US4565768A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern
Assignee: Resonac Corp
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Filing: 1984-05-31
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Granted: 1986-01-21
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Expires: 2004-05-31
Abstract
Abstract A photosensitive composition comprising an equimolar condensation product of an aromatic azide compound having an aldehyde group and isophorone, and an alkali-soluble polymeric compound is a negative-type photoresist with a high resolution suitable for the fabrication of semiconductor devices.
Inventors
- 👤 Saburo Nonogaki
- 👤 Michiaki Hashimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 10:22
CPC Classifications
C; C07; C07C; C07C247/00; G; G03; G03F; G03F7/00; G03F7/004; G03F7/008; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/128
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
48 words
A photosensitive composition which comprises an admixture of a photosensitive condensation product of equimolar amounts of isophorone and an aromatic azide compound having an aldehyde group, and an alkali-soluble polymeric compound, the amount of the condensation product being 5-40% by weight on the basis of the polymeric compound.
Claim 2
Dependent Claim
48 words
A photosensitive composition which comprises an admixture of a photosensitive condensation product of equimolar amounts of isophorone and an aromatic azide compound having an aldehyde group, and an alkali-soluble polymeric compound, the amount of the condensation product being 5-40% by weight on the basis of the polymeric compound.
Claim 3
Dependent Claim
25 words
A photosensitive composition according to claim 1, wherein the condensation product is at least one member selected from the group consisting of 3-(azidostyryl)-5,5-dimethyl-2-cyclohexene-1-one and 3-(4-azidophenyl-1,3-butadienyl)-5,5-dimethyl-2-cyclohexene-1-one.
Claim 4
Dependent Claim
35 words
A photosensitive composition according to claim 1 or claim 2, wherein the polymeric compound is at least one member selected from the group consisting of condensation product of a phenol and formaldehyde, and hydroxystyrene polymer.
Claim 5
Dependent Claim
59 words
A photosensitive composition which comprises an admixture of (i) a condensation product of equimolar amounts of isophorone and at least one azide compound selected from the group consisting of an azidobenzaldehyde and an azidocinnamaldehyde; and (ii) an alkali-soluble polymeric compound; the amount of the condensation product being 5 to 40% by weight on the basis of the polymeric compound.
Claim 6
Dependent Claim
59 words
A photosensitive composition which comprises an admixture of (i) a condensation product of equimolar amounts of isophorone and at least one azide compound selected from the group consisting of an azidobenzaldehyde and an azidocinnamaldehyde; and (ii) an alkali-soluble polymeric compound; the amount of the condensation product being 5 to 40% by weight on the basis of the polymeric compound.
Claim 7
Dependent Claim
25 words
A photosensitive composition according to claim 4, wherein the condensation product is at least one member selected from the group consisting of 3-(4'-azidostyryl)-5,5-dimethyl-2-cyclohexane-1-one and 3-(4-azidophenyl-1,3-butadienyl)-5,5-dimethyl-2-cyclohexene-1-one.
Claim 8
Dependent Claim
34 words
A photosensitive composition according to claim 4, wherein the polymeric compound is at least one member selected from the group consisting of a condensation product of a phenol and formaldehyde and a hydroxystyrene polymer.
Claim 9
Dependent Claim
32 words
A photosensitive composition according to claim 1 or claim 4, wherein the condensation product has an absorption wavelength of about 365, 405 or 436 and is highly soluble in an organic solvent.
Claim 10
Dependent Claim
110 words
A process for forming a pattern which comprises a step of coating a substrate with a photosensitive composition comprising (i) a photosensitive condensation product of equimolar amounts of isophorone and at least one azide compound selected from the group consisting of an azidobenzaldehyde and an azidocinnamaldehyde, and (ii) an alkali-soluble polymeric compound, the amount of the condensation product being 5 to 40% by weight on the basis of the polymeric compound, thereby forming a film on the substrate; a step of exposing the film to light of a predetermined pattern; and a step of developing the film with an aqueous alkali solution, thereby removing unexposed parts and forming a pattern.
Claim 11
Dependent Claim
110 words
A process for forming a pattern which comprises a step of coating a substrate with a photosensitive composition comprising (i) a photosensitive condensation product of equimolar amounts of isophorone and at least one azide compound selected from the group consisting of an azidobenzaldehyde and an azidocinnamaldehyde, and (ii) an alkali-soluble polymeric compound, the amount of the condensation product being 5 to 40% by weight on the basis of the polymeric compound, thereby forming a film on the substrate; a step of exposing the film to light of a predetermined pattern; and a step of developing the film with an aqueous alkali solution, thereby removing unexposed parts and forming a pattern.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-01-20 | 1989-07-22 | 1990-01-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-01-20 | 1993-07-22 | 1994-01-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-01-20 | 1997-07-22 | 1998-01-21 | $7700.00 | Window Closed / Lapsed |