Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
114 words
An ion source of the type having a chamber for containing an ionized gas plasma, an aperture in a wall of said chamber, and extractor electrode positioned external to said aperture and adapted to carry an electrical potential such that ions are extracted from the plasma and formed into an ion beam, the improvement comprising a scraper electrode positioned adjacent the said chamber aperture and in spaced relationship towards the extractor electrode, said scraper electrode containing an aperture whose diameter is slightly less than the aperture in the chamber wall and effective to intercept and remove the outer portion of the ions in the said beam and thus reduce the emittance of the beam.
Claim 2
Dependent Claim
114 words
An ion source of the type having a chamber for containing an ionized gas plasma, an aperture in a wall of said chamber, and extractor electrode positioned external to said aperture and adapted to carry an electrical potential such that ions are extracted from the plasma and formed into an ion beam, the improvement comprising a scraper electrode positioned adjacent the said chamber aperture and in spaced relationship towards the extractor electrode, said scraper electrode containing an aperture whose diameter is slightly less than the aperture in the chamber wall and effective to intercept and remove the outer portion of the ions in the said beam and thus reduce the emittance of the beam.
Claim 3
Dependent Claim
57 words
An ion source as in claim 1 wherein the scraper electrode is adapted to carry a potential in relation to that of the chamber and the extractor electrode such that the electric field distribution in the region between extractor and chamber is not greatly different to that which would occur if the scraper electrode were not present.
Claim 4
Dependent Claim
129 words
An ion source having reduced emittance comprising: a. an ionization chamber, b. means in said chamber for ionizing gas therein, c. a plasma forming chamber connected to the ionization chamber, d. an anode, e. an extractor electrode for extracting ions from the plasma via an aperture in a plasma aperture plate associated with said anode and forming an ion beam therewith, and f. a scraper electrode positioned adjacent the plasma aperture plate towards the extractor electrode, said scraper electrode containing an aperture whose diameter is slightly less than that of the plasma aperture plate and effective to intercept and remove the outer portion of the ions in the said beam, said ions being those that have transverse momentum components that give rise to the satellite peaks in the emittance.
Claim 5
Dependent Claim
129 words
An ion source having reduced emittance comprising: a. an ionization chamber, b. means in said chamber for ionizing gas therein, c. a plasma forming chamber connected to the ionization chamber, d. an anode, e. an extractor electrode for extracting ions from the plasma via an aperture in a plasma aperture plate associated with said anode and forming an ion beam therewith, and f. a scraper electrode positioned adjacent the plasma aperture plate towards the extractor electrode, said scraper electrode containing an aperture whose diameter is slightly less than that of the plasma aperture plate and effective to intercept and remove the outer portion of the ions in the said beam, said ions being those that have transverse momentum components that give rise to the satellite peaks in the emittance.
Claim 6
Dependent Claim
56 words
An ion source as in claim 1 wherein the scraper electrode is adapted to carry a potential in relation to that of the anode and extractor electrode such that the electric field distribution in the region between anode and extractor is not greatly different to that which would occur if the scraper electrode were not present.