Abstract The present invention is directed to apparatus for detecting defocus which is particularly adapted, among other possible uses, for use with microlithography projection systems; said apparatus being characterized by a reticle, a source of illumination for illuminating said reticle, a beam splitter, a projection lens system, a wafer mounted in a primary image plane of the projection lens system, said beam splitter and projection lens system being arranged to project an image of the reticle on the wafer, a mask complementary to the reticle mounted in a secondary image plane, said beam splitter and said projection lens system being arranged to reimage light reflected from the wafer onto the complementary mask, and detector means mounted to collect light transmitted by the complementary mask. In one form of the invention the apparatus further includes a system for modulating the wafer and a phase-sensitive demodulation circuit for demodulating the output of the detector to obtain a bipolar electrical focus error signal.
Apparatus for detecting defocus comprising, in combination: means for mounting a reticle; means for illuminating said reticle; a beam splitter; projection lens means; means for mounting a wafer at a primary image plane of said projection lens means; said beam splitter and said projection lens means being arranged to project an image of said reticle on said wafer; a mask complementary to said reticle being mounted in a secondary image plane; said beam splitter and said projection lens means being arranged to reimage light reflected from said wafer on said complementary mask; and detector means mounted to collect light transmitted by said complementary mask.
Claim 2
Dependent Claim
104 words
Apparatus for detecting defocus comprising, in combination: means for mounting a reticle; means for illuminating said reticle; a beam splitter; projection lens means; means for mounting a wafer at a primary image plane of said projection lens means; said beam splitter and said projection lens means being arranged to project an image of said reticle on said wafer; a mask complementary to said reticle being mounted in a secondary image plane; said beam splitter and said projection lens means being arranged to reimage light reflected from said wafer on said complementary mask; and detector means mounted to collect light transmitted by said complementary mask.
Claim 3
Dependent Claim
39 words
Apparatus for detecting defocus according to claim 1 further comprising: means for modulating said means for mounting said wafer, and phase-sensitive demodulation means for demodulating the output of said detector means to obtain a bipolar electrical focus error signal.
Claim 4
Dependent Claim
75 words
Apparatus for detecting defocus according to claim 1 further comprising: a sine wave generator; actuator means driven by said generator means for effecting a sine wave modulation of said means for mounting said wafer; a lock-in amplifier connected to said detector means and to said sine wave generator for synchronously demodulating the output of said detector means with respect to the sine wave modulation; whereby the output of said lock-in amplifier is proportional to defocus.