US4597829A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Stencil, stencil material kit and stencil duplicator kit containing the same
Assignee: Pilot Corp
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Filing: 1985-03-07
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Granted: 1986-07-01
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Expires: 2005-03-07
Abstract
Abstract This invention provides stencil from which a patternwise perforated stencil can be easily made by handwritting, a stencil material kit with which a patternwise perforated stencil can be made, and a stencil duplicator kit which, in combination with the stencil, performs simple, clear printing. The stencil is made up of a porous support and a masking film formed thereon, said masking film being made of a water-insoluble polymer having tertiary amino groups. The stencil material kit contains the stencil and a patternwise perforated stencil-making solution which forms a water-soluble product upon reaction with said polymer. Stencil printing is performed using the patternwise perforated stencil, a stencil duplicator and printing ink.
Inventors
- 👤 Morio Sato
- 👤 Tatsuya Igawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 16:57
CPC Classifications
B; B41; B41C; B41C1/00; B41C1/14; B41C1/147
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
86 words
A method of preparing a patternwise perforated stencil which comprises: drawing a pattern using a patternwise perforated stencil-making solution comprising a water-soluble acid solution, on a stencil comprising a porous support and a masking film formed on the support, wherein the masking film comprises a water-insoluble polymer containing tertiary amino groups, wherein said polymer is one which can be made soluble in water or an aqueous solution upon contacting with an acid; and removing the resulting patternwise reaction product by using water or an aqueous solution.
Claim 2
Independent Claim
86 words
A method of preparing a patternwise perforated stencil which comprises: drawing a pattern using a patternwise perforated stencil-making solution comprising a water-soluble acid solution, on a stencil comprising a porous support and a masking film formed on the support, wherein the masking film comprises a water-insoluble polymer containing tertiary amino groups, wherein said polymer is one which can be made soluble in water or an aqueous solution upon contacting with an acid; and removing the resulting patternwise reaction product by using water or an aqueous solution.
Claim 3
Dependent Claim
44 words
The method as claimed in claim 1, wherein the water-insoluble polymer containing tertiary amino groups is a polymer selected from the group consisting of: polyester, polyether, polyamide and polyurethane, each containing tertiary amino groups, tertiary aminoalkyl acrylate polymer; and homopolymers and copolymers of vinylpyridine.
Claim 4
Dependent Claim
123 words
The method as claimed in claim 2, wherein the water-insoluble polymer containing tertiary amino groups is selected from the group consisting of: an esterification product of a diol containing a tertiary amino group and a dicarboxylic acid; a polycondensate of a diol containing a tertiary amino group; a polycondensate of a diamine containing a tertiary amino group and a dicarboxylic acid; a polymerizate of a glycol containing a tertiary amino group and a diisocyanate; a homopolymer of tertiary aminoalkyl acrylate; a copolymer of tertiary aminoalkyl acrylate and a monoethylenic monomer; a homopolymer of 2-vinylpyridine; a homopolymer of 4-vinylpyridine; a copolymer of 4-vinylpyridine and a monoethylenic monomer; a copolymer of 2-vinylpyridine and a monoethylenic monomer; and a copolymer of 4-vinylpyridine, 2-vinylpyridine and monoethylenic monomer.
Claim 5
Dependent Claim
29 words
The method as claimed in claim 1, wherein the porous support is a support selected from the group consisting of Japanese paper, nylon cloth, polyester cloth, and nonwoven cloth.
Claim 6
Dependent Claim
18 words
The method as claimed in claim 1, wherein the porous support is about 20 to 1,500 μm thick.
Claim 7
Dependent Claim
19 words
The method as claimed in claim 1, wherein the porous support has a porosity of about 25 to 80%.
Claim 8
Dependent Claim
29 words
The method as claimed in claim 1, wherein the water-insoluble polymer is present on the support in an amount in the range of 3 to 20 g/m 2 .
Claim 9
Dependent Claim
35 words
The method as claimed in claim 1, wherein the patternwise perforated stencil-making solution comprises an acid and a solvent, wherein the solvent is selected from the group consisting of water, alcohols, polyols and polyol ethers.
Claim 10
Dependent Claim
69 words
The method as claimed in claim 8, wherein the acid is an inorganic acid selected from the group consisting of hydrochloric acid, sulfuric acid, phosphoric acid, and an organic acid selected from the group consisting of formic acid, acetic acid, propionic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, glycolic acid, lactic acid, oxalic acid, malonic acid, succinic acid, fumaric acid, maleic acid, malic acid, tartaric acid, and citric acid.
Claim 11
Dependent Claim
26 words
A method as claimed in claim 8, wherein the acid is present in the patternwise perforated stencil-making solution in an amount of from 3% to 50%.
Claim 12
Dependent Claim
19 words
The method as claimed in claim 8, wherein the patternwise perforated stencil-making solution further comprises a surface active agent.
Claim 13
Dependent Claim
17 words
The method as claimed in claim 8, wherein the patternwise perforated stencil-making solution further comprises a dye.
Claim 14
Dependent Claim
17 words
The method as claimed in claim 8, wherein the patternwise perforated stencil-making solution further comprises a humectant.
Claim 15
Dependent Claim
23 words
The method as claimed in claim 1, wherein the aqueous solution for removing the resulting patternwise reaction product is a water-soluble printing ink.
Claim 16
Dependent Claim
29 words
The method as claimed in claim 1, wherein the pattern on the stencil is drawn by hand by using a writing tool containing the pattern wise perforated stencil-making solution.
Claim 17
Dependent Claim
43 words
The method as claimed in claim 1, wherein the pattern on the stencil is drawn by using a porous stamp filled with the patternwise perforated stencil-making solution or by using a stamp and a stamp pad filled with the patternwise perforated stencil-making solution.
Claim 18
Dependent Claim
22 words
The method as claimed in claim 1, wherein the pattern on the stencil is drawn by spraying the patternwise perforated stencil-making solution.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-06-30 | 1989-12-30 | 1990-07-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-06-30 | 1993-12-30 | 1994-07-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-06-30 | 1997-12-30 | 1998-07-01 | $7700.00 | Window Closed / Lapsed |