Chemical vapor deposition wafer boat

Claim 2

A chemical vapor deposition wafer boat means for supporting a plurality of wafers in an evenly spaced, upright orientation perpendicular to the axis of the boat, the boat comprising a cylinder having closed ends and comprised of mutually engaging upper and lower hemicylinders, the upper hemicylinder having diffusion zones with gas flow passageways therein in the ends and in zones within from 0° to 75° from a horizontal plane through the cylindrical axis and from 0° to 15° from a vertical plane through the cylinder axis, the remainder of the hemicylinder wall being baffle areas without gas flow passageways, the ends and sidewall of the lower hemicylinder comprising gas diffusion zones with gas flow passageways therein, the gas flow passageways comprising from 0.5 to 80 percent of the surface area of the respective gas diffusion zones, wherein the boat surface is roughened, and the surface area ratio of the roughened boat surface to the corresponding smooth boat surface is within the range of from 1 to 4.

Claim 3

The chemical vapor deposition wafer boat means of claim 1 wherein the surface area ratio of roughened surface to corresponding smooth surface is within the range of from 1.5 to 2.5.

Claim 4

The chemical vapor deposition wafer boat means of claim 1 wherein the distance between adjacent slots is within the range of from 2.5 to 12.5 mm., the gap between wafer edge and inner hemicylinder is selected to be within the range of from 1.0 to 5.0 mm., and the gas flow passageways are from 0.5 to 10 percent of the diffusion zone surface area.

Claim 5

The chemical vapor deposition wafer boat means of claim 3 wherein the distance between adjacent slots is within the range of from 5 to 8 mm., the roughened surface area ratio is with the range of from 1.0 to 3.0 the gap between the wafer edge and inner hemicylinder surface is selected to be within the range of from 2.0 to 3.0, mm., and the gas flow passageways are from 0.5 to 2.5 percent of the diffusion zone surface area.

Claim 6

The chemical vapor deposition wafer boat means of claim 3 wherein the distance between adjacent slots is within the range of from 8 to 11 mm., the roughened surface area ratio is with the range of from 1.0 to 3.0, the gap between the wafer edge and inner hemicylinder surface is selected to be within the range of from 2.0 to 3.0 mm., and the gas flow passageways are from 1.0 to 6.0 percent of the diffusion zone surface area.

Claim 7

The chemical vapor deposition wafer boat means of claim 3 wherein the distance between adjacent slots is within the range of from 9 to 10 mm., the roughened surface area ratio is with the range of from 1.5 to 2.5, the gap between the wafer edge and inner hemicylinder surface is selected to be within the range of from 2.0 to 3.0 mm., and the gas flow passageways are from 2.0 to 4.0 percent of the diffusion zone surface area.

Claim 8

A chemical vapor deposition apparatus comprising a vapor deposition chamber having a gas inlet means positioned in the upper portion of the chamber for introducing gases into the chamber and a gas outlet means positioned in the lower portion of the chamber for removing gases from the chamber, a cylindrical wafer boat means positioned between the gas inlet means and the gas outlet means for supporting a plurality of wafers in an evenly spaced, upright orientation, the boat means comprising a cylinder having closed ends and comprised of mutually engaging upper and lower hemicylinders, the upper hemicylinder having diffusion zones with gas flow passageways therein in the ends and in zones within from 0° to 75° from a horizontal plane through the cylindrical axis and from 0° to 15° from a vertical plane through the cylinder axis, the remainder of the hemicylinder wall being baffle area without gas flow passageways positioned between the gas inlet means and interior of the boat means, the ends and sidewall of the lower hemicylinder comprising gas diffusion zones with gas flow passageways therein, the gas flow passageways comprising from 0.5 to 80 percent of the surface area of the respective gas diffusion zones, wherein the surface of the boat means is a roughened boat surface, and the surface area ratio of the roughened boat surface to the corresponding smooth boat surface is within the range of from 1 to 4.

Claim 9

A chemical vapor deposition apparatus comprising a vapor deposition chamber having a gas inlet means positioned in the upper portion of the chamber for introducing gases into the chamber and a gas outlet means positioned in the lower portion of the chamber for removing gases from the chamber, a cylindrical wafer boat means positioned between the gas inlet means and the gas outlet means for supporting a plurality of wafers in an evenly spaced, upright orientation, the boat means comprising a cylinder having closed ends and comprised of mutually engaging upper and lower hemicylinders, the upper hemicylinder having diffusion zones with gas flow passageways therein in the ends and in zones within from 0° to 75° from a horizontal plane through the cylindrical axis and from 0° to 15° from a vertical plane through the cylinder axis, the remainder of the hemicylinder wall being baffle area without gas flow passageways positioned between the gas inlet means and interior of the boat means, the ends and sidewall of the lower hemicylinder comprising gas diffusion zones with gas flow passageways therein, the gas flow passageways comprising from 0.5 to 80 percent of the surface area of the respective gas diffusion zones, wherein the surface of the boat means is a roughened boat surface, and the surface area ratio of the roughened boat surface to the corresponding smooth boat surface is within the range of from 1 to 4.

Claim 10

The chemical vapor deposition apparatus of claim 7 wherein the surface area ratio of roughened boat surface to corresponding smooth boat surface is within the range of from 1.5 to 2.5.

Claim 11

A chemical vapor deposition apparatus comprising a vapor deposition chamber having a gas inlet means positioned in the upper portion of the chamber for introducing gases into the chamber and a gas outlet means positioned in the lower portion of the chamber for removing gases from the chamber, a cylindrical wafer boat means positioned between the gas inlet means and the gas outlet means for supporting a plurality of wafers in an evenly spaced, upright orientation, the boat means comprising a cylinder having closed ends and comprised of mutually engaging upper and lower hemicylinders, the upper hemicylinder having diffusion zones with gas flow passageways therein in the ends and in zones within from 0° to 75° from a horizontal plane through the cylindrical axis and from 0° to 15° from a vertical plane through the cylinder axis, the remainder of the hemicylinder wall being baffle area without gas flow passageways positioned between the gas inlet means and interior of the boat means, the ends and sidewall of the lower hemicylinder comprising gas diffusion zones with gas flow passageways therein, the gas flow passageways comprising from 0.5 to 80 percent of the surface area of the respective gas diffusion zones, wherein in the wafer boat means, the distance between adjacent slots is within the range of from 2.5 to 12.5 mm., the boat surface is roughened, and the surface area ratio of the roughened boat surface to the corresponding smooth boat surface is within the range of from 1 to 4, the gap between wafer edge and inner hemicylinder is selected to be within the range of from 1.0 to 5.0 mm., and the gas flow passageways are from 0.5 to 10 percent of the diffusion zone surface area.

Claim 12

A chemical vapor deposition apparatus comprising a vapor deposition chamber having a gas inlet means positioned in the upper portion of the chamber for introducing gases into the chamber and a gas outlet means positioned in the lower portion of the chamber for removing gases from the chamber, a cylindrical wafer boat means positioned between the gas inlet means and the gas outlet means for supporting a plurality of wafers in an evenly spaced, upright orientation, the boat means comprising a cylinder having closed ends and comprised of mutually engaging upper and lower hemicylinders, the upper hemicylinder having diffusion zones with gas flow passageways therein in the ends and in zones within from 0° to 75° from a horizontal plane through the cylindrical axis and from 0° to 15° from a vertical plane through the cylinder axis, the remainder of the hemicylinder wall being baffle area without gas flow passageways positioned between the gas inlet means and interior of the boat means, the ends and sidewall of the lower hemicylinder comprising gas diffusion zones with gas flow passageways therein, the gas flow passageways comprising from 0.5 to 80 percent of the surface area of the respective gas diffusion zones, wherein in the wafer boat means, the distance between adjacent slots is within the range of from 2.5 to 12.5 mm., the boat surface is roughened, and the surface area ratio of the roughened boat surface to the corresponding smooth boat surface is within the range of from 1 to 4, the gap between wafer edge and inner hemicylinder is selected to be within the range of from 1.0 to 5.0 mm., and the gas flow passageways are from 0.5 to 10 percent of the diffusion zone surface area.

Claim 13

The chemical vapor deposition apparatus of claim 9 wherein in the wafer boat means, the distance between adjacent slots in within the range of from 5 to 8 mm., the roughened surface area ratio is with the range of from 1.0 to 3.0, the gap between the wafer edge and inner hemicylinder surface is selected to be within the range of from 2.0 to 3.0 mm., and the gas flow passageways are from 0.5 to 2.5 percent of the diffusion zone surface area.

Claim 14

The chemical vapor deposition apparatus of claim 9 wherein in the wafer boat means, the distance between adjacent slots is within the range of from 8 to 11 mm., the roughened surface area ratio is with the range of from 1.0 to 3.0, the gap between the wafer edge and inner hemicylinder surface is selected to be within the range of from 2.0 to 3.0 mm., and the gas flow passageways are from 1.0 to 6.0 percent of the diffusion zone surface area.

Claim 15

The chemical vapor deposition apparatus of claim 9 wherein in the wafer boat means, the distance between adjacent slots is within the range of from 9 to 10 mm., the roughened surface area ratio is with the range of from 1.5 to 2.5, the gap between the wafer edge and inner hemicylinder surface is selected to be within the range of from 2.0 to 3.0 mm., and the gas flow passageways are from 2.0 to 4.0 percent of the diffusion zone surface area.