Photoresist composition

Claim 2

A photoresist composition comprising a cyclized product of a conjugated diene homopolymer or copolymer, a photo-crosslinking agent soluble in an organic solvent and at least one member selected from the group consisting of compounds represented by the formulas (I) and (II): ##STR5## wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 and R 11 , which may be identical or different, represent substituents selected from the group consisting of hydrogen atom and alkyl groups.

Claim 3

A photoresist composition according to claim 1, wherein the compound represented by the formula (I) or (II) is contained in an amount of 0.1 to 10 parts by weight per 100 parts by weight of the cyclized product of a conjugated diene homopolymer or copolymer.

Claim 4

A photoresist composition according to claim 1, wherein the compound represented by the formula (I) or (II) is contained in an amount of B 1 to 5 parts by weight per 100 parts by weight of the cyclized product of a conjugated diene homopolymer or copolymer.

Claim 5

A photoresist composition according to claim 1, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 and R 11 represent substituents selected from the group consisting of hydrogen atom and alkyl groups having 1 to 4 carbon atoms.

Claim 6

A photoresist composition according to claim 4, wherein the compound represented by the formula (I) or (II) is selected from the group consisting of 2,6-bis(4'-dimethylaminobenzal)cyclohexanone, 2,6-bis(4'-dimethylaminobenzal)-4-methylcyclohexanone, 2,6-bis(4'-diethyl-aminobenzal)cyclohexanone, 2,6-bis(4'-diethylaminobenzal)-4-methylcyclohexanone, 2,6-bis(4'-dipropylaminobenzal)-cyclohexanone, 2,6-bis(4'-dipropylaminobenzal)-4-methylcyclohexanone, 2,6-bis(4'-dimethylaminobenzal)-4-ethylcyclohexanone, 2,6-bis(4'-diethylaminobenzal)-4-ethylcyclohexanone, 2,6-bis(4'-dipropylaminobenzal)-4-ethylcyclohexanone, 2,6-bis(4'-dimethylaminobenzal)-4-propylhexanone, 2,6-bis(4'-diethylaminobenzal)-4-propylhexanone, 2,6-bis(4'-dipropylaminobenzal)-4-propylhexanone, 2,6-bis(4'-aminobenzal)cyclohexanone, 2,6-bis(4'-aminobenzal)-4-methylcyclohexanone, 2,6-bis(4'-aminobenzal)-4-ethylcyclohexanone, 2,6-bis(4'-aminobenzal)-4-propylcyclohexanone, 2,6-bis(4'-dibutylaminobenzal)cyclohexanone, 1,3-bis(4'-aminobenzal)-acetone, 1,3-bis(4'-dimethylaminobenzal)acetone, 1,3-bis(4'-diethylaminobenzal)acetone, 1,3-bis(4'-dipropylaminobenzal)-acetone, 2,4-bis(4'-aminobenzal)pentan-3-one, 2,4-bis(4'-dimethylaminobenzal)pentan-3-one, 2,4-bis(4'-diethylaminobenzal)pentan-3-one, 2,4-bis(4'-dipropylbenzal)pentan-3-one, 2,6-bis(3'-diethylaminobenzal)cyclohexanone, 2,6-bis(3'-diethylaminobenzal)-4-methylcyclohexanone, 2,6-bis(3'-diethylaminobenzal)-4-ethylcyclohexanone, 1,3-bis(3'-diethylaminobenzal)acetone, 2,4-bis(3'-diethylaminobenzal)pentan-3-one, and 2,4-bis(3'-dibutylaminobenzal)pentan-3-one.

Claim 7

A photoresist composition according to claim 1, 2, 3, 4 or 5, wherein said cyclized product of a conjugated diene homopolymer or copolymer has, in its polymer chain, a unit represented by the formulas: ##STR6## wherein R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 , R 22 and R 23 , which may be identical or different, represent substituents selected from the group consisting of hydrogen atom, alkyl groups and aryl groups.

Claim 8

A photoresist composition according to claim 6, wherein said unit is cis-1,4-butadiene unit, trans-1,4-butadiene unit, cis-1,4-isoprene unit, trans-1,4-isoprene unit, cis-1,4-pentadiene unit, trans-1,4-pentadiene unit, 1,4-2-phenylbutadiene unit, 1,2-butadiene unit, 3,4-isoprene unit, 1,2-pentadiene unit or 3,4-2-phenylbutadiene unit.

Claim 9

A photoresist composition according to claim 1, 2, 3, 4 or 5, wherein said photo-crosslinking agent soluble in an organic solvent is an azide type photosensitive substance.

Claim 10

A photoresist composition according to claim 8, wherein said azide type photosensitive substance is 4,4'-diazidostilbene, p-phenylenebisazide, 4,4'-diazidobenzophenone, 4,4'-diazidophenylmethane, 4,4'-diazidochalcone, 2,6-bis(4'-azidobenzal)cyclohexanone, 2,6-bis(4'-azidobenzal)-4-methylcyclohexanone, 4,4'-diazidodiphenyl, 4,4'-diazido-3,3'-dimethyldiphenyl or 2,7-diazidofluorene.

Claim 11

A photoresist composition according to claim 1, 2, 3, 4 or 5, wherein the amount of residual double bond in said cyclized product of the conjugated diene homopolymer or copolymer is 5-95%.

Claim 12

A photoresist composition according to claim 10, wherein said amount of residual double bond is 15-50%.

Claim 13

A photoresist composition according to claim 1, 2, 3, 4 or 5, wherein said cyclized product of the conjugated diene polymer or copolymer is a cyclized product of isoprene homopolymer or butadiene homopolymer.

Claim 14

A photoresist composition according to claim 1, 2, 3, 4 or 5, wherein the azide type photosensitive substance is used in an amount of 0.1 to 10 parts by weight per 100 parts by weight of the cyclized product of the conjugated diene homopolymer or copolymer.

Claim 15

A photosensitive composition according to claim 13, wherein the azide type photosensitive material is used in an amount of 1 to 5 parts by weight per 100 parts by weight of the cyclized product of the conjugated diene homopolymer or copolymer.