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Plasma deposition of amorphous metal alloys

Assignee: United States Department of Energy
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Filing: 1985-07-18
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Granted: 1986-12-02
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Expires: 2005-07-18
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Abstract

Abstract Amorphous metal alloy coatings are plasma-deposited by dissociation of vapors of organometallic compounds and metalloid hydrides in the presence of a reducing gas, using a glow discharge. Tetracarbonylnickel, phosphine, and hydrogen constitute a typical reaction mixture of the invention, yielding a NiPC alloy.

Inventors

  • 👤 Auda K. Hays

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 17:21
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/06; C23C16/18

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 118 words
A method of plasma-depositing amorphous metal alloy coatings on a substrate, consisting of dissociating vapors of organometallic compounds and metalloid hydrides in a reducing gas in a glow discharge environment, wherein the ratio of the partial pressures of the organometallic and the hydride vapors is maintained at a level such that the metalloid content of the resulting coating is within the range of about 20 to 40 atomic percent, and wherein the plasma in the glow discharge is characterized by an average electron energy of 1 to 10 eV and electron densities of about 10 9 to 10 12 cm -3 , said energy being supplied at frequencies within the range of about 0 to 10 10 Hz.
Claim 2
Independent Claim 118 words
A method of plasma-depositing amorphous metal alloy coatings on a substrate, consisting of dissociating vapors of organometallic compounds and metalloid hydrides in a reducing gas in a glow discharge environment, wherein the ratio of the partial pressures of the organometallic and the hydride vapors is maintained at a level such that the metalloid content of the resulting coating is within the range of about 20 to 40 atomic percent, and wherein the plasma in the glow discharge is characterized by an average electron energy of 1 to 10 eV and electron densities of about 10 9 to 10 12 cm -3 , said energy being supplied at frequencies within the range of about 0 to 10 10 Hz.
Claim 3
Dependent Claim 17 words
The method of claim 1 wherein the energy is inductively, capacitively, or directly coupled to the plasma.
Claim 4
Dependent Claim 23 words
The method of claim 1 wherein the organometallic is selected from the group consisting of metal carbonyls, metal alkyls, metal alkoxides, and metallocenes.
Claim 5
Dependent Claim 11 words
The method of claim 1 wherein the reducing gas is hydrogen.
Claim 6
Dependent Claim 16 words
The method of claim 4 wherein the organometallic compound is tetracarbonylnickel and the hydride is phosphine.
Claim 7
Dependent Claim 27 words
The method of claim 5 wherein the ratio of partial pressures of organometallic vapors to hydride vapors is about 8:1 and the energy frequency is 13.56 MHz.

References Cited (Backward Citations)

US3904366A Cited
US3677799A Cited
US3900585A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-12-01 1990-06-02 1990-12-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-12-01 1994-06-02 1994-12-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-12-01 1998-06-02 1998-12-02 $7700.00 Window Closed / Lapsed

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