein said gas of said molecules is introduced at said turning point.
Claim 4
Dependent Claim
71 words
A method as defined in claim 1 for generating negative ions from thermal electron attaching molecules having an attachment cross section at a level near zero electron energy wherein said gas of said molecules is introduced at a point in the path of said electron beam ahead of said turning point, whereby said electrons of the appropriate energy make two passes through said gas of said molecules for enriched ion generation.
Claim 5
Dependent Claim
21 words
A method as defined in claim 1 wherein said electric field is controlled to be constant for continuous generation of ions.
Claim 6
Dependent Claim
18 words
A method as defined in claim 1 wherein said electric field is controlled for pulsed generation of ions.
Claim 7
Dependent Claim
71 words
A method as defined in claim 5 wherein said control of said electric field for pulsed generation of ions includes pulsed gating of said beam of electrons to said turning point and simultaneously pulsing said reversal of said electron beam while said electron beam is gated on, and directing said ions to said utilization device while reversal of said electron beam, and the generation of said electron beam, are pulsed off.
Claim 8
Dependent Claim
98 words
A negative ion source comprising: means for generating a beam of electrons, electrodes in the direct path of said beam; means for biasing said electrodes for reversal of said electron beam to produce at the turning point electrons having a distribution of energies centered at zero; means for introducing a gas containing thermal electron-attaching molecules at a point in the path of said electron beam where said electrons have low energy and a high probability for attachment to said molecules, thereby efficiently generating ions; and means for directing said ions in a focused beam to a utilization device.
Claim 9
Dependent Claim
98 words
A negative ion source comprising: means for generating a beam of electrons, electrodes in the direct path of said beam; means for biasing said electrodes for reversal of said electron beam to produce at the turning point electrons having a distribution of energies centered at zero; means for introducing a gas containing thermal electron-attaching molecules at a point in the path of said electron beam where said electrons have low energy and a high probability for attachment to said molecules, thereby efficiently generating ions; and means for directing said ions in a focused beam to a utilization device.
Claim 10
Dependent Claim
37 words
Apparatus as defined in claim 7 for generating negative ions from thermal electron-attaching molecules having an extremely large attachment cross section at zero electron energy wherein said gas of said molecules is introduced at said turning point.
Claim 11
Dependent Claim
71 words
Apparatus as defined in claim 7 for generating negative ions from thermal electron-attaching molecules having an attachment cross section at a level near zero wherein said gas of said molecules is introduced at a point in the path of said electron beam between said electron gun and said turning point, whereby said electrons of the appropriate energy make two passes through said gas of said molecules for enriched negative ion generation.
Claim 12
Dependent Claim
20 words
Apparatus as defined in claim 7 wherein said biasing means is controlled with constant voltages for continuous generation of ions.
Claim 13
Dependent Claim
17 words
Apparatus as defined in claim 7 wherein said biasing means is controlled for pulsed generation of ions.
Claim 14
Dependent Claim
78 words
Apparatus as defined in claim 11 wherein said control of said biasing means for pulsed generation of ions is comprised of means for pulsed gating of electrons to said turning point and simultaneously pulsing said electrodes for reversal of said electron beam while said electron beam is turned on, and turning on said means for directing said ions to said utilization device while said electrodes for reversal of said electron beam, and said electron beam, are pulsed off.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-03-09 | 1990-09-08 | 1991-03-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-03-09 | 1994-09-08 | 1995-03-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-03-09 | 1998-09-08 | 1999-03-10 | $7700.00 | Window Closed / Lapsed |