Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
149 words
In a semiconductor device comprising a first electrode; an active semiconductor body atop the first electrode, said semiconductor body including at least one triad of semiconductor layers, said triad comprised of two oppositely doped semiconductor layers having a layer of intrinsic semiconductor material disposed therebetween, said body adapted to provide for the flow of electrical current in response to the absorption of light energy incident thereon, a second electrode atop the semiconductor body; and at least one defect region which is capable of providing a low resistance shunt path for the flow of electrical current between the electrodes; the improvement comprising: a continuous transparent barrier layer, formed of a material having an electrical resistivity greater than that of the electrodes, operatively disposed between the semiconductor body and one of the electrodes for decreasing the flow of electrical current through said at least one defect region of said semiconductor device.
Claim 2
Dependent Claim
149 words
In a semiconductor device comprising a first electrode; an active semiconductor body atop the first electrode, said semiconductor body including at least one triad of semiconductor layers, said triad comprised of two oppositely doped semiconductor layers having a layer of intrinsic semiconductor material disposed therebetween, said body adapted to provide for the flow of electrical current in response to the absorption of light energy incident thereon, a second electrode atop the semiconductor body; and at least one defect region which is capable of providing a low resistance shunt path for the flow of electrical current between the electrodes; the improvement comprising: a continuous transparent barrier layer, formed of a material having an electrical resistivity greater than that of the electrodes, operatively disposed between the semiconductor body and one of the electrodes for decreasing the flow of electrical current through said at least one defect region of said semiconductor device.
Claim 3
Dependent Claim
37 words
A device as in claim 1, wherein the barrier layer is formed from a material chosen from the group consisting essentially of oxides, nitrides and carbides of: indium, tin, cadmium, zinc, antimony, silicon, chromium and mixtures thereof.
Claim 4
Dependent Claim
12 words
A device as in claim 1, wherein the second electrode is transparent.
Claim 5
Dependent Claim
22 words
A device as in claim 3, wherein the barrier layer is operatively disposed between the semiconductor body and the second transparent electrode.
Claim 6
Dependent Claim
26 words
A device as in claim 4, wherein the transparent second electrode is formed of indium tin oxide and the barrier layer is formed of tin oxide.
Claim 7
Dependent Claim
36 words
A device as in claim 5, wherein the indium tin oxide is graded so as to form an upper conductive region predominantly of indium tin oxide and a lower, resistive, semiconductor body-contacting region predominantly of tin-oxide.
Claim 8
Dependent Claim
25 words
A device as in claim 4, wherein the semiconductor body comprises amorphous p-i-n layers and the first electrode is formed of a, highly conductive metal.
Claim 9
Dependent Claim
18 words
A device as in claim 7, wherein said barrier layer has a thickness of greater than 200 angstroms.
Claim 10
Dependent Claim
31 words
A device as in claim 3, wherein the first electrode is formed of stainless steel, and the barrier layer is operatively interposed between the stainless steel electrode and the semiconductor body.
Claim 11
Dependent Claim
24 words
A device as in claim 9, wherein the barrier layer is a material formed as a product of oxidation of the stainless steel electrode.
Claim 12
Dependent Claim
24 words
A device as in claim 10, wherein the barrier layer is a material formed as a product of nitridation of the stainless steel electrode.
Claim 13
Dependent Claim
27 words
A device as in claim 1, wherein the barrier layer is formed from a transparent Si based alloy having a resistivity of 10 3 -10 8 ohms-cm.
Claim 14
Dependent Claim
13 words
A device as in claim 12, wherein the Si based alloy is non-amorphous.
Claim 15
Dependent Claim
144 words
In a photovoltaic device comprising a substrate electrode; an active semiconductor body atop the substrate electrode; a transparent, electrically conductive electrode atop the semiconductor body; and at least one defect region which is capable of providing a low resistance shunt path for the flow of electrical current between the electrodes; said semiconductor body including at least one triad of semiconductor layers, said triad comprised of two oppositely doped semiconductor layers having a layer of intrinsic semiconductor material disposed therebetween and adapted to generate electrical current in response to the absorption of light incident thereon; the improvement comprising: a continuous transparent barrier layer, formed of a material having an electrical resistivity greater than that of the electrodes, operatively disposed between the semiconductor body and the transparent electrode for decreasing the flow of electrical current through said at least one defect region of said photovoltaic device.
Claim 16
Dependent Claim
144 words
In a photovoltaic device comprising a substrate electrode; an active semiconductor body atop the substrate electrode; a transparent, electrically conductive electrode atop the semiconductor body; and at least one defect region which is capable of providing a low resistance shunt path for the flow of electrical current between the electrodes; said semiconductor body including at least one triad of semiconductor layers, said triad comprised of two oppositely doped semiconductor layers having a layer of intrinsic semiconductor material disposed therebetween and adapted to generate electrical current in response to the absorption of light incident thereon; the improvement comprising: a continuous transparent barrier layer, formed of a material having an electrical resistivity greater than that of the electrodes, operatively disposed between the semiconductor body and the transparent electrode for decreasing the flow of electrical current through said at least one defect region of said photovoltaic device.
Claim 17
Dependent Claim
35 words
A device as in claim 14, wherein said barrier layer is formed of a material chosen from the group consisting of oxides, nitrides and carbides of: indium, tin, cadmium, zinc, antimony, silicon and mixtures thereof.
Claim 18
Dependent Claim
25 words
A device as in claim 14, wherein the barrier layer is formed of tin oxide and the transparent electrode is formed of indium tin oxide.
Claim 19
Dependent Claim
33 words
A device as in claim 14, wherein the transparent electrode is graded so as to form an upper, conductive electrode predominately of indium tin oxide and a lower, resistive predominately of tin oxide.
Claim 20
Dependent Claim
27 words
A device as in claim 17, wherein the barrier layer is formed from a transparent Si based alloy having a resistivity of 10 3 -10 8 ohm-cm.
Claim 21
Dependent Claim
13 words
A device as in claim 18, wherein the Si based alloy is non-amorphous.
Claim 22
Dependent Claim
16 words
A device as in claim 14, wherein the barrier layer is greater than 200 angstroms thick.