Patent US4603195A successfully refreshed from Google Patents.
US4603195A
Expired / Lapsed
US
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Organosilicon compound and use thereof in photolithography
Assignee: International Business Machines Corp
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Filing: 1983-12-30
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Granted: 1986-07-29
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Expires: 2003-12-30
Abstract
Abstract A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.
Inventors
- 👤 Edward D. Babich
- 👤 Michael Hatzakis
- 👤 Jurij R. Paraszczak
- 👤 Jane M. Shaw
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 19:04
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/022; G03F7/023; G03F7/0754
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
73 words
A composition of matter formed by the interreaction of (A) A quinone diazo compound and (B) an organosilicon compound containing groups reactive with said quinone diazo compound and being selected from the group of diphenyl silanediol, hydroxyl terminated polydimethyl siloxane, 1,3 bis (γ-hydroxy) 4,1,3,3-tetramethyl disiloxane, organosilicon compound containing an amine functionality or epoxide functionality, and when said organosilicon compound contains an amine functionality or epoxide functionality, said composition is a negative resist material.
Claim 2
Dependent Claim
73 words
A composition of matter formed by the interreaction of (A) A quinone diazo compound and (B) an organosilicon compound containing groups reactive with said quinone diazo compound and being selected from the group of diphenyl silanediol, hydroxyl terminated polydimethyl siloxane, 1,3 bis (γ-hydroxy) 4,1,3,3-tetramethyl disiloxane, organosilicon compound containing an amine functionality or epoxide functionality, and when said organosilicon compound contains an amine functionality or epoxide functionality, said composition is a negative resist material.
Claim 3
Dependent Claim
16 words
The composition of claim 1 wherein said diazo compound contains reactive acid or reactive halo groups.
Claim 4
Dependent Claim
25 words
The composition of claim 1 wherein said diazo compound contains reactive group selected from the group of halogen groups, acid groups, and sulfonyl halide groups.
Claim 5
Dependent Claim
12 words
The composition of claim 1 wherein said diazo compound is a quinone-(1,2)-diazide.
Claim 6
Dependent Claim
20 words
The composition of claim 1 wherein said diazo compound is from a benzoquinone diazide or naphthoquinone diazide, or mixtures thereof.
Claim 7
Dependent Claim
11 words
The composition of claim 1 wherein said diazo compound is naphthoquinone-1,2-diazide-5-sulfochloride.
Claim 8
Dependent Claim
24 words
The composition of claim 1 wherein said organosilicon compound contains at least 0.01% by weight of a group reactive with said quinone diazo compound.
Claim 9
Dependent Claim
24 words
The composition of claim 1 wherein said organosilicon compound contains up to about 2% by weight of groups reactive with said quinone diazo compound.
Claim 10
Dependent Claim
25 words
The composition of claim 1 wherein said organosilicon compound contains an amine functionality or epoxide functionality and wherein said composition is a negative resist material.
Claim 11
Dependent Claim
15 words
The composition of claim 9 wherein said organosilicon compound comprises an aminopropyl containing siloxane oligomer.
Claim 12
Dependent Claim
18 words
The composition of claim 9 wherein said organosilicon compound comprises a siloxane oligomer terminated with 3-glycidoxpropyl dimethyloloxy groups.
Claim 13
Dependent Claim
15 words
The composition of claim 9 wherein said organosilicon compound comprises 1,3 bis (γ-aminopropyl) 1,1,3,3-tetramethyl disiloxane.
Claim 14
Dependent Claim
21 words
The composition of claim 9 wherein said organosilicon compound comprises linear aminopropyl containing polysiloxane oligomer of molecular weight of about 30,000.
Claim 15
Dependent Claim
23 words
The composition of claim 9 wherein said organosilicon compound comprises a polydimethylsiloxane oligomer, aminopropyl dimethylsiloxy-terminated having a molecular weight of 10,000 to 30,000.
Claim 16
Dependent Claim
19 words
The composition of claim 9 wherein said organosilicon compound comprises an organosilicon copolymer having the following repeating units: ##STR11##
Claim 17
Dependent Claim
19 words
The composition of claim 13 wherein said organosilicon compound comprises an organosilicon copolymer having the following recurring units: ##STR12##
Claim 18
Dependent Claim
19 words
The composition of claim 13 wherein said organosilicon compound comprises an organosilicon copolymer having the following recurring units: ##STR13##
Claim 19
Dependent Claim
12 words
The composition of claim 1 wherein said organosilicon compound comprises diphenyl silanediol.
Claim 20
Dependent Claim
14 words
The composition of claim 1 wherein said organosilicon compound comprises hydroxyl terminated polydimethyl siloxane.
Claim 21
Dependent Claim
15 words
The composition of claim 1 wherein said organosilicon compound comprises 1,3 bis (γ-hydroxy) 4,1,3,3-tetramethyl disiloxane.
Claim 22
Dependent Claim
82 words
A process for preparing a composition which comprises reacting a quinone diazo compound and an organosilicon compound containing groups reactive with said quinone diazo compound in the presence of an acid acceptor, and wherein said organosilicon compound is selected from the groups of diphenyl silanediol, hydroxyl terminated polydimethyl siloxane, 1,3 bis (γ-hydroxy) 4,1,3,3-tetramethyl disiloxane, organosilicon compound containing an amine functionality or epoxide functionality, and when said organosilicon compound contains an amine functionality or epoxide functionality, said composition is a negative resist material.
Claim 23
Dependent Claim
82 words
A process for preparing a composition which comprises reacting a quinone diazo compound and an organosilicon compound containing groups reactive with said quinone diazo compound in the presence of an acid acceptor, and wherein said organosilicon compound is selected from the groups of diphenyl silanediol, hydroxyl terminated polydimethyl siloxane, 1,3 bis (γ-hydroxy) 4,1,3,3-tetramethyl disiloxane, organosilicon compound containing an amine functionality or epoxide functionality, and when said organosilicon compound contains an amine functionality or epoxide functionality, said composition is a negative resist material.
Claim 24
Dependent Claim
23 words
The process of claim 15 wherein said acid acceptor is selected from the group of alkali metal carbonates, pyridine, and tertiary organic amines.
Claim 25
Dependent Claim
22 words
The process of claim 15 wherein said reaction is carried out at temperatures of about normal room temperature to about 60° C.
Claim 26
Dependent Claim
18 words
The process of claim 15 wherein about equal molar amounts of organosilicon to quinone diazo compound are reacted.
References Cited (Backward Citations)
US4283249A
Cited
JPS5848045A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-07-28 | 1990-01-27 | 1990-07-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-07-28 | 1994-01-27 | 1994-07-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-07-28 | 1998-01-27 | 1998-07-29 | $7700.00 | Window Closed / Lapsed |