US4629930A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma ion source
Assignee: Hitachi Ltd
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Filing: 1983-07-27
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Granted: 1986-12-16
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Expires: 2003-07-27
Abstract
Abstract A plasma ion source includes a discharge chamber in which a plasma is produced by plasma generator, with an acceleration electrode being disposed adjacent to the discharge chamber in order to extract ions from the produced plasma. A deceleration electrode is disposed adjacent to the acceleration electrode to decelerate the extracted ions, and a ground electrode is disposed adjacent to the deceleration electrode. An insulator container is disposed so as to surround the discharge chamber and the respective electrodes, and a shield ring electrode of ground potential is disposed in the vicinity of the deceleration electrode and along an inner wall surface of the insulator container in order to prevent any discharge from arising across the deceleration electrode and the ground electrode.
Inventors
- 👤 Noriyuki Sakudo
- 👤 Osami Okada
- 👤 Susumu Ozasa
- 👤 Katsumi Tokiguchi
- 👤 Hidemi Koike
- 👤 Shunroku Taya
- 👤 Mitsunori Komatsumoto
- 👤 Mitsuo Komatsu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 21:46
CPC Classifications
H; H01; H01J; H01J27/00; H01J27/02; H01J27/16; H01J27/022
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
196 words
A plasma ion source comprising a discharge chamber in which a plasma is produced by plasma generation means, an acceleration electrode disposed adjacent to said discharge chamber to extract ions from the produced plasma, a deceleration electrode disposed adjacent to said acceleration electrode in order to decelerate the extracted ions, a ground electrode disposed adjacent to said deceleration electrode and through which the extracted ions pass to be extracted as an ion beam, a container made of an insulator surrounding said discharge chamber and the respective electrodes, and discharge preventing means, including a shield ring electrode of ground potential disposed in a vicinity of said deceleration electrode and along an inner wall surface of said insulator container, for preventing any discharge from arising across said deceleration electrode and said ground electrode by reducing the flow of charged particles developed due to surface current flowing along the inner wall surface of said insulator container and preventing the charged particles from entering a space between said deceleration electrode and said ground electrode, thereby enabling a high voltage of at least 50 kV to be applied to said acceleration electrode and enabling extraction of a high energy ion beam.
Claim 2
Dependent Claim
196 words
A plasma ion source comprising a discharge chamber in which a plasma is produced by plasma generation means, an acceleration electrode disposed adjacent to said discharge chamber to extract ions from the produced plasma, a deceleration electrode disposed adjacent to said acceleration electrode in order to decelerate the extracted ions, a ground electrode disposed adjacent to said deceleration electrode and through which the extracted ions pass to be extracted as an ion beam, a container made of an insulator surrounding said discharge chamber and the respective electrodes, and discharge preventing means, including a shield ring electrode of ground potential disposed in a vicinity of said deceleration electrode and along an inner wall surface of said insulator container, for preventing any discharge from arising across said deceleration electrode and said ground electrode by reducing the flow of charged particles developed due to surface current flowing along the inner wall surface of said insulator container and preventing the charged particles from entering a space between said deceleration electrode and said ground electrode, thereby enabling a high voltage of at least 50 kV to be applied to said acceleration electrode and enabling extraction of a high energy ion beam.
Claim 3
Dependent Claim
75 words
A plasma ion source according to claim 1, wherein said plasma generation means includes means for producing the plasma by exerting a microwave electric field and a magnetic field on a feed gas introduced into said discharge chamber, said shield ring electrode being disposed with respect to said ground electrode so that a plane of an upper surface of said shield ring electrode lies above a plane of an upper surface of said ground electrode.
Claim 4
Dependent Claim
133 words
A plasma ion source comprising a discharge chamber in which a plasma is produced by plasma generation means, an acceleration electrode disposed adjacent to said discharge chamber to extract ions from the produced plasma, a deceleration electrode disposed adjacent to said acceleration electrode in order to decelerate the extracted ions, a ground electrode disposed adjacent to said deceleration electrode, a container made of an insulator surrounding said discharge chamber and the respective electrodes, and a shield ring electrode of ground potential disposed in a vicinity of said deceleration electrode and along an inner wall surface of the insulator container in order to prevent any discharge from arising across said deceleration electrode and said ground electrode, said shield ring electrode includes a spring means for contacting said inner wall surface of said insulator container.
Claim 5
Dependent Claim
133 words
A plasma ion source comprising a discharge chamber in which a plasma is produced by plasma generation means, an acceleration electrode disposed adjacent to said discharge chamber to extract ions from the produced plasma, a deceleration electrode disposed adjacent to said acceleration electrode in order to decelerate the extracted ions, a ground electrode disposed adjacent to said deceleration electrode, a container made of an insulator surrounding said discharge chamber and the respective electrodes, and a shield ring electrode of ground potential disposed in a vicinity of said deceleration electrode and along an inner wall surface of the insulator container in order to prevent any discharge from arising across said deceleration electrode and said ground electrode, said shield ring electrode includes a spring means for contacting said inner wall surface of said insulator container.
Claim 6
Dependent Claim
51 words
A plasma ion source according to any one of claims 1 2, or 3, wherein said shield ring electrode is constructed such that a distance between an outer surface thereof disposed in opposition to said insulator container and an inner surface of said insulator container increases gradually toward said acceleration electrode.
Claim 7
Dependent Claim
38 words
A plasma ion source according to claim 3, wherein said plasma generation means includes means for producing the plasma by exerting a microwave electrice field and a magnetic field on a feed gas introduced into said discharge chamber.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-12-15 | 1990-06-16 | 1990-12-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-12-15 | 1994-06-16 | 1994-12-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-12-15 | 1998-06-16 | 1998-12-16 | $7700.00 | Window Closed / Lapsed |