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US4618566A
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Fluorene containing compounds and negative photoresist compositions therefrom
Assignee: Ecoplastics Ltd
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Filing: 1984-10-31
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Granted: 1986-10-21
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Expires: 2004-10-31
Abstract
Abstract Polymers of fluorene containing compounds which form crosslinked networks are found to provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these fluorene compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.
Inventors
- 👤 James E. Guillet
- 👤 Anthony E. Redpath
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 20:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; C; C08; C08F; C08F20/00; C08F20/02; C08F20/10; C08F20/26; C08F20/30
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
146 words
An article of manufacture comprising an integrated circuit substrate element having applied thereon a thin homogeneous film sensitive in the deep UV light range of a composition comprising a ploymer of a fluorene monomer selected from the group consisting of monomers of the formula: ##STR9## wherein R 1 , R 2 and R 3 are the same of different substituents and are selected from the group consisting of hydrogen, alkyl radicals or 1 to 6 carbon atoms, ##STR10## radicals and at least one R 1 , R 2 and R 3 having a polymerizable >C═C<, group, and R 4 and R 5 are the same or different substituents are selected from the group consisting of hydrogen and alkyl radicals containing 1 to 6 carbon atoms, and copolymers of these fluorene monomers wherein the fluorene monomer is present in amounts of at least 2 percent by weight.
Claim 2
Dependent Claim
146 words
An article of manufacture comprising an integrated circuit substrate element having applied thereon a thin homogeneous film sensitive in the deep UV light range of a composition comprising a ploymer of a fluorene monomer selected from the group consisting of monomers of the formula: ##STR9## wherein R 1 , R 2 and R 3 are the same of different substituents and are selected from the group consisting of hydrogen, alkyl radicals or 1 to 6 carbon atoms, ##STR10## radicals and at least one R 1 , R 2 and R 3 having a polymerizable >C═C<, group, and R 4 and R 5 are the same or different substituents are selected from the group consisting of hydrogen and alkyl radicals containing 1 to 6 carbon atoms, and copolymers of these fluorene monomers wherein the fluorene monomer is present in amounts of at least 2 percent by weight.
Claim 3
Dependent Claim
45 words
The photoresist composition of claim 1 wherein the comonomer polymerized with the fluorene monomer is selected to produce a polymer from the group consisting of homopolymers or interpolymers formed by the addition polymerization of one or more unsaturated compounds containing the polymerizable vinyl unit >C═C<.
Claim 4
Dependent Claim
12 words
The photoresist of claim 2 wherein the >C═C< compound is ethyl methacrylate.
Claim 5
Dependent Claim
12 words
the photoresist of claim 2 wherein the >C═C< compound is methyl methacrylate.
Claim 6
Dependent Claim
23 words
An intermediate article of manufacture comprising a microcircuit element substrate having applied thereon a homogeneous thin film of the composition of claim 1.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-10-20 | 1990-04-21 | 1990-10-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-10-20 | 1994-04-21 | 1994-10-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-10-20 | 1998-04-21 | 1998-10-21 | $7700.00 | Window Closed / Lapsed |