← Back to Patent Explorer
US4580522A Expired / Lapsed US ⏱️ 0.0 years remaining

Rotary substrate holder of molecular beam epitaxy apparatus

Assignee: Hitachi Ltd
•
Filing: 1985-02-27
•
Granted: 1986-04-08
•
Expires: 2005-02-27
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A rotary substrate holder of a molecular beam epitaxy apparatus including leads-cum-posts serving both as leads for passing a current to a heater for heating a substrate and as posts for supporting the heater. By this arrangement, heat transferred from the heater to a bearing disposed in the vicinity of the heater is minimized in amount, thereby prolonging the service life of the holder and minimizing a heat loss thereof.

Inventors

  • 👤 Kazumasa Fujioka
  • 👤 Sumio Okuno
  • 👤 Muneo Mizumoto
  • 👤 Hideaki Kamohara
  • 👤 Shinjiro Ueda
  • 👤 Takao Kuroda
  • 👤 Sumio Yamaguchi
  • 👤 Naoyuki Tamura

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 06:36
CPC Classifications
C; C30; C30B; C30B23/00; C30B23/02; C30B23/06; C30B23/063

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 103 words
A rotary substrate holder of a molecular beam epitaxy apparatus for holding in place a substrate for achieving a molecular beam epitaxial growth, comprising: a heater for heating the substrate; a rotary shaft for rotating the substrate; a stationary shaft arranged coaxially with the rotary shaft; and drive means for driving said rotary shaft for rotation; wherein the improvement comprises: leads-cum-posts extending through an interior of said stationary shaft which is located inside said rotary shaft and serving both as leads for passing a current to the heater and as posts for supporting the heater; and means for holding said leads-cum-posts in position.
Claim 2
Dependent Claim 103 words
A rotary substrate holder of a molecular beam epitaxy apparatus for holding in place a substrate for achieving a molecular beam epitaxial growth, comprising: a heater for heating the substrate; a rotary shaft for rotating the substrate; a stationary shaft arranged coaxially with the rotary shaft; and drive means for driving said rotary shaft for rotation; wherein the improvement comprises: leads-cum-posts extending through an interior of said stationary shaft which is located inside said rotary shaft and serving both as leads for passing a current to the heater and as posts for supporting the heater; and means for holding said leads-cum-posts in position.
Claim 3
Dependent Claim 46 words
A rotary substrate holder of a molecular beam epitaxy apparatus as claimed in claim 1, wherein said leads-cum-posts extending through said stationary shaft are supported by a terminal plate secured to an end portion of said stationary shaft which end portion is remote from the heater.
Claim 4
Dependent Claim 43 words
A rotary substrate holder of a molecular beam epitaxy apparatus as claimed in claim 2, further comprising an auxiliary post merely serving to support said heater, said auxiliary post extending through the interior of said stationary shaft and supported by said terminal plate.
Claim 5
Dependent Claim 31 words
A rotary substrate holder of a molecular beam epitaxy apparatus as claimed in claim 1, further comprising radiation shield plates mounted between said leads-cum-posts and a wall of the stationary shaft.

References Cited (Backward Citations)

US2398382A Cited
US3424628A Cited
US3751310A Cited
US3824955A Cited
US4181544A Cited
US4207836A Cited
US4201152A Cited
EP0100206A1 Cited
US4514250A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-04-07 1989-10-07 1990-04-08 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-04-07 1993-10-07 1994-04-08 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-04-07 1997-10-07 1998-04-08 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag