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US4552782A Expired / Lapsed US ⏱️ 0.0 years remaining

Electroluminescent device

Assignee: Qinetiq Ltd
•
Filing: 1984-07-26
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Granted: 1985-11-12
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Expires: 2004-07-26
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Abstract

Abstract A method of electroluminescent panel manufacture in which a doped zinc chalcogenide phospher film-for example manganese doped zinc sulphide, is deposited upon an electrode bearing substrate in the presence of a hydrogen enriched atmosphere-for example a 90%:10% argon:hydrogen atmosphere. This is followed by rapid anneal treatment, the substrate being raised quickly to a temperature of 450 DEG C., or greater, and cooled rapidly. It is preferable that, prior to film deposition, the substrate is pretreated by baking in the hydrogen enriched atmosphere. An additional current density limiting film may be applied-a film of low resistance cermet material-for example silica/nickel 20% Ni in SiO2, or a film of amorphous silicon.

Inventors

  • 👤 Alan F. Cattell
  • 👤 John Kirton
  • 👤 Peter Lloyd

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 23:02
CPC Classifications
H; H05; H05B; H05B33/00; H05B33/12; H05B33/14; H05B33/145; H05B33/22; H05B33/26; H05B33/28

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 86 words
A method of electroluminescent panel manufacture in which a doped zinc chalcogenide phosphor film is deposited upon the surface of a transparent electrode bearing substrate, wherein this deposition is performed in an hydrogen enriched atmosphere, and following the deposition of the film, the film bearing substrate is heated rapidly to an elevated temperature of at least 450° C. in a non-reactive environment, and, immediately upon such temperature being reached, is cooled at a rate intermediate to those which would cause thermal shock and brightness degradation respectively.
Claim 2
Independent Claim 86 words
A method of electroluminescent panel manufacture in which a doped zinc chalcogenide phosphor film is deposited upon the surface of a transparent electrode bearing substrate, wherein this deposition is performed in an hydrogen enriched atmosphere, and following the deposition of the film, the film bearing substrate is heated rapidly to an elevated temperature of at least 450° C. in a non-reactive environment, and, immediately upon such temperature being reached, is cooled at a rate intermediate to those which would cause thermal shock and brightness degradation respectively.
Claim 3
Dependent Claim 23 words
A method, as claimed in claim 1, wherein, prior to film deposition the substrate is prepared by baking in an hydrogen enriched atmosphere.
Claim 4
Dependent Claim 19 words
A method, as claimed in claim 1, and wherein the deposition is performed in an hydrogen enriched argon atmosphere.
Claim 5
Dependent Claim 20 words
A method, as claimed in claim 3, wherein the proportions of argon and hydrogen are approximately 90% and 10% respectively.
Claim 6
Dependent Claim 14 words
A method, as claimed in claim 1, wherein the zinc chalcogenide is zinc sulphide.
Claim 7
Dependent Claim 22 words
A method, as claimed in claim 1, wherein the deposition is performed by rf sputtering using as target doped zinc chalcogenide material.
Claim 8
Dependent Claim 34 words
A method, as claimed in claim 1, wherein the deposition is performed by rf sputtering using as target materials zinc chalcogenide and a chalcogenide of manganese or a rare earth element, as dopant source.
Claim 9
Dependent Claim 16 words
A method, as claimed in claim 1, wherein the transparent electrode is of cadmium stannate material.
Claim 10
Dependent Claim 15 words
A method as claimed in claim 1, wherein the transparent electrode is of tin oxide.
Claim 11
Dependent Claim 16 words
A method, as claimed in claim 1, wherein the transparent electrode is of indium tin oxide.
Claim 12
Dependent Claim 24 words
A method, as claimed in claim 1, wherein the film bearing substrate is cooled at a rate in excess of 5° C. per minute.
Claim 13
Dependent Claim 26 words
A method, as claimed in claim 11 wherein the film bearing substrate is cooled at a rate of between 10° C. and 20° C. per minute.
Claim 14
Dependent Claim 17 words
A method, as claimed in claim 1 wherein the elevated temperature is in the range 450°-550° C.

References Cited (Backward Citations)

US3108904A Cited
US3984586A Cited
US4242370A Cited
US4496610A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-11-11 1989-05-13 1989-11-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-11-11 1993-05-13 1993-11-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-11-11 1997-05-13 1997-11-12 $7700.00 Window Closed / Lapsed

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