Patent US4605565A successfully refreshed from Google Patents.
US4605565A
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Method of depositing a highly conductive, highly transmissive film
Assignee: United Solar Systems Corp
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Filing: 1982-12-09
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Granted: 1986-08-12
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Expires: 2002-12-09
Abstract
Abstract A method of and apparatus for depositing metallic oxide coatings that are highly electrically transmissive and highly electrically conductive onto a substrate. An r.f. signal is employed to develop an ionized plasma of metal and oxygen atoms, the plasma being adapted for deposition onto a large area substrate which preferably includes semiconductor layers thereon. The method and apparatus are particularly adapted for the improved deposition of transmissive and conductive coatings which include low melting point metals onto the surface of plastic, glass or metallic substrates. The deposition may be accomplished in either a continuous or batch process mode.
Inventors
- 👤 Prem Nath
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 19:23
CPC Classifications
H; H10; H10F; H10F99/00; H10F71/00; H10F71/138; C; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/086; H10F71/10; H10F71/107; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02P; Y02P70/00; Y02P70/50
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
138 words
An improved method of depositing a thin, light transmissive, electrically conductive film onto a substrate said method consisting essentially of the steps of: vacuumizing a chamber; supporting an electrically conductive substrate in the chamber; providing a source of metallic material, the oxide of said metallic material being conductive when deposited as a film by the subsequent process steps; evaporating the metallic material in the vacuumized chamber for producing a metallic vapor in the zone formed between the substrate and the source of metallic material; introducing oxygen gas into the zone; disposing an r.f. powered cathode adjacent the source of metallic material; and energizing the cathode to develop an ionized plasma from the oxygen gas atoms introduced into the zone and the metallic atoms evaporated into the zone, whereby a conductive metal oxide film is deposited onto the substrate.
Claim 2
Dependent Claim
138 words
An improved method of depositing a thin, light transmissive, electrically conductive film onto a substrate said method consisting essentially of the steps of: vacuumizing a chamber; supporting an electrically conductive substrate in the chamber; providing a source of metallic material, the oxide of said metallic material being conductive when deposited as a film by the subsequent process steps; evaporating the metallic material in the vacuumized chamber for producing a metallic vapor in the zone formed between the substrate and the source of metallic material; introducing oxygen gas into the zone; disposing an r.f. powered cathode adjacent the source of metallic material; and energizing the cathode to develop an ionized plasma from the oxygen gas atoms introduced into the zone and the metallic atoms evaporated into the zone, whereby a conductive metal oxide film is deposited onto the substrate.
Claim 3
Dependent Claim
19 words
A method as in claim 1, wherein the metal material has a melting point of less than 450° C.
Claim 4
Dependent Claim
24 words
A method as in claim 2, wherein the metallic material is selected from the group consisting of indium, tin, cadmium, zinc and mixtures thereof.
Claim 5
Dependent Claim
36 words
A method as in claim 1, including the further step of heating the substrate to 150°-300° C. and evaporating an indium-tin compound in the chamber, whereby indium-tin oxide is deposited onto the surface of the substrate.
Claim 6
Dependent Claim
20 words
A method as in claim 4 wherein the r.f. power source is energized to a frequency of about 13.56 megahertz.
Claim 7
Dependent Claim
22 words
A method as in claim 4, wherein the pressure within the chamber is maintained at about 10 -2 to 10 -4 torr.
Claim 8
Dependent Claim
20 words
A method as in claim 1, wherein the metallic material is zinc and the substrate is maintained at room temperature.
Claim 9
Dependent Claim
26 words
A method as in claim 1, wherein the metallic material is indium and the substrate is heated to a temperature of less than about 300° C.
Claim 10
Dependent Claim
21 words
A method as in claim 1, including the additional step of depositing the metallic oxide film onto a continuously moving substrate.
Claim 11
Dependent Claim
21 words
A method as in claim 1, wherein the substrate includes a semiconductor body onto which the metallic oxide film is deposited.
Claim 12
Dependent Claim
17 words
A method as in claim 10, wherein the semiconductor body comprises a plurality of amorphous semiconductor layers.
Claim 13
Dependent Claim
123 words
An improved method of depositing a thin, light transmissive, electrically conductive film onto a substrate, said method including the steps of: vacuumizing a chamber; supporting a substrate in the chamber; heating the substrate to a temperature of less than about 300° C.; providing a source of indium; evaporating the indium in the vacuumized chamber for producing an indium vapor in the zone formed between the substrate and the source of indium; introducing oxygen gas into the zone; disposing an r.f. powered cathode adjacent the source of indium; and energizing the cathode to develop an ionized plasma from the ozygen gas atoms introduced into the zone and the indium atoms evaporated into the zone, whereby an indium oxide film is deposited onto the substrate.
Claim 14
Dependent Claim
123 words
An improved method of depositing a thin, light transmissive, electrically conductive film onto a substrate, said method including the steps of: vacuumizing a chamber; supporting a substrate in the chamber; heating the substrate to a temperature of less than about 300° C.; providing a source of indium; evaporating the indium in the vacuumized chamber for producing an indium vapor in the zone formed between the substrate and the source of indium; introducing oxygen gas into the zone; disposing an r.f. powered cathode adjacent the source of indium; and energizing the cathode to develop an ionized plasma from the ozygen gas atoms introduced into the zone and the indium atoms evaporated into the zone, whereby an indium oxide film is deposited onto the substrate.
Claim 15
Dependent Claim
123 words
An improved method of depositing a thin, light transmissive, electrically conductive film onto a substrate, said method including the steps of: vacuumizing a chamber; supporting a substrate in the chamber; heating the substrate to 150°-300° C.; providing a source of an indium-tin compound in the vacuumized chamber for producing an indium-tin vapor in the zone formed between the substrate and the source of the indium-tin compound; introducing oxygen gas into the zone; disposing an r.f. powered cathode adjacent the source of the indium-tin compound and energizing the cathode to develop an ionized plasma from the oxygen gas atoms introduced into the zone and the indium atoms and tin atoms evaporated into the zone, whereby an indium-tin oxide film is deposited onto the substrate.
Claim 16
Dependent Claim
123 words
An improved method of depositing a thin, light transmissive, electrically conductive film onto a substrate, said method including the steps of: vacuumizing a chamber; supporting a substrate in the chamber; heating the substrate to 150°-300° C.; providing a source of an indium-tin compound in the vacuumized chamber for producing an indium-tin vapor in the zone formed between the substrate and the source of the indium-tin compound; introducing oxygen gas into the zone; disposing an r.f. powered cathode adjacent the source of the indium-tin compound and energizing the cathode to develop an ionized plasma from the oxygen gas atoms introduced into the zone and the indium atoms and tin atoms evaporated into the zone, whereby an indium-tin oxide film is deposited onto the substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-08-11 | 1990-02-10 | 1990-08-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-08-11 | 1994-02-10 | 1994-08-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-08-11 | 1998-02-10 | 1998-08-12 | $7700.00 | Window Closed / Lapsed |